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Effects of external parameters on plasma characteristics and uniformity in a dual cylindrical inductively coupled plasma
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作者 Pengyu WANG Siyu XING +5 位作者 Daoman HAN Yuru ZHANG Yong LI Cheng ZHOU Fei GAO Younian WANG 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第12期63-74,共12页
The dual cylindrical inductively coupled plasma source,compared to the conventional structure of inductively coupled plasma source,can significantly improve the uniformity of plasma.It has an enhanced potential for ap... The dual cylindrical inductively coupled plasma source,compared to the conventional structure of inductively coupled plasma source,can significantly improve the uniformity of plasma.It has an enhanced potential for application in processes,such as etching and ashing.A uniform plasma can be obtained by allowing the remote plasma from the upper chamber modulate the main plasma generated in the lower chamber.In this study,a fluid model was employed to investigate a dual cylindrical inductively coupled Ar/O_(2)discharge.The effects of external parameters on electron density,electron temperature,O atomic density,and plasma uniformity in the main chamber were studied,and the reasons were analyzed.The results of this study show that remote power can control the plasma uniformity and increase the plasma density in the main chamber.As the remote power increased,plasma uniformity improved initially and then deteriorated.The main power affected the plasma density at the edge of the main chamber and can modulate the plasma density in the main chamber.The gas pressure affected both the uniformity and density of the plasma.As the gas pressure increased,the plasma uniformity deteriorated,but the free radical density improved. 展开更多
关键词 dual inductively coupled plasma remote plasma plasma uniformity fluid model
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Effect of coil and chamber structure on plasma radial uniformity in radio frequency inductively coupled plasma
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作者 赵洋 周晓华 +2 位作者 高升荣 宋莎莎 赵玉真 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第7期58-66,共9页
Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma(ICP)to meet the demand for large-area and uniformly distributed plasma in industrial m... Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma(ICP)to meet the demand for large-area and uniformly distributed plasma in industrial manufacturing.This study utilized a two-dimensional self-consistent fluid model to investigate how different coil configurations and chamber aspect ratios affect the radial uniformity of plasma in radio frequency ICP.The findings indicate that optimizing the radial spacing of the coil enhances plasma uniformity but with a reduction in electron density.Furthermore,optimizing the coil within the ICP reactor,using the interior point method in the Interior Point Optimizer significantly enhances plasma uniformity,elevating it from 56%to 96%within the range of the model sizes.Additionally,when the chamber aspect ratio k changes from 2.8 to 4.7,the plasma distribution changes from a center-high to a saddleshaped distribution.Moreover,the plasma uniformity becomes worse.Finally,adjusting process parameters,such as increasing source power and gas pressure,can enhance plasma uniformity.These findings contribute to optimizing the etching process by improving plasma radial uniformity. 展开更多
关键词 inductively coupled plasma fluid simulation optimized coil chamber aspect ratio plasma uniformity
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Transient multi-physics behavior of an insert high temperature superconducting no-insulation coil in hybrid superconducting magnets with inductive coupling 被引量:1
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作者 Xiang KANG Yujin TONG +1 位作者 Wei WU Xingzhe WANG 《Applied Mathematics and Mechanics(English Edition)》 SCIE EI CSCD 2023年第2期255-272,共18页
A transient multi-physics model incorporated with an electromagneto-thermomechanical coupling is developed to capture the multi-field behavior of a single-pancake(SP)insert no-insulation(NI)coil in a hybrid magnet dur... A transient multi-physics model incorporated with an electromagneto-thermomechanical coupling is developed to capture the multi-field behavior of a single-pancake(SP)insert no-insulation(NI)coil in a hybrid magnet during the charging and discharging processes.The coupled problem is resolved by means of the finite element method(FEM)for the magneto-thermo-elastic behaviors and the Runge-Kutta method for the transient responses of the electrical circuits of the hybrid superconducting magnet system.The results reveal that the transient multi-physics responses of the insert NI coil primarily depend on the charging/discharging procedure of the hybrid magnet.Moreover,a reverse azimuthal current and a compressive hoop stress are induced in the insert NI