High-Power and High-Efficiency 650nm-Band AlGaInP Visible Laser Diodes Fabricated by Ion Beam Etching

High power and high-slope efficiency 650nm band real-refractive-index ridge w aveguide AlGaInP laser diodes with compressive strained MQW active layer are for med by pure Ar ion beam etching process.Symmetric laser mesas with high perpendi cularity,which are impossible to obtain by traditional wet etching method due to the use of a 15°-misoriented substrate,are obtained by this dry etching metho d.Laser diodes with 4μm wide,600μm long and 10%/90% coat are fabricated.Th e typical threshold current of these devices is 46mA at room temperature,and a s table fundamental-mode operation over 40mW is obtained.Very high slope efficien cy of 1.4W/A at 10mW and 1.1W/A at 40mW are realized.

Metallographic sample prepared by ion beam etching

Ion beam etching technique was used to reveal the metallograhpic microstructure and interface morphology of electroplating chromium coating, in particular, whose substrate surface layer was treated in advance by laser quenching. Chemical etchings were also conducted for comparison. The reveal microstructures were observed and analyzed by scanning electron microscopy. The results show that ion beam etching can reveal well the whole microstructures of composite coating-substrate materials.

Supercontinuum Generation in Lithium Niobate Ridge Waveguides Fabricated by Proton Exchange and Ion Beam Enhanced Etching

We report on the fabrication of the lO-mm-long lithium niobate ridge waveguide and its supercontinuum gen- eration at near-visible wavelengths （around 800hm）. The waveguides are fabricated by a combination of MeV copper ion implantation followed by wet etching in a proton exchanged lithium niobate planar waveguide. Using a mode-locked Ti：sapphire laser with a central wavelength of 800nm, the generated broadest supereontinuum through the ridge waveguides spans 302 nm （at -30 dB points）, from 693 to 995 nm. Temporal coherence proper- ties of the supercontinuum are experimentally studied by a Michelson interferometer and the coherence length of the broadest supercontinuum is measured to be 5.2 μm. Our results offer potential for a compact and integrated supercontinuum source for applications including bio-imaging, spectroscopy and optical communication.

Research on the Adsorption of Methylene Blue with Rice Husk Ash Aided by Ion Beam Etching Technique

[Objective] The aim was to study the mechanism of the removal effect of methylene blue(MB) by rice husk ash(RHA).[Method] The effects of contact time and pH on the adsorption of MB by rice husk ash were investigated,and the mechanism was discussed.[Result] RHA exhibited a remarkable ability on the adsorption of MB.The process of adsorption reached the equilibrium after 30 min,at about pH 9.The adsorption effect was explored with the aid of ion beam etching technique,which displayed that there were two main adsorption manners.One was the electrostatic interactions,through which the negatively charged RHA could adsorb the positively charged MB,the other was the porous effect due to the huge specific surface area of the micro/nano-scale porous silica in RHA,and MB could be adsorbed and deposited into the pores.[Conclusion] RHA could be used in the treatment of textile wastewater.Ion beam technology might be used as an effective way to investigate the adsorption effect.

Impact of Low-Energy Ion Beam Implantation on the Expression of Ty1-copia-like Retrotransposons in Wheat(Triticum aestivum)

Retrotransposon-like elements are major constituents of most eukaryotic genomes. For example, they account for roughly 90% of the wheat （Triticum aestivum） genome, Previous study on a wheat strain treated by low-energy N^＋ ions indicated the variations in AFLP （Amplified Fragment Length Polymorphism ） markers, One such variation was caused by the re-activation of Tyl-copia-like retrotransposons, implying that the mutagenic effects of lowenergy ions might work through elevated activation of retrotransposons, In this paper an expression profile of Tyl-copia-like retrotransposons in wheat treated by low-energy N^＋ ions is reported, The reverse transcriptase （RT） domains of these retrotransposons were amplified by reverse-transcriptional polymerase chain reaction （RT-PCR） and sequentially cloned, 42 and 65 clones were obtained from the treated （CL） and control materials （CK）, respectively, Sequence analysis of each clone was performed by software. Phylogeny and classification were calculated responding to the sequences of the RT domains. All the results show that there is much difference in the RT domain between the control sample and the treated sample, Especially, the RT domains from the treated group encode significantly more functional ORF （open reading frames） than those from the control sample, This observation suggests that the treated sample has higher activation of retrotransposons, possibly as a consequence of low-energy ion beam irradiation, It also suggests that retrotransposons in the two groups impact the host gene expression in two different ways and carry out different functions in wheat cells.

