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Two material removal modes in chemical mechanical polishing:mechanical plowing vs.chemical bonding 被引量:1
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作者 Yuan WU Liang JIANG +3 位作者 Wenhui LI Jiaxin ZHENG Yushan CHEN Linmao QIAN 《Friction》 SCIE EI CAS CSCD 2024年第5期897-905,共9页
With the rapid development of semiconductors,the number of materials needed to be polished sharply increases.The material properties vary significantly,posing challenges to chemical mechanical polishing(CMP).According... With the rapid development of semiconductors,the number of materials needed to be polished sharply increases.The material properties vary significantly,posing challenges to chemical mechanical polishing(CMP).Accordingly,the study aimed to classify the material removal mechanism.Based on the CMP and atomic force microscopy results,the six representative metals can be preliminarily classified into two groups,presumably due to different material removal modes.From the tribology perspective,the first group of Cu,Co,and Ni may mainly rely on the mechanical plowing effect.After adding H_(2)O_(2),corrosion can be first enhanced and then suppressed,affecting the surface mechanical strength.Consequently,the material removal rate(MRR)and the surface roughness increase and decrease.By comparison,the second group of Ta,Ru,and Ti may primarily depend on the chemical bonding effect.Adding H_(2)O_(2)can promote oxidation,increasing interfacial chemical bonds.Therefore,the MRR increases,and the surface roughness decreases and levels off.In addition,CMP can be regulated by tuning the synergistic effect of oxidation,complexation,and dissolution for mechanical plowing,while tuning the synergistic effect of oxidation and ionic strength for chemical bonding.The findings provide mechanistic insight into the material removal mechanism in CMP. 展开更多
关键词 Chemical mechanical polishing corrosion wear material removal mode mechanical plowing chemical bonding
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Deformation Analysis of Micro/Nano Indentation and Diamond Grinding on Optical Glasses 被引量:2
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作者 ZHAO Qingliang ZHAO Lingling +2 位作者 GUO Bing STEPHENSIN David CORBETT John 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 2012年第3期411-418,共8页
The previous research of precision grinding optical glasses with electrolytic in process dressing (ELID) technology mainly concentrated on the action of ELID and machining parameters when grinding, which aim at gene... The previous research of precision grinding optical glasses with electrolytic in process dressing (ELID) technology mainly concentrated on the action of ELID and machining parameters when grinding, which aim at generating very "smoothed" surfaces and reducing the subsurface damage. However, when grinding spectrosil 2000 and BK7 glass assisted with ELID technology, a deeply comparative study on material removal mechanism and the wheel wear behaviors have not been given yet. In this paper, the micro/nano indentation technique is initially applied for investigating the mechanical properties of optical glasses, whose results are then refereed to evaluate the machinability. In single grit diamond scratching on glasses, the scratching traces display four kinds of scratch characteristics according to different material removal modes. In normal grinding experiments, the result shows BK7 glass has a better machinability than that of spectrosil 2000, corresponding to what the micro/nano indentation vent revealed. Under the same grinding depth parameters, the smaller amplitude of acoustic emission (AE) raw signals, grinding force and grinding force ratio correspond to a better surface quality. While for these two kinds of glasses, with the increasing of grinding depth, the variation trends of the surface roughness, the force ratio, and the AE raw signals are contrary, which should be attributed to different material removal modes. Moreover, the SEM micrographs of used wheels surface indicate that diamond grains on the wheel surface after grinding BK7 glass are worn more severely than that of spectrosil 2000. The proposed research analyzes what happened in the grinding process with different material removal patterns, which can provide a basis for producing high-quality optical glasses and comprehensively evaluate the surface and subsurface integrity of optical glasses. 展开更多
关键词 optical glasses micro/nano indentation single grit diamond scratching material removal mode surface integrity electrolytic in process dressing (ELID)
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