coil during the charging process,while a forward azimuthal current and a tensile hoop stress are observed during the discharging process.The induced voltages in the insert NI coil can drive the currents flowing across the radial turns where the contact resistance exists.Therefore,it brings forth significant Joule heat,causing a temperature rise and a uniform distribution of this heat in the coil turns.Accordingly,a thermally/mechanically unstable or quenching event may be encountered when a high operating current is flowing in the insert NI coil.It is numerically predicted that a quick charging will induce a compressive hoop stress which may bring a risk of buckling instability in the coil,while a discharging will not.The simulations provide an insight of hybrid superconducting magnets under transient start-up or shutdown phases which are inevitably encountered in practical applications. 展开更多
关键词 hybrid superconducting magnet high temperature superconducting(HTS)no-insulation(NI)coil inductive coupling multi-physics field thermal stability
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Experimental studies of H_(2)/Ar plasma in a cylindrical inductive discharge with an expansion region
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作者 Shi-Bo Li Si-Yu Xing +1 位作者 Fei Gao You-Nian Wang 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第10期321-330,共10页
The electrical parameters of H_(2)/Ar plasma in a cylindrical inductive discharge with an expansion region are investigated by a Langmuir probe,where Ar fractions range from 0%to 100%.The influence of gas composition ... The electrical parameters of H_(2)/Ar plasma in a cylindrical inductive discharge with an expansion region are investigated by a Langmuir probe,where Ar fractions range from 0%to 100%.The influence of gas composition and pressure on electron density,the effective electron temperature and the electron energy probability functions(EEPFs)at different spatial positions are present.In driver region,with the introduction of a small amount of Ar at 0.3 Pa,there is a rapid increase in electron density accompanied by a decrease in the effective electron temperature.Additionally,the shape of the EEPF transitions from a three-temperature distribution to a bi-Maxwellian distribution due to an increase in electron-electron collision.However,this phenomenon resulting from the changes in gas composition vanishes at 5 Pa due to the prior depletion of energetic electrons caused by the increase in pressure during hydrogen discharge.The EEPFs for the total energy in expansion region is coincident to these in the driver region at 0.3 Pa,as do the patterns of electron density variation between these two regions for differing Ar fractions.At 5 Pa,as the discharge transitions from H_(2)to Ar,the EEPFs evolved from a bi-Maxwellian distribution with pronounced low energy electrons to a Maxwellian distribution in expansion region.This evolve may be attributed to a reduction in molecular vibrational excitation reactions of electrons during transport and the transition from localized electron dynamics in hydrogen discharge to non-localized electron dynamics in argon discharge.In order to validate the experimental results,we use the COMSOL simulation software to calculate electrical parameters under the same conditions.The evolution and spatial distribution of the electrical parameters of the simulation results agree well with the trend of the experimental results. 展开更多
关键词 inductively coupled plasma transmission and distribution energy distribution functions
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Coupled Numerical Simulation of Electromagnetic and Flow Fields in a Magnetohydrodynamic Induction Pump
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作者 He Wang Ying He 《Fluid Dynamics & Materials Processing》 EI 2024年第4期889-899,共11页
Magnetohydrodynamic(MHD)induction pumps are contactless pumps able to withstand harsh environments.The rate of fluid flow through the pump directly affects the efficiency and stability of the device.To explore the inf... Magnetohydrodynamic(MHD)induction pumps are contactless pumps able to withstand harsh environments.The rate of fluid flow through the pump directly affects the efficiency and stability of the device.To explore the influence of induction pump settings on the related delivery speed,in this study,a numerical model for coupled electromagnetic and flow field effects is introduced and used to simulate liquid metal lithium flow in the induction pump.The effects of current intensity,frequency,coil turns and coil winding size on the velocity of the working fluid are analyzed.It is shown that the first three parameters have a significant impact,while changes in the coil turns have a negligible influence.The maximum increase in working fluid velocity within the pump for the parameter combination investigated in this paper is approximately 618%.As the frequency is increased from 20 to 60 Hz,the maximum increase in the mean flow rate of the working fluid is approximately 241%.These research findings are intended to support the design and optimization of these devices. 展开更多
