Sn thin film on Cu foil substrate as the anode of lithium ion battery was prepared by direct current magnetron sputtering(DCMS). The surface morphology,composition and thickness and the electrochemical behaviors of th...Sn thin film on Cu foil substrate as the anode of lithium ion battery was prepared by direct current magnetron sputtering(DCMS). The surface morphology,composition and thickness and the electrochemical behaviors of the prepared Sn thin film were characterized by scanning electron microscopy(SEM),X-ray diffraction(XRD),inductively coupled plasma atomic emission spectrometry(ICP),cyclic voltammetry(CV) and galvanostatic charge/ discharge(GC) measurements. It is found that the Sn film is consists of pure Sn with an average particle diameter of 100 nm. The thickness of the film is about 320 nm. The initial lithium insertion capacity of the Sn film is 771 mA·h/g. The reversible capacity of the film is 570 mA·h/g and kept at 270 mA·h/g after 20 cycles.展开更多
Low valence vanadium oxide(VO2-x) thin films were prepared on SiO2/Si substrates at room temperature by direct current facing targets reactive magnetron sputtering, and then proc- essed through rapid thermal annealing...Low valence vanadium oxide(VO2-x) thin films were prepared on SiO2/Si substrates at room temperature by direct current facing targets reactive magnetron sputtering, and then proc- essed through rapid thermal annealing. The effects of the annealing on the structure and phase transition property of VO2 were discussed. X-ray photoelectron spectroscopy, X-ray diffraction tech- nique and Fourier transform infrared spectroscopy were employed to study the phase composition and structure of the thin films. The resistance-temperature property was measured. The results show that VO2 thin film is obtained after annealed at 320 ℃ for 3 h, its phase transition tempera- ture is 56 ℃, and the resistance changes by more than 2 orders. The vanadium oxide thin films are applicable in thermochromic smart windows, and the deposition and annealing process is compatible with micro electromechanical system process.展开更多
The effect of ion current density of argon plasma on target sputtering in magnetron sputtering process was investigated. Using home-made ion probe with computer-based data acquisition system, the ion current density a...The effect of ion current density of argon plasma on target sputtering in magnetron sputtering process was investigated. Using home-made ion probe with computer-based data acquisition system, the ion current density as functions of discharge power, gas pressure and positions was measured. A double-hump shape was found in ion current density curve after the analysis of the effects of power and pressure. The data demonstrate that ion current density increases with the increase in gas pressure in spite of slightly at the double-hump site, sharply at wave-trough and side positions. Simultaneously, the ion current density increases upon increase in power. Es- pecially, the ion current density steeply increases at the double-hump site. The highest energy of the secondary electrons arising from Larmor precession was found at the double-hump position, which results in high ion density. The target was etched seriously at the double-hump position due to the high ion density there. The data indicates that the increase in power can lead to a high sputtering speed rate.展开更多
A non-sputtering discharge is utilized to verify the effect of replacement of gas ions by metallic ions and consequent decrease in the secondary electron emission coefficient in the discharge current curves in high-po...A non-sputtering discharge is utilized to verify the effect of replacement of gas ions by metallic ions and consequent decrease in the secondary electron emission coefficient in the discharge current curves in high-power impulse magnetron sputtering （HiPIMS）. In the non-sputtering discharge involving hydrogen, replacement of ions is avoided while the rarefaction still contributes. The initial peak and ensuing decay disappear and all the discharge current curves show a similar feature as the HiPIMS discharge of materials with low sputtering yields such as carbon. The results demonstrate the key effect of ion replacement during sputtering.展开更多
This paper reports that a series of silver oxide （AgzO） films are deposited on glass substrates by direct-current reactive magnetron sputtering at a substrate temperature of 250 ℃ and an oxygen flux ratio of 15：18...This paper reports that a series of silver oxide （AgzO） films are deposited on glass substrates by direct-current reactive magnetron sputtering at a substrate temperature of 250 ℃ and an oxygen flux ratio of 15：18 by modifying the sputtering power （SP）. The AgxO films deposited apparently show a structural evolution from cubic biphased （AgO ＋ Ag20） to cubic single-phased （Ag20）, and to biphased （Ag20 ＋ AgO） structure. Notably, the cubic single-phased Ag20 fihn is deposited at the SP = 105 W and an AgO phase with （220） orientation discerned in the Ag^O films deposited using the SP 〉 105 W. The transmissivity and refiectivity of the AgxO films in transparent region decrease with the increase the SP, whereas the absorptivity inversely increases with the increase of the SP. These results may be due to the structural evolution and the increasing film thickness. A redshift of the films＇ absorption edges determined in terms of Tauc formula clearly occurs from 3.1 eV to 2.73 eV with the increase of the SP.展开更多
