The accuracy and repeatability of the laser interferometer measurement system （LIMS） are often limited by the mirror surface error that comes from the mirror surface shape and distortion. This paper describes a new ...The accuracy and repeatability of the laser interferometer measurement system （LIMS） are often limited by the mirror surface error that comes from the mirror surface shape and distortion. This paper describes a new method to calibrate mirror map on ultraprecise movement stage （UPMS） with nanopositioning and to make a real-time compensation for the mirror surface error by using mirror map data tables with the software algorithm. Based on the mirror map test model, the factors affecting mirror map are analyzed through geometric method on the UPMS with six digrees of freedom. Dam processing methods including spline interpolation and spline offsets are used to process the raw sampling data to build mirror map tables. The linear interpolation as compensation method to make a real-time correction on the stage mirror unflatness is adopted and the correction formulas are illuminated. In this way, the measurement accuracy of the system is obviously improved from 40 nm to 5 nm.展开更多
文摘The accuracy and repeatability of the laser interferometer measurement system （LIMS） are often limited by the mirror surface error that comes from the mirror surface shape and distortion. This paper describes a new method to calibrate mirror map on ultraprecise movement stage （UPMS） with nanopositioning and to make a real-time compensation for the mirror surface error by using mirror map data tables with the software algorithm. Based on the mirror map test model, the factors affecting mirror map are analyzed through geometric method on the UPMS with six digrees of freedom. Dam processing methods including spline interpolation and spline offsets are used to process the raw sampling data to build mirror map tables. The linear interpolation as compensation method to make a real-time correction on the stage mirror unflatness is adopted and the correction formulas are illuminated. In this way, the measurement accuracy of the system is obviously improved from 40 nm to 5 nm.