关键词 Magnetic fluid multi-physical field coupling induction pump numerical simulation liquid metal conveying
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Orthogonal Frequency Division Multiplexing Adaptive Technology for Multinode Users of Seawater Channel Based on Inductively Coupled Mooring Chain
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作者 ZHENG Yu LIU Yingjie +3 位作者 REN Yuanhong FEI Chen ZHANG Shijiang LI Hongzhi 《Journal of Ocean University of China》 SCIE CAS CSCD 2023年第5期1243-1252,共10页
As an important part of buoy-type ocean monitoring systems,the inductively coupled mooring chain solves the problem of data cotransmission through the multinode sensors that it carries,which is significant for the rap... As an important part of buoy-type ocean monitoring systems,the inductively coupled mooring chain solves the problem of data cotransmission through the multinode sensors that it carries,which is significant for the rapid acquisition of fish,hydrology,and other information.This paper is based on a seawater channel transmission model with a depth of 300 m and a bandwidth of 2 MHz.An orthogonal frequency division multiplexing(OFDM)technology is used to overcome the multipath effect of signal transmission on a seawater medium.The adaptive technology is integrated into the OFDM,and an improved joint subcarrier and bit power allocation algorithm is proposed.This algorithm solves the problem of dynamic subcarrier allocation during the cotransmission of underwater multinode user data in seawater channels.The results show that the algorithm complexity can be reduced by 0.18126×10^(-2)s during one complete OFDM system data transmission by the improved greedy algorithm,and a total of 216 bits are transmitted by the OFDM.The normalized channel capacity can be improved by 0.012 bit s^(-1)Hz^(-1).At the bit error ratio(BER)of 10^(-3),the BER performance can be improved by approximately 6 d B.When the numbers of users are 4 and 8,the improved algorithm increases the channel capacity,and the higher the number of users,the more evident the channel capacity improvement effect is.The results of this paper have an important reference value for enhancing the transmission performance of inductively coupled mooring chain underwater multinode data. 展开更多
关键词 inductively coupled mooring chain seawater channel multinode users OFDM adaptive technology
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Fluid simulation of the effect of a dielectric window with high temperature on plasma parameters in inductively coupled plasma
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作者 李娜 韩道满 +3 位作者 张权治 刘旭辉 王英杰 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2023年第3期51-61,共11页
To maintain the high-density plasma source in inductively coupled plasma(ICP),very high radiofrequency power is often delivered to the antenna,which can heat the dielectric windows near the antenna to high temperature... To maintain the high-density plasma source in inductively coupled plasma(ICP),very high radiofrequency power is often delivered to the antenna,which can heat the dielectric windows near the antenna to high temperature.This high temperature can modulate the plasma characteristics to a large degree.We thus study the effect of dielectric window temperature on plasma parameters in two different ICP structures based on COMSOL software.The distributions of various plasma species are examined at different dielectric window temperatures.The concentration of neutral gas is found to be largely modulated at high dielectric window temperature,which further affects the electron collision probability with neutrals and the electron temperature.However,the electron density profiles are barely affected by the dielectric window temperature,which is mainly concentrated at the center of the reactor due to the fixed power input and pressure. 展开更多
关键词 fluid simulation metastable argon dielectric window temperature inductively coupled plasma
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A fast hybrid simulation approach of ion energy and angular distributions in biased inductively coupled Ar plasmas
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作者 赵明亮 张钰如 +1 位作者 高飞 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2023年第7期61-71,共11页
