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The Influence of Annealing Temperature on the Structure and Properties of TiO_2 Films Prepared by Sputtering
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作者 刘保顺 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2006年第2期72-75,共4页
The TiO2 fihus were prepared on slides by dc reactive magnetron spattering, then the samples were annealed at 300 ℃ ,350 ℃ ,400 ℃ ,450 ℃ ,500 ℃ and 550 ℃ , respectively. X-ray diffraction (XRD) was used to obt... The TiO2 fihus were prepared on slides by dc reactive magnetron spattering, then the samples were annealed at 300 ℃ ,350 ℃ ,400 ℃ ,450 ℃ ,500 ℃ and 550 ℃ , respectively. X-ray diffraction (XRD) was used to obtain the TiO2 film crystalline structure; X-ray photoelectron spectroscopy ( XPS ) was used to study the film surface stoichiometries ; surface morphologies were studied by scanning electron microscopy (SEM) ; the coatact angle was tested to indicate the TiO2 film wettability ; and the photocatalytic activity testing was couducted to evaluate the photocatalysis properties. The photocatalytic activity and contact angle testing results were correlated with the crystallinity , surface morphologies aud surface · OH concentration of TiO2 films. The samples with a higher polycrystalline anatase structure, rough surface and high · OH concentration displayed a better photoinduced hydrophilicity aud a stronger photocatalysis. 展开更多
关键词 magnetron spattering photocatalysis activity heat treatment
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