Analysis of a Partial Male-Sterile Mutant of Arabidopsis thaliana Isolated from a Low-Energy Argon Ion Beam Mutagenized Pool

A screen for Arabidopsis fertility mutants, mutagenized by low-energy argon ion beam, yielded two partial male-sterile mutants tc243-1 and tc243-2 which have similar phenotypes. tc243-2 was investigated in detail. The segregation ratio of the mutant phenotypes in the M2 pools suggested that mutation behaved as single Mendelian recessive mutations, tc243 showed a series of mutant phenotypes, among which partial male-sterile was its striking mutant characteristic. Phenotype analysis indicates that there are four factors leading to male sterility, a. Floral organs normally develop inside the closed bud, but the anther filaments do not elongate sufficiently to position the locules above the stigma at anthesis, b. The anther locules do not dehisce at the time of flower opening （although limited dehiscence occurs later）, c. Pollens of mutant plants develop into several types of pollens at the trinucleated stage. as determined by staining with DAPI （4＇,6-diamidino-2-phenylindole）. which shows a variable size. shape and number of nucleus. d. The viability of pollens is lower than that of the wild type on the germination test in vivo and vitro.

Imaging the interphase of carbon fiber composites using transmission electron microscopy:Preparations by focused ion beam, ion beam etching, and ultramicrotomy

Three sample preparation techniques, focused ion beam （FIB）, ion beam （IB） etching, and ultramicrotomy （UM） were used in comparison to analyze the interphase of carbon fiber ＇epoxy composites using transmission electron microscopy. An intact interphase with a relatively uniform thickness was obtained by FIB. and detailed chemical analysis of the interphase was investigated by electron energy loss spectroscopy. It shows that the interphase region is 200 mn wide with an increasing oxygen-to-carbon ratio from 10% to 19% and an almost constant nitrogen-to-carbon ratio of about 3%. However, gallium implantation of FIB tends to hinder fine structure analysis of the interphase. For IB etching, the interphase region is observed with transition morphology frona amorphous resin to nano-crystalline carbon fiber, but the uneven sample thickness brings difficulty for quantitative chemical analysis. Moreover, UM tends to cause damage and/or deformation on the interphase. These results are meaningful for in-depth understanding on the interphase characteristic of carbon fiber composites.

In-situ end-point detection during ion-beam etching of multilayer dielectric gratings

An in-situ end-point detection technique for ion-beam etching is presented. A laser beam of the same wavelength and polarization as those in the intended application of the grating is fed into the vacuum chamber, and the beam retro-diffracted by the grating under etching is extracted and detected outside the chamber. This arrangement greatly simplifies the end-point detection. Modeling the grating diffraction with a rigorous diffraction grating computer program, we can satisfactorily simulate the evolution of the diffraction intensity during the etching process and consequently, we can accurately predict the end-point. Employing the proposed technique, we have reproducibly fabricated multilayer dielectric gratings with diffraction efficiencies of more than 92%.

Development of a SCAR Marker for Discrimination of a Thai Jasmine Rice (<i>Oryza sativa</i>L. cv. KDML105) Mutant, BKOS6, and Associated with Purple Color Trait in Thai Jasmine Rice-Related Varieties

The potential of SCAR marker for discrimination of a Thai jasmine rice (Oryza sativa L. cv. KDML 105) mutant, BKOS6, obtained from ion-beam-induced mutation, was evaluated. The improved rice variety, BKOS6, exhibited many remarkable characteristics which fitted the multiple cropping system characteristics of progressive agriculture including photoperiod insensitivity, early flowering, short in stature, and purple pigment accumulation in pericarp. The BKOS6 rice grain extract has already been proved that it exhibited higher antioxidant properties than the KDML 105 and other tested rice grain extracts. In this study, the BKOS6 specific SCAR marker was developed by HAT-RAPD analysis of rice genomic DNA. The marker was successfully used to identify BKOS6 variety and its hybrid varieties containing purple pigment accumulation in plant tissues. Moreover, it was found that this marker could be used to detect other purple pigmented rice varieties that genetically related to Thai jasmine rice. Recently, a wide variety of anthocyanin-based foods are believed to provide significant potential health benefits, and become more attractive. KDML 105 is also a Thai premier fragrant rice variety which is one of the main varieties of country’s rice export. Thus this molecular marker could be useful for commercial and breeding purposes of BKOS6 mutant and other developed varieties from KDML 105 which contain anthocyanin accumulation.