In this work,a two-dimensional hybrid model,which consists of a bulk fluid module,a sheath module and an ion Monte-Carlo module,is developed to investigate the modulation of ion energy and angular distributions at dif... In this work,a two-dimensional hybrid model,which consists of a bulk fluid module,a sheath module and an ion Monte-Carlo module,is developed to investigate the modulation of ion energy and angular distributions at different radial positions in a biased argon inductively coupled plasma.The results indicate that when the bias voltage amplitude increases or the bias frequency decreases,the ion energy peak separation width becomes wider.Besides,the widths of the ion energy peaks at the edge of the substrate are smaller than those at the center due to the lower plasma density there,indicating the nonuniformity of the ion energy distribution function(IEDF)along the radial direction.As the pressure increases from 1 to 10 Pa,the discrepancy of the IEDFs at different radial positions becomes more obvious,i.e.the IEDF at the radial edge is characterized by multiple low energy peaks.When a dual frequency bias source is applied,the IEDF exhibits three or four peaks,and it could be modulated efficiently by the relative phase between the two bias frequencies.The results obtained in this work could help to improve the radial uniformity of the IEDF and thus the etching process. 展开更多
关键词 biased inductively coupled plasma 2D hybrid model IEADs
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Design of inductive coupling channel analysis system based on LabVIEW 被引量:1
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作者 QIU Zu-rong ZHANG Qi +1 位作者 LI Hong-zhi ZHANG Xiao-wei 《Journal of Measurement Science and Instrumentation》 CAS CSCD 2018年第4期360-366,共7页
Inductive coupling transmission system is an important measurement device for acquiring and transmitting marine environmental information.However,low transmission rate cannot meet the current demand for large data tra... Inductive coupling transmission system is an important measurement device for acquiring and transmitting marine environmental information.However,low transmission rate cannot meet the current demand for large data transmission in marine environment detection at home.In order to improve the transmission performance of the system in practical communication system,optimizing the design by directly changing the circuit parameters is time-consuming and expensive.Therefore,a set of inductive coupling transmission channel analysis system is designed based on virtual instrument to improve the transmission rate and reliability of inductive coupling transmission system.The bit error rate of channel system at different frequency and noise levels are tested by using three kinds of digital modulation mode including amplitude shift keying(ASK),frequency shift keying(FSK)and differential phase shift keying(DPSK),taking square wave and sine wave as a carrier.Finally,the sine wave is selected to be carrier signal and DPSK is chosen to be modulation mode.The reliable transmission of signal with the error rate less than0.005and the transmission rate of9600bps,at the noise level of-10dB,is realized and verified by the debugging circuit experiments with multi-nodes in the laboratory.The study provides an important experimental evidence for improving signal transmission reliability of inductive coupling transmission system. 展开更多
关键词 inductive coupling transmission transmission rate virtual instrument modulation and demodulation
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Inductively Coupling Plasma(ICP) Treatment of Propylene(PP) Surface and Adhesion Improvement
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作者 刘彦君 傅彦培 《Plasma Science and Technology》 SCIE EI CAS CSCD 2009年第6期704-708,共5页
Study on increasing the roughness of the polymer substrate surface to enhance the adhesion with the copper layer in an inductively coupling plasma (ICP) process was carried out. The microstructure of the polymer sub... Study on increasing the roughness of the polymer substrate surface to enhance the adhesion with the copper layer in an inductively coupling plasma (ICP) process was carried out. The microstructure of the polymer substrate surfaces, which were exposed to different kinds of plasma treatment, was identified by scanning electron microscopy(SEM) analysis, peel strength of the copper coating and water surface contact angle. The adhesion of the substrate was largely enhanced by plasma treatment and the copper deposited coating reached a value of 7.68 kgf/m in verifying the adhesion of the copper coating with polymer material. The quality of the line/space 50/50 μm produced in the laboratory was examined by the pressure cooker test and proved to meet the requirement. 展开更多
关键词 inductively coupling plasma (ICP) water contact angle peel strength
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Determination on Heavy Metals Content of Achyranthes bidentata Blume. through Inductively Coupled Plasma Mass Spectrometry (ICP-MS) 被引量:4
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作者 李宇伟 王新民 +3 位作者 连瑞丽 魏志华 介晓磊 陈士林 《Agricultural Science & Technology》 CAS 2008年第5期145-149,共5页
