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SYNTHESIS OF PPCuPc FILM BY MICROWAVE PLASMA CHEMICAL VAPORIZATION DEPOSITION(MPCVD)
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作者 Ai Min YU Wen Guo XU +1 位作者 Wen Jun YANG Qin Han JIN 《Chinese Chemical Letters》 SCIE CAS CSCD 1991年第11期897-900,共4页
Using a low power microwave generator(W_(max)=100W) and a Surfatron discharge device, Plasma-polymerized copper phthalocyanine (PPCuPc) film was synthesised from monomer copper phthalocyanine(CuPc) by microwave plasma... Using a low power microwave generator(W_(max)=100W) and a Surfatron discharge device, Plasma-polymerized copper phthalocyanine (PPCuPc) film was synthesised from monomer copper phthalocyanine(CuPc) by microwave plasma chemical vaporization deposition(MPCVD) with Ar as incorporation gas. The film was characterized by FTIR and ESCA. The role of dissociation of chemical bond in the polymerization process and the influence of substrate temperature and material on deposition were investigated in some detail. 展开更多
关键词 FTIR MPCVD synthesis OF PPCuPc FILM BY microwave PLASMA chemical VAPORIZATION DEPOSITION ESCA
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