Surface Modification on Ti-30Ta Alloy for Biomedical Application

Titanium and titanium alloys are currently being used for clinical biomedical applications due to their high strength, corrosion resistance and elastic modulus. The Ti-30Ta alloy has gotten extensive application as the important biomedical materials. The substrate surface of the Ti-30Ta alloy was altered either by chemical or topographical surface modification. The biocompatibility of an implant is closely related to its surface properties. Thus surface modification is one of effective methods for improving the biocompatibility of implants. The development status of biomedical materials has been summarized firstly, the biomedical application. In this study Ti-30Ta alloy surface was investigate as-casting (Group 1) modified with alkaline and heat-treatments in NaOH with 1.5M at 60°C for 24 hrs (Group 2), alkaline and heat-treatments with SBF-coatings by immersion in NaOH and SBFX5 for 24hrs (Group 3), anodization process was performed in an electrolyte solution containing HF (48%) and H2SO4 (98%) with the addition of 5% dimethyl sulfoxide (DMSO) 35V for 40 min (Group 4) and ion beam etching with 1200 eV ions with a beam current of 200 mA for a 3 hrs etch (Group 5). SEM was used to investigate the topography, EDS the chemical composition, and surface energy was evaluate with water contact angle measurement. SEM results show different structure on the surface for each group. EDS spectra identified similarity on Group 1, 4 and 5. The results indicate for group 2 an amorphous sodium tantalate hydrogel layer on the substrate surface and for group 3 the apatite nucleation on substrate surface. The Group 4 shows unorganized and vertically nanotubes and Group 5 shows a little alteration in the topography on the substrate surfaces. Overall the contact angle shows Group 5 the most hydrophobic and Group 4 the most hydrophilic. The study indicates Group 3 and 4 with potential for biomedical application. The next step the authors need to spend more time to study group 3 and 4 in the biomedical sciences.

碲镉汞红外探测器离子束刻蚀研究

电极成型技术是红外焦平面探测器的重要组成部分,离子束刻蚀技术由于具有高各向异性和高分辨率等诸多优点,适用于制备低损伤、高均匀性以及可生产性的电极体系。本文采用离子束刻蚀制备了平面型、台面型器件的电极结构,通过FIB和SEM表征了不同刻蚀条件下的电极形貌和结构,研究了不同刻蚀角度、能量以及热处理对碲镉汞红外探测器的影响。结果表明,离子束刻蚀技术具有侧边平滑、均匀性高、稳定性强以及工艺重复性好等诸多优点。另外,离子束刻蚀可以实现台面结器件的电极隔离,但台面侧壁存在一定金属电极残留,需要进一步优化台面形貌和刻蚀角度。在热处理对刻蚀的影响上,低能量刻蚀形成的晶格损伤,经过高温可以修复;高能量刻蚀将同时造成晶格损伤和电学损伤,热处理只能一定程度上改善pn结性能,电学损伤将在刻蚀后表面形成严重的漏电效应,降低了探测器的品质因子R_(0)A。

聚焦离子束工艺参数对单像素线刻蚀的影响

单像素线刻蚀是制备微纳米器件中的基本单元及加工其他复杂结构的基础,对聚焦离子束(FIB)加工具有重要的意义。通过改变离子束流的大小、驻留时间、扫描步长百分比及离子剂量等参数,对硅表面进行单像素线刻蚀的研究。结果表明,在聚焦离子束加工中,离子剂量与刻蚀线条宽度和深度之间呈正相关,与宽深比之间呈负相关;离子束流大小的变化对刻蚀深度影响不明显,但刻蚀宽度和宽深比随离子束流的增大而增大。此外,随着离子束流驻留时间增加,刻蚀宽度增大而深度减小;随着扫描步长百分比的增大,刻蚀深度增大,刻蚀宽度减小,分析结果表明这些变化与加工过程中再沉积作用有关。本研究成果为后续复杂图形的精密加工提供了重要参考依据。

A process study of electron beam nano-lithography and deep etching with an ICP system

A systemic process study on an electron beam nanolithography system operating at 100kV was pre-sent.The exposure conditions were optimized for resist ZEP520A.Grating structures with line/space of 50nm/50nm were obtained in a reasonably thick resist which is beneficial to the subsequent pattern transfer technique.The ICP etching process conditions was optimized.The role of etching parameters such as source power,gas pressure,and gas flow rate on the etching result was also discussed.A grating structure with line widths as small as 100nm,duty cycles of 0.5,depth of 900nm,and the side-wall scalloping as small as 5nm on a silicon substrate was obtained.The silicon deep etching technique for structure sizes smaller than 100nm is very important for the fabrication of nano-optical devices working in the visible regime.

离子束刻蚀技术在SAW滤波器频率修整上的应用

随着声表面波(SAW)滤波器的应用向高频、窄带方向延伸,在制造过程中准确地控制其中心频率及一致性变得越来越困难,需要对SAW滤波器的频率进行微调。重点介绍了一种在SAW滤波器上可实现目标频率修整的离子束刻蚀修频工艺,通过实验发现刻蚀厚度不同对滤波器表面的影响程度不同,一次离子束刻蚀厚度为50 nm时,铝膜表面出现微结构变化。分析了对晶圆、器件进行离子刻蚀工艺引起热损伤的机理,表征了不同刻蚀厚度对SAW滤波器粘接芯片的剪切力和硅铝丝键合力的影响。根据实验现象及结果提出了分梯度多次刻蚀的优化方案,给出了不同刻蚀厚度的刻蚀精度,对实验结果进行拟合,得到中心频率与刻蚀厚度的关系方程,从频率、插入损耗和通带方面分析了离子束刻蚀工艺对SAW滤波器电学性能的影响。经离子束刻蚀修频后,滤波器中心频率提高2 MHz,中心频率标准差由0.4 MHz减少为0.15 MHz,中心频率的均一性由0.29%改善至0.11%,频率一致性变好。