[Objective] The inductively coupled plasma mass spectrometry(ICP-MS)was constructed to determine the contents of lead,cadmium,mercury and arsenic in Archyranthes bidentata Blume.[Method]Under the optimum operation con... [Objective] The inductively coupled plasma mass spectrometry(ICP-MS)was constructed to determine the contents of lead,cadmium,mercury and arsenic in Archyranthes bidentata Blume.[Method]Under the optimum operation condition of ICP-MS,the samples were digested by microwave.The element 114In was taken as an internal standard element to compensate body effect and ICP-MS method was used to determine the contents of lead,cadmium,mercury and arsenic.[Result]For the determined elements,the correlation coefficient(r)of standard curve was over 0.9995 and recovery rate was from 96.7% to 106.4% while RSD was less than 11.2%.The result of determination showed that the heavy metal content in Archyranthes bidentata Blume.beyond standard was serious.[Conclusion]The constructed ICP-MS method with simple operation,rapid response,accuracy and high sensitivity in this experiment could be used for quality control of Chinese medicinal materials by detecting heavy metal contents in different Chinese medicinal materials from original places. 展开更多
关键词 MICROWAVE DIGESTION inductively coupled plasma mass spectrometry(ICP-MS) Achyranthes bidentata Blume. HEAVY metal
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Quantification of trace amounts of impurities in high purity cobalt by high resolution inductively coupled plasma mass spectrometry 被引量:10
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作者 XIE Hualin HUANG Kelong +1 位作者 NIE Xidu TANG Yougen 《Rare Metals》 SCIE EI CAS CSCD 2007年第3期286-291,共6页
A An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of 24 elements (Be, Mg, A1, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, ... A An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of 24 elements (Be, Mg, A1, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, Mo, Ag, Cd, Sn Sb, Ba, Pt, Au, and Pb) in high purity cobalt was described. Sample digestions were performed in closed microwave vessels using HNO3 and HCI. The matrix effects because of the presence of excess HCI and Co were evaluated. The usefulness of high mass resolution for overcoming some spectral interference was demonstrated. The optimum conditions for the determination were tested and discussed. The standard addition method was employed for quantitative analysis. The detection limits were 0.016-1.50 ].tg·g^-1, the recovery ratios were 92.2%-111.2%, and the RSD was less than 3.6%. The method was accurate, quick, and convenient. It was applied to the determination of trace impurities in high purity cobalt with satisfactory results. 展开更多
关键词 high resolution inductively coupled plasma mass spectrometry high purity cobalt trace impurities matrix effect standard addition method
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Experimental Study of the Influence of Process Pressure and Gas Composition on GaAs Etching Characteristics in Cl_2/BCl_3-Based Inductively Coupled Plasma 被引量:5
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作者 D.S.RAWAL B.K.SEHGAL +1 位作者 R.MURALIDHARAN H.K.MALIK 《Plasma Science and Technology》 SCIE EI CAS CSCD 2011年第2期223-229,共7页
A study of Cl2/BCl3-based inductively coupled plasma (ICP) was conducted using thick photoresist mask for anisotropic etching of 50μm diameter holes in a GaAs wafer at a relatively high average etching rate for etc... A study of Cl2/BCl3-based inductively coupled plasma (ICP) was conducted using thick photoresist mask for anisotropic etching of 50μm diameter holes in a GaAs wafer at a relatively high average etching rate for etching depths of more than 150μm. Plasma etch characteristics with ICP process pressure and the percentage of BCI3 were studied in greater detail at a constant ICP coil/bias power. The measured peak-to-peak voltage as a function of pressure was used to estimate the minimum energy of the ions bombarding the substrate. The process pressure was found to have a substantial influence on the energy of heavy ions. Various ion species in plasma showed minimum energy variation from 1.85 eV to 7.5 eV in the pressure range of 20 mTorr to 50 mTorr. The effect of pressure and the percentage of BCl3 on the etching rate and surface smoothness of the bottom surface of the etched hole were studied for a fixed total flow rate. The etching rate was found to decrease with the percentage of BCl3, whereas the addition of BCl3 resulted in anisotropic holes with a smooth veil free bottom surface at a pressure of 30 mTorr and 42% BC13. In addition, variation of the etching yield with pressure and etching depth were also investigated. 展开更多
关键词 GAAS inductively coupled plasma ETCHING ion energy etch yield
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Quantum Fluctuation of a Mesoscopic Inductance Coupling Circuit at Finite Temperature 被引量:16
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作者 SONGTong-Qiang ZHUYue-Jin 《Communications in Theoretical Physics》 SCIE CAS CSCD 2003年第4期447-450,共4页
We study the quantization of mesoscopic inductance coupling circuit and discuss its time evolution. Bymeans of the thermal field dynamics theory we study the quantum fluctuation of the system at finite temperature.
