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Linear magnetoresistance versus weak antilocalization effects in Bi2Te3 被引量:1
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作者 ZhenhuaWang Liang Yang +2 位作者 Xiaotian Zhao Zhidong Zhang Xuan P. A. Gao 《Nano Research》 SCIE EI CAS CSCD 2015年第9期2963-2969,共7页
In chalcogenide topological insulator materials, two types of magnetoresistance (MR) effects are widely discussed: a sharp MR dip around zero magnetic field, associated with the weak antilocalization (WAL) effect... In chalcogenide topological insulator materials, two types of magnetoresistance (MR) effects are widely discussed: a sharp MR dip around zero magnetic field, associated with the weak antilocalization (WAL) effect, and a linear MR (LMR) effect that generally persists to high fields and high temperatures. We have studied the MR of thin films of the topological insulator Bi2Te3 from the metallic to semiconducting transport regime. In the metallic samples, the WAL is difficult to identify owing to the low magnitude of the WAL compared to the samples' conductivity. Furthermore, the sharp WAL dip in the MR is dearly present in samples with a higher resistivity. To correctly account for the low-field MR with the quantitative theory of the WAL according to the Hikami-Larkin-Nagaoka (HLN) model, we find that the classical (linear) MR effect should be taken into account in combination with the WAL quantum correction. Otherwise, the WAL fitting alone yields an unrealistically large coefficient in the HLN analysis. This work clarifies the WAL and LMR as two distinct effects and offers an explanation for the overly large a in the WAL analysis of topological insulators in some studies. 展开更多
关键词 LINEAR magnetoresistanqweak antilocalization Bi2Te3 films topological insulators
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