大束流阳极层离子源的阴极刻蚀现象及消除措施

阳极层离子源可输出高密度离子束流,广泛用于等离子体清洗和辅助沉积,但大束流下内部易发生放电击穿,且大量离子轰击内外阴极导致明显刻蚀,易造成样品污染.本文提出阳极环绕磁屏蔽罩和内外阴极溅射屏蔽板的设计方案,并仿真研究了其对离子源电磁场和等离子体放电输运的影响.发现阳极环绕磁屏蔽罩可切断离子源内部阴阳极间的磁场回路,消除打火条件.内外阴极溅射屏蔽板选择溅射产额低且绝缘性能好的氧化铝,既可阻挡离子溅射,又能屏蔽阴极外表面电场,使等离子体放电向阳极压缩,在抑制阴极刻蚀行为的同时提升离子输出效率.当距离阴极外表面9 mm时,溅射屏蔽板的作用效果最优,不仅能获得稳定放电和高效输出,还可大幅削弱阴极刻蚀行为并减少污染.实验结果显示:改进离子源无内部打火,输出高效且清洁,相同电流下离子输出效率较原离子源实际提高36%;玻璃基片在经过1 h清洗后,表面成分几乎不变,来自阴极溅射的Fe元素含量仅为0.03%,比原离子源低2个数量级,含量约为原离子源的0.6%,实验结果验证了理论分析.

薄膜体声波滤波器的离子束刻蚀修频工艺

薄膜体声波滤波器因设计模型与器件性能存在匹配度问题及制造过程中各工序的累计误差导致频率一致性差,严重影响了产品良率,因此实现晶圆级别的频率修整十分必要。介绍了离子束刻蚀工艺的原理、技术特点与优势,研究了刻蚀电压、刻蚀电流、刻蚀距离、Ar气体体积流量及单次刻蚀量对刻蚀效果的影响,表征了离子束刻蚀工艺对AlN钝化层厚度均一性、刻蚀精度及粗糙度的影响。探究了离子束刻蚀工艺在薄膜体声波滤波器频率修整上的应用,表征了离子束刻蚀工艺对钝化层的表面形貌及晶圆应力的影响。研究结果表明,刻蚀电压为1500 V、刻蚀电流为18 mA、刻蚀气体体积流量为4 cm^(3)/min、刻蚀距离为80 mm时,刻蚀精度高,具有一定借鉴意义;通过3轮电性能测试分析和离子束刻蚀工艺,频率标准差仅为1.23 MHz,大幅提升了薄膜体声波滤波器的频率一致性。

离子束表面加工设备及工艺研究

本文介绍了一种用于红外芯片金属化与刻蚀工艺的离子束表面加工设备。通过实验探索不同工艺角度下薄膜沉积速率与均匀性及刻蚀速率与均匀性的影响,结果表明薄膜沉积均匀性与刻蚀均匀性均优于3%。同时经过产线流片,红外芯片表面薄膜均匀性良好、一致性高,芯片电路图案刻蚀陡直性高、损伤低,满足红外芯片金属化与刻蚀工艺需求。

反应离子刻蚀工艺因素研究

通过大量的实验研究，介绍了反应离子刻蚀的原理，分析了不同材料反应离子刻蚀的机理和关键的工艺因素，给出了工艺参数结果。

宽波段全息-离子束刻蚀光栅的设计及工艺

设计和制作了一种在同一基底上具有多闪耀角的宽波段全息-离子束刻蚀光栅。提出了组合形成宽波段全息-离子束刻蚀光栅的分区设计方法,优化了3种闪耀角混合的宽波段全息光栅设计参数,并利用反应离子束刻蚀装置对该光刻胶掩模进行刻蚀图形转移,采用分段、分步离子束刻蚀技术开展了获得不同闪耀角的离子束刻蚀实验。最后在同一光栅基底上分区制作了位相相同,并具有9,18,29°3个不同闪耀角,口径为60mm×60mm,使用波段为200~900nm的宽波段全息光栅。衍射效率测试结果显示其在使用波段的最低衍射效率超过30%,最高衍射效率超过50%,实验结果与理论计算结果基本符合。与其它方式制作的宽波段光栅相比,采用宽波段全息-离子束刻蚀光栅不但工艺成熟,易于控制光栅槽形,而且光栅有效面积尺寸较大,便于批量复制。