关键词 mesoscopic inductance coupling circuit quantum fluctuation Joule heat effects
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Spheroidization of silica powders by radio frequency inductively coupled plasma with Ar–H2 and Ar–N2 as the sheath gases at atmospheric pressure 被引量:3
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作者 Lin Li Guo-hua Ni +3 位作者 Qi-jia Guo Qi-fu Lin Peng Zhao Jun-li Cheng 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2017年第9期1067-1074,共8页
Amorphous spherical silica powders were prepared by inductively coupled thermal plasma treatment at a radio frequency of 36.2 MHz. The effects of the added content of hydrogen and nitrogen into argon(serving as the sh... Amorphous spherical silica powders were prepared by inductively coupled thermal plasma treatment at a radio frequency of 36.2 MHz. The effects of the added content of hydrogen and nitrogen into argon(serving as the sheath gas), as well as the carrier gas flow rate, on the spheroidization rate of silica powders, were investigated. The prepared silica powders before and after plasma treatment were examined by scanning electron microscopy, X-ray diffraction, and laser granulometric analysis. Results indicated that the average size of the silica particles increased, and the transformation of crystals into the amorphous state occurred after plasma treatment. Discharge image processing was employed to analyze the effect of the plasma temperature field on the spheroidization rate. The spheroidization rate of the silica powder increased with the increase of the hydrogen content in the sheath gas. On the other hand, the spheroidization rate of the silica power first increased and then decreased with the increase of the nitrogen content in the sheath gas. Moreover, the amorphous content increased with the increase of the spheroidization rate of the silica powder. 展开更多
关键词 silica powders SPHEROIDIZATION inductively coupled plasma mixed gas
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Microstructure, Hardness and Corrosion Resistance of ZrN Films Prepared by Inductively Coupled Plasma Enhanced RF Magnetron Sputtering 被引量:4
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作者 文峰 孟月东 +1 位作者 任兆杏 舒兴胜 《Plasma Science and Technology》 SCIE EI CAS CSCD 2008年第2期170-175,共6页
ZrN fihns were deposited on Si(111) and M2 steel by inductively coupled plasma (ICP)-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance ... ZrN fihns were deposited on Si(111) and M2 steel by inductively coupled plasma (ICP)-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance of ZrN films was investigated. When the ICP power is below 300 W, the ZrN films show a columnar structure. With the increase of ICP power, the texture coefficient (To) of the (111) plane, the nanohardness and elastic modulus of the films increase and reach the maximum at a power of 300 W. As the ICP Power exceeds 300 W, the films exhibit a ZrN and ZrNx mixed crystal structure without columnar grain while the nanohardness and elastic modulus of the films decrease. All the ZrN coated samples show a higher corrosion resistance than that of the bare M2 steel substrate in 3.5% NaCl electrolyte. The nanohardness and elastic modulus mostly depend on the crystalline structure and Tc of ZrN(111). 展开更多
关键词 inductively coupled plasma (ICP) magnetron sputtering zirconium nitride nficrostructure nano-hardness corrosion resistance
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Ion Density Distribution in an Inductively Coupled Plasma Chamber 被引量:4
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作者 陈俊芳 赵文锋 +2 位作者 吴先球 樊双莉 符斯列 《Plasma Science and Technology》 SCIE EI CAS CSCD 2004年第2期2233-2236,共4页
The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa, 27 Pa and 53 Pa in the reaction chamb... The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa, 27 Pa and 53 Pa in the reaction chamber, different radio-frequency powers and different positions. The result indicates that the ion density decreases as the pressure increases, and increases as the power decreases. The ion density of axial position z =0 achieves 5.8×1010 on the center of coil under the power of 200 w and pressure of 9 Pa in the reaction chamber. 展开更多