Si-rich Sil-xCx/SiC multilayer thin films are prepared using magnetron sputtering, subsequently followed by thermal annealing in the range of 800-1200 ℃. The influences of annealing temperature （Ta） on the formatio...Si-rich Sil-xCx/SiC multilayer thin films are prepared using magnetron sputtering, subsequently followed by thermal annealing in the range of 800-1200 ℃. The influences of annealing temperature （Ta） on the formation of Si and/or SiC nanocrystals （NCs） and on the electrical characteristics of the multilayer film are investigated by using a variety of analytical techniques, including X-ray diffraction （XRD）, Raman spectroscopy and Fourier transform infrared spectrometry （FT-IR）, current-voltage （I-V） technique, and capacitance-voltage （C-V） technique. XRD and Raman analyses indicate that Si NCs begin to form in samples for Ta _ 800 ~C. At annealing temperatures of 1000 ℃ or higher, the formation of Si NCs is accompanied by the formation of SiC NCs. With the increase in the annealing temperature, the shift of FT-IR Si-C bond absorption spectra toward a higher wave number along with the change of band shape can be explained by a Si-C transitional phase between the loss of substitutional carbon and the formation of SiC precipitates and a precursor for the growth of SiC crystalline. The C-V and I-V results indicate that the interface quality of Si1-xCx/SiC multilayer film is improved significantly and the leakage current is reduced rapidly for Ta ≥ 1000 ℃, which can be ascribed to the formation of Si and SiC NCs.展开更多
Prticle-in-cell（PIC） simulations demonstrated that,when the relativistic magnetron with diffraction output（MDO） is applied with a 410 kV voltage pulse,or when the relativistic magnetron with radial output is appli...Prticle-in-cell（PIC） simulations demonstrated that,when the relativistic magnetron with diffraction output（MDO） is applied with a 410 kV voltage pulse,or when the relativistic magnetron with radial output is applied with a 350 kV voltage pulse,electrons emitted from the cathode with high energy will strike the anode block wall.The emitted secondary electrons and backscattered electrons affect the interaction between electrons and RF fields induced by the operating modes,which decreases the output power in the radial output relativistic magnetron by about 15%（10%for the axial output relativistic magnetron）,decreases the anode current by about 5%（5%for the axial output relativistic magnetron）,and leads to a decrease of electronic efficiency by 8%（6%for the axial output relativistic magnetron）.The peak value of the current formed by secondary and backscattered current equals nearly half of the amplitude of the anode current,which may help the growth of parasitic modes when the applied magnetic field is near the critical magnetic field separating neighboring modes.Thus,mode competition becomes more serious.展开更多
基金Projects(50771046 20373016) supported by the National Natural Science Foundation of China+2 种基金Project(05200534) supported by the Natural Science Foundation of Guangdong Province, ChinaProject(2006A10704003) supported by the Key Project of Guangdong Province, ChinaProject(2006Z3-D2031) supported by the Key Project of Guangzhou City, China
文摘Sn thin film on Cu foil substrate as the anode of lithium ion battery was prepared by direct current magnetron sputtering(DCMS). The surface morphology,composition and thickness and the electrochemical behaviors of the prepared Sn thin film were characterized by scanning electron microscopy(SEM),X-ray diffraction(XRD),inductively coupled plasma atomic emission spectrometry(ICP),cyclic voltammetry(CV) and galvanostatic charge/ discharge(GC) measurements. It is found that the Sn film is consists of pure Sn with an average particle diameter of 100 nm. The thickness of the film is about 320 nm. The initial lithium insertion capacity of the Sn film is 771 mA·h/g. The reversible capacity of the film is 570 mA·h/g and kept at 270 mA·h/g after 20 cycles.
基金Natural Science Foundation of Tianjin(No.043100811)the Key Program of Natural Science Foundation of Tianjin(No.08JCZDJC17500)
文摘Low valence vanadium oxide(VO2-x) thin films were prepared on SiO2/Si substrates at room temperature by direct current facing targets reactive magnetron sputtering, and then proc- essed through rapid thermal annealing. The effects of the annealing on the structure and phase transition property of VO2 were discussed. X-ray photoelectron spectroscopy, X-ray diffraction tech- nique and Fourier transform infrared spectroscopy were employed to study the phase composition and structure of the thin films. The resistance-temperature property was measured. The results show that VO2 thin film is obtained after annealed at 320 ℃ for 3 h, its phase transition tempera- ture is 56 ℃, and the resistance changes by more than 2 orders. The vanadium oxide thin films are applicable in thermochromic smart windows, and the deposition and annealing process is compatible with micro electromechanical system process.
文摘The effect of ion current density of argon plasma on target sputtering in magnetron sputtering process was investigated. Using home-made ion probe with computer-based data acquisition system, the ion current density as functions of discharge power, gas pressure and positions was measured. A double-hump shape was found in ion current density curve after the analysis of the effects of power and pressure. The data demonstrate that ion current density increases with the increase in gas pressure in spite of slightly at the double-hump site, sharply at wave-trough and side positions. Simultaneously, the ion current density increases upon increase in power. Es- pecially, the ion current density steeply increases at the double-hump site. The highest energy of the secondary electrons arising from Larmor precession was found at the double-hump position, which results in high ion density. The target was etched seriously at the double-hump position due to the high ion density there. The data indicates that the increase in power can lead to a high sputtering speed rate.
