Low metal-graphene contact resistance is important in making high-performance graphene devices.In this work,we demonstrate a lower specific contact resistivity of Au0.88Ge0.12/Ni/Au-graphene contact compared with Ti/A...Low metal-graphene contact resistance is important in making high-performance graphene devices.In this work,we demonstrate a lower specific contact resistivity of Au0.88Ge0.12/Ni/Au-graphene contact compared with Ti/Au and Ti/Pt/Au contacts.The rapid thermal annealing process was optimized to improve AuGe/Ni/Au contact resistance.Results reveal that both pre- and post-annealing processes are effective for reducing the contact resistance.The specific contact resistivity decreases from 2.5 × 10^-4 to 7.8 × 10^-5 Ω·cm^2 by pre-annealing at 300 ℃ for one hour,and continues to decrease to 9.5 × 10^-7 H·cm2 after post-annealing at 490 ℃ for 60 seconds.These approaches provide reliable means of lowering contact resistance.展开更多
Objective To study the genotyping characteristics and antibiotic resistance of methicillin-resistant Staphylococcus aureus(MRSA)isolated from lower respiratory tract at 2 different level hospitals in Shanghai.Methods ...Objective To study the genotyping characteristics and antibiotic resistance of methicillin-resistant Staphylococcus aureus(MRSA)isolated from lower respiratory tract at 2 different level hospitals in Shanghai.Methods The subjects included 155 patients at Ruijin Hospital and Tongren Hospital between January 2013 and June 2014,including 108 males and 47 females,with a mean age展开更多
基金Project supported by the National Natural Science Foundation of China(Grant No.61376065)the Science and Technology Project of Suzhou,China(Grant No.ZXG2013044)
文摘Low metal-graphene contact resistance is important in making high-performance graphene devices.In this work,we demonstrate a lower specific contact resistivity of Au0.88Ge0.12/Ni/Au-graphene contact compared with Ti/Au and Ti/Pt/Au contacts.The rapid thermal annealing process was optimized to improve AuGe/Ni/Au contact resistance.Results reveal that both pre- and post-annealing processes are effective for reducing the contact resistance.The specific contact resistivity decreases from 2.5 × 10^-4 to 7.8 × 10^-5 Ω·cm^2 by pre-annealing at 300 ℃ for one hour,and continues to decrease to 9.5 × 10^-7 H·cm2 after post-annealing at 490 ℃ for 60 seconds.These approaches provide reliable means of lowering contact resistance.
文摘Objective To study the genotyping characteristics and antibiotic resistance of methicillin-resistant Staphylococcus aureus(MRSA)isolated from lower respiratory tract at 2 different level hospitals in Shanghai.Methods The subjects included 155 patients at Ruijin Hospital and Tongren Hospital between January 2013 and June 2014,including 108 males and 47 females,with a mean age
