We have proposed and developed a design method of a freeform surfaces （FFSs） based hyper-numerical-aperture deep ultraviolet （DUV） projection objective （PO） with low aberration. With an aspheric initial configur...We have proposed and developed a design method of a freeform surfaces （FFSs） based hyper-numerical-aperture deep ultraviolet （DUV） projection objective （PO） with low aberration. With an aspheric initial configuration, lens-form parameters were used to determine the best position to remove elements and insert FFSs. The designed FFSs PO reduced two elements without increasing the total thickness of the glass materials. Compared with aspheric initial configuration, the wavefront error of the FFSs PO decreased from 0.006λ to 0.005λ, the distortion reduced from 1 to 0.5 nm, and the aspheric departure decreased from 1.7 to 1.35 mm. The results show that the design method of the FFSs PO is efficient and has improved the imaging performance of PO. The design method of FFSs PO provides potential solutions for DUV lithography with low aberrations at 10–5 nm nodes.展开更多
Low-order wavefront error account for a large proportion of wave aberrations.A compensation method for low order aberration of projection lithography objective based on Interior Point Method is presented.Compensation ...Low-order wavefront error account for a large proportion of wave aberrations.A compensation method for low order aberration of projection lithography objective based on Interior Point Method is presented.Compensation model between wavefront error and degree of movable lens freedom is established.Converting over-determined system to underdetermined system,the compensation is solved by Interior Point Method(IPM).The presented method is compared with direct solve the over-determined system.Then,other algorithm GA,EA and PS is compared with IPM.Simulation and experimental results show that the presented compensation method can obtained compensation with less residuals compared with direct solve the over-determined system.Also,the presented compensation method can reduce computation time and obtain results with less residuals compare with AGA,EA and PS.Moreover,after compensation,RMS of wavefront error of the experimental lithography projection objective decrease from 56.05 nm to 17.88 nm.展开更多
基金the Major Scientific Instrument Development Project of the National Natural Science Foundation of China (Nos. 11627808 and 61675026)the National Science and Technology Major Project for their financial support
文摘We have proposed and developed a design method of a freeform surfaces （FFSs） based hyper-numerical-aperture deep ultraviolet （DUV） projection objective （PO） with low aberration. With an aspheric initial configuration, lens-form parameters were used to determine the best position to remove elements and insert FFSs. The designed FFSs PO reduced two elements without increasing the total thickness of the glass materials. Compared with aspheric initial configuration, the wavefront error of the FFSs PO decreased from 0.006λ to 0.005λ, the distortion reduced from 1 to 0.5 nm, and the aspheric departure decreased from 1.7 to 1.35 mm. The results show that the design method of the FFSs PO is efficient and has improved the imaging performance of PO. The design method of FFSs PO provides potential solutions for DUV lithography with low aberrations at 10–5 nm nodes.
文摘Low-order wavefront error account for a large proportion of wave aberrations.A compensation method for low order aberration of projection lithography objective based on Interior Point Method is presented.Compensation model between wavefront error and degree of movable lens freedom is established.Converting over-determined system to underdetermined system,the compensation is solved by Interior Point Method(IPM).The presented method is compared with direct solve the over-determined system.Then,other algorithm GA,EA and PS is compared with IPM.Simulation and experimental results show that the presented compensation method can obtained compensation with less residuals compared with direct solve the over-determined system.Also,the presented compensation method can reduce computation time and obtain results with less residuals compare with AGA,EA and PS.Moreover,after compensation,RMS of wavefront error of the experimental lithography projection objective decrease from 56.05 nm to 17.88 nm.