基金Supported by the National Natural Science Foundation of China under Grant Nos 51301004 and U1330110the Guangdong Innovative and Entrepreneurial Research Team Program under Grant No 2013N080+1 种基金the Shenzhen Science and Technology Research Grant under Grant Nos JCYJ20140903102215536 and JCYJ20150828093127698the City University of Hong Kong Applied Research Grant under Grant No 9667104
文摘A non-sputtering discharge is utilized to verify the effect of replacement of gas ions by metallic ions and consequent decrease in the secondary electron emission coefficient in the discharge current curves in high-power impulse magnetron sputtering （HiPIMS）. In the non-sputtering discharge involving hydrogen, replacement of ions is avoided while the rarefaction still contributes. The initial peak and ensuing decay disappear and all the discharge current curves show a similar feature as the HiPIMS discharge of materials with low sputtering yields such as carbon. The results demonstrate the key effect of ion replacement during sputtering.
基金supported by the National Natural Science Foundation of China (Grant No. 60807001)the National Basic Research Program of China (Grant No. 2011CB201605)the Foundation of Henan Educational Committee (Grant No. 2010A140017)
文摘This paper reports that a series of silver oxide （AgzO） films are deposited on glass substrates by direct-current reactive magnetron sputtering at a substrate temperature of 250 ℃ and an oxygen flux ratio of 15：18 by modifying the sputtering power （SP）. The AgxO films deposited apparently show a structural evolution from cubic biphased （AgO ＋ Ag20） to cubic single-phased （Ag20）, and to biphased （Ag20 ＋ AgO） structure. Notably, the cubic single-phased Ag20 fihn is deposited at the SP = 105 W and an AgO phase with （220） orientation discerned in the Ag^O films deposited using the SP 〉 105 W. The transmissivity and refiectivity of the AgxO films in transparent region decrease with the increase the SP, whereas the absorptivity inversely increases with the increase of the SP. These results may be due to the structural evolution and the increasing film thickness. A redshift of the films＇ absorption edges determined in terms of Tauc formula clearly occurs from 3.1 eV to 2.73 eV with the increase of the SP.
基金Project supported by the National Natural Science Foundation of China(Grant No.61076055)the Open Project Program of Surface Physics Laboratory(National Key Laboratory)of Fudan University,China(Grant No.FDS-KL2011-04)+1 种基金the Key Science and Technology Innovation Team of Zhejiang Province,China(Grant No.2011R50012)the Key Laboratory of Zhejiang Province,China(Grant No.2013E10022)
文摘Si-rich Sil-xCx/SiC multilayer thin films are prepared using magnetron sputtering, subsequently followed by thermal annealing in the range of 800-1200 ℃. The influences of annealing temperature （Ta） on the formation of Si and/or SiC nanocrystals （NCs） and on the electrical characteristics of the multilayer film are investigated by using a variety of analytical techniques, including X-ray diffraction （XRD）, Raman spectroscopy and Fourier transform infrared spectrometry （FT-IR）, current-voltage （I-V） technique, and capacitance-voltage （C-V） technique. XRD and Raman analyses indicate that Si NCs begin to form in samples for Ta _ 800 ~C. At annealing temperatures of 1000 ℃ or higher, the formation of Si NCs is accompanied by the formation of SiC NCs. With the increase in the annealing temperature, the shift of FT-IR Si-C bond absorption spectra toward a higher wave number along with the change of band shape can be explained by a Si-C transitional phase between the loss of substitutional carbon and the formation of SiC precipitates and a precursor for the growth of SiC crystalline. The C-V and I-V results indicate that the interface quality of Si1-xCx/SiC multilayer film is improved significantly and the leakage current is reduced rapidly for Ta ≥ 1000 ℃, which can be ascribed to the formation of Si and SiC NCs.
基金supported by National Natural Science Foundation of China(No.61302010)the Foundation of Science and Technology on High Power Microwave Laboratory,Central University Foundation(2013KW07)Work at the University of New Mexico in USA was supportedby ONR Grant N00014-13-1-0565
文摘Prticle-in-cell（PIC） simulations demonstrated that,when the relativistic magnetron with diffraction output（MDO） is applied with a 410 kV voltage pulse,or when the relativistic magnetron with radial output is applied with a 350 kV voltage pulse,electrons emitted from the cathode with high energy will strike the anode block wall.The emitted secondary electrons and backscattered electrons affect the interaction between electrons and RF fields induced by the operating modes,which decreases the output power in the radial output relativistic magnetron by about 15%（10%for the axial output relativistic magnetron）,decreases the anode current by about 5%（5%for the axial output relativistic magnetron）,and leads to a decrease of electronic efficiency by 8%（6%for the axial output relativistic magnetron）.The peak value of the current formed by secondary and backscattered current equals nearly half of the amplitude of the anode current,which may help the growth of parasitic modes when the applied magnetic field is near the critical magnetic field separating neighboring modes.Thus,mode competition becomes more serious.
