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Direct measurement and analysis of total ionizing dose effect on 130 nm PD SOI SRAM cell static noise margin
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作者 郑齐文 崔江维 +7 位作者 刘梦新 苏丹丹 周航 马腾 余学峰 陆妩 郭旗 赵发展 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第9期335-340,共6页
In this work, the total ionizing dose(TID) effect on 130 nm partially depleted(PD) silicon-on-insulator(SOI) static random access memory(SRAM) cell stability is measured. The SRAM cell test structure allowing ... In this work, the total ionizing dose(TID) effect on 130 nm partially depleted(PD) silicon-on-insulator(SOI) static random access memory(SRAM) cell stability is measured. The SRAM cell test structure allowing direct measurement of the static noise margin(SNM) is specifically designed and irradiated by gamma-ray. Both data sides' SNM of 130 nm PD SOI SRAM cell are decreased by TID, which is different from the conclusion obtained in old generation devices that one data side's SNM is decreased and the other data side's SNM is increased. Moreover, measurement of SNM under different supply voltages(Vdd) reveals that SNM is more sensitive to TID under lower Vdd. The impact of TID on SNM under data retention Vddshould be tested, because Vddof SRAM cell under data retention mode is lower than normal Vdd.The mechanism under the above results is analyzed by measurement of I–V characteristics of SRAM cell transistors. 展开更多
关键词 silicon-on-insulator total ionizing dose static random access memory static noise margin
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