A compact arrayed-waveguide grating （AWG） on the silicon-on-insulator material is designed and fabricated with employment of waveguide-integrated turning mirrors （WITMs）. By properly setting the incident angle wit...A compact arrayed-waveguide grating （AWG） on the silicon-on-insulator material is designed and fabricated with employment of waveguide-integrated turning mirrors （WITMs）. By properly setting the incident angle with the value of 45°, the effective area of the WITM AWG is only 1.15 cm×1.15 cm with the arrayed waveguide area of 0.6cm×0.6cm. The crosstalk of the fabricated 1×6 AWG is better than -19 dB. The on-chip insertion loss is about -8.8 dB and the output nonuniformity is less than 0.6 dB. The polarization-dependent central wavelength shift is about 0.048nm and the polarization dependent loss is neglectable.展开更多
基金Sponsored by the National Natural Science Foundation of China under Grant Nos 60377030 and 60436020, the Scientific Research Foundation for the Returned 0verseas Chinese Scholars, the Shanghai Applied Material R＆D Fund under Grant No 0417, and the Key Project of the Ministry of Education of China.
文摘A compact arrayed-waveguide grating （AWG） on the silicon-on-insulator material is designed and fabricated with employment of waveguide-integrated turning mirrors （WITMs）. By properly setting the incident angle with the value of 45°, the effective area of the WITM AWG is only 1.15 cm×1.15 cm with the arrayed waveguide area of 0.6cm×0.6cm. The crosstalk of the fabricated 1×6 AWG is better than -19 dB. The on-chip insertion loss is about -8.8 dB and the output nonuniformity is less than 0.6 dB. The polarization-dependent central wavelength shift is about 0.048nm and the polarization dependent loss is neglectable.
