The mechanical and chemical properties of transition metal nitrides are very attractive for numerous industrial applications. Thin nitride films are expected to be good diffusion barrier in microelectronic devices. Ni...The mechanical and chemical properties of transition metal nitrides are very attractive for numerous industrial applications. Thin nitride films are expected to be good diffusion barrier in microelectronic devices. Nitrogen diffuses into the whole thickness of the molybdenum film heated at low temperature and exposed to expanding plasma of (Ar-N2-H2) compared with pure N2 plasma. NHx species in the plasma are produced by different homogeneous or heterogeneous reactive mechanisms that results in an expansion of the plasma compared with pure N2 plasma. NHx species and probably H atoms improve the transfer of nitrogen into the metal by preventing the formation of MoO2 oxides which act as a barrier of diffusion for nitrogen.展开更多
Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers.The structure and morphology,residual stress and adhesion,resistiv...Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers.The structure and morphology,residual stress and adhesion,resistivity and optical reflectance of the as-deposited Mo films were investigated.The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology,small grain size,residual compressive stress and a good adhesion,high resistivity and low optical reflectance.With the working gas pressure decreased and the sputtering power increased,Mo films have elongated spindle-shape or diamond flake shape surface morphology,the grain size is increased,with residual stress changed from tensile to compressive,a poor adhesion,resistivity decreased and optical reflectance increased.展开更多
Transparent conducting oxide film of molybdenum-doped zinc oxide （MZO） with high transparency and relatively low resistivity was prepared by RF （radio frequency） magnetron sputtering at room temperature. The struc...Transparent conducting oxide film of molybdenum-doped zinc oxide （MZO） with high transparency and relatively low resistivity was prepared by RF （radio frequency） magnetron sputtering at room temperature. The structural, electrical, and optical properties of the films deposited under different Ar pressure were investigated.XRD （X-ray diffraction） patterns show that the nature of the films is polycrystalline with a hexagonal structure and a preferred orientation along the c-axis. The resistivity increases as Ar pressure increases. The lowest range exceeds 88% for all the samples. The optical band gap decreases from 3.27 to 3.15 eV with increasing Ar pressure from 0.6 to 3.0 Pa.展开更多
A single solid source precursor bis-(morpholinodithioato-s,s’)-Mo was prepared and molybdenum sulphide thin film was deposited on sodalime glass using Metal Organic Chemical Vapour Deposition (MOCVD) technique at dep...A single solid source precursor bis-(morpholinodithioato-s,s’)-Mo was prepared and molybdenum sulphide thin film was deposited on sodalime glass using Metal Organic Chemical Vapour Deposition (MOCVD) technique at deposition temperature of 420?C. The film was characterized using Rutherford Backscattering Spectroscopy (RBS), Ultraviolet-Visible Spectroscopy, Four point probe technique, Scanning Electron Mi-croscopy (SEM), X-ray Diffractometry (XRD) and Atomic Force Microscopy (AFM). A direct optical band gap of 1.77 eV was obtained from the analysis of the absorption spectrum. The sheet resistance was found to be of the order of 10P–5P ΩP–1P?cmP–1P. SEM micrographs of the films showed the layered structure of the film with an estimated grain size that is less than 2 μm while XRD indicates parallel orientation of the basal plane to the substrate surface.展开更多
Thin films of hydrazine molybdenum （MoO4N4H6）, a new inorganic azo dye, were synthesized and deposited on a commercial glass substrate using the chemical bath deposition technique. Subsequently, the optical transmis...Thin films of hydrazine molybdenum （MoO4N4H6）, a new inorganic azo dye, were synthesized and deposited on a commercial glass substrate using the chemical bath deposition technique. Subsequently, the optical transmission, reflectivity, absorption, refractive index, and dielectric constant of hydrazine molybdenum were investigated using an ultraviolet-visible spectrophotometer. In addition, the film structure was analyzed by mid-infrared spectroscopy. The spectra of the films were found to be in line with those in the literature. The surface properties of all films were examined using a computer-controlled digital scanning electron microscope with a secondary electron detector. The areas of application and the technological advantages of this material were also considered.展开更多
文摘The mechanical and chemical properties of transition metal nitrides are very attractive for numerous industrial applications. Thin nitride films are expected to be good diffusion barrier in microelectronic devices. Nitrogen diffuses into the whole thickness of the molybdenum film heated at low temperature and exposed to expanding plasma of (Ar-N2-H2) compared with pure N2 plasma. NHx species in the plasma are produced by different homogeneous or heterogeneous reactive mechanisms that results in an expansion of the plasma compared with pure N2 plasma. NHx species and probably H atoms improve the transfer of nitrogen into the metal by preventing the formation of MoO2 oxides which act as a barrier of diffusion for nitrogen.
基金supported by the knowledge innovation program of the Chinese academy of sciences(Grant No.KGCX2-YW-347)
文摘Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers.The structure and morphology,residual stress and adhesion,resistivity and optical reflectance of the as-deposited Mo films were investigated.The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology,small grain size,residual compressive stress and a good adhesion,high resistivity and low optical reflectance.With the working gas pressure decreased and the sputtering power increased,Mo films have elongated spindle-shape or diamond flake shape surface morphology,the grain size is increased,with residual stress changed from tensile to compressive,a poor adhesion,resistivity decreased and optical reflectance increased.
基金supported by the National Key Basic Research and Development Programme of China(No.2001CB610504)the National Natural Science Foundation of China(Grant No.60576039,10374060).
文摘Transparent conducting oxide film of molybdenum-doped zinc oxide （MZO） with high transparency and relatively low resistivity was prepared by RF （radio frequency） magnetron sputtering at room temperature. The structural, electrical, and optical properties of the films deposited under different Ar pressure were investigated.XRD （X-ray diffraction） patterns show that the nature of the films is polycrystalline with a hexagonal structure and a preferred orientation along the c-axis. The resistivity increases as Ar pressure increases. The lowest range exceeds 88% for all the samples. The optical band gap decreases from 3.27 to 3.15 eV with increasing Ar pressure from 0.6 to 3.0 Pa.
文摘A single solid source precursor bis-(morpholinodithioato-s,s’)-Mo was prepared and molybdenum sulphide thin film was deposited on sodalime glass using Metal Organic Chemical Vapour Deposition (MOCVD) technique at deposition temperature of 420?C. The film was characterized using Rutherford Backscattering Spectroscopy (RBS), Ultraviolet-Visible Spectroscopy, Four point probe technique, Scanning Electron Mi-croscopy (SEM), X-ray Diffractometry (XRD) and Atomic Force Microscopy (AFM). A direct optical band gap of 1.77 eV was obtained from the analysis of the absorption spectrum. The sheet resistance was found to be of the order of 10P–5P ΩP–1P?cmP–1P. SEM micrographs of the films showed the layered structure of the film with an estimated grain size that is less than 2 μm while XRD indicates parallel orientation of the basal plane to the substrate surface.
文摘Thin films of hydrazine molybdenum （MoO4N4H6）, a new inorganic azo dye, were synthesized and deposited on a commercial glass substrate using the chemical bath deposition technique. Subsequently, the optical transmission, reflectivity, absorption, refractive index, and dielectric constant of hydrazine molybdenum were investigated using an ultraviolet-visible spectrophotometer. In addition, the film structure was analyzed by mid-infrared spectroscopy. The spectra of the films were found to be in line with those in the literature. The surface properties of all films were examined using a computer-controlled digital scanning electron microscope with a secondary electron detector. The areas of application and the technological advantages of this material were also considered.