关键词 inductively coupled plasma ion density distribution angmuir probe
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Modeling Approach and Analysis of the Structural Parameters of an Inductively Coupled Plasma Etcher Based on a Regression Orthogonal Design 被引量:3
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作者 程嘉 朱煜 季林红 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第12期1059-1068,共10页
The geometry of an inductively coupled plasma (ICP) etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these pa... The geometry of an inductively coupled plasma (ICP) etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these parameters were determined by the "trial and error" method, resulting in wastes of time and funds. In this paper, a new approach of regression orthogonal design with plasma simulation experiments is proposed to investigate the sensitivity of the structural parameters on the uniformity of plasma characteristics. The tool for simulating plasma is CFD-ACE+, which is commercial multi-physical modeling software that has been proven to be accurate for plasma simulation. The simulated experimental results are analyzed to get a regression equation on three structural parameters. Through this equation, engineers can compute the uniformity of the electron number density rapidly without modeling by CFD-ACE+. An optimization performed at the end produces good results. 展开更多
关键词 fluid model inductively coupled plasma regression orthogonal structural parameters design of experiment
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Surface Modification of Nanometre Silicon Carbide Powder with Polystyrene by Inductively Coupled Plasma 被引量:3
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作者 韦刚 孟月东 +5 位作者 钟少锋 刘峰 蒋仲庆 舒兴胜 任兆杏 王祥科 《Plasma Science and Technology》 SCIE EI CAS CSCD 2008年第1期78-82,共5页
An investigation was made into polystyrene (PS) grafted onto nanometre silicon carbide (SIC) particles. In our experiment, the grafting polymerization reaction was induced by a radio frequency (RF) inductively c... An investigation was made into polystyrene (PS) grafted onto nanometre silicon carbide (SIC) particles. In our experiment, the grafting polymerization reaction was induced by a radio frequency (RF) inductively coupled plasma (ICP) treatment of the nanometre powder. FTIR (Fourier transform infrared spectrum) and XPS (X-ray photoelectron spectroscopy) results reveal that PS is grafted onto the surface of silicon carbide powder. An analysis is presented on the effectiveness of this approach as a function of plasma operating variables including the plasma treating power, treating time, and grafting reaction temperature and time. 展开更多
关键词 inductively coupled plasma graft polymerization SIC
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Simultaneous determination of some trace metal impurities in high-purity sodium tungstate using coprecipitation and inductively coupled plasma atomic emission spectrometry 被引量:3
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作者 MAXiaoguo KUANGTongchun LIUQianjun 《Rare Metals》 SCIE EI CAS CSCD 2004年第3期193-196,共4页
A method based on the combination of coprecipitation with inductively coupledplasma atomic emission spectrometry (ICP-AES) was developed for the determination of impurities inhigh-purity sodium tungstate. Six elements... A method based on the combination of coprecipitation with inductively coupledplasma atomic emission spectrometry (ICP-AES) was developed for the determination of impurities inhigh-purity sodium tungstate. Six elements (Co, Cu, Fe, Mn, Ni, and Pb) were coprecipitated bylanthanum hydroxide so as to be concentrated and separated from the tungsten matrix. Effects of somefactors on the recoveries of the analytes and on the residual amount of sodium tungstate wereinvestigated, and the optimum conditions for the coprecipitation were proposed. Matrix-matchingcalibration curve method was used for the analysis. It is shown that the elements mentioned abovecan be quantitatively recovered. The detection limits for Co, Cu, Fe, Mn, Ni, and Pb are 0.07, 0.4,0.2, 0.1, 0.6, and 1.3 μg·g^(-1), respectively. The recoveries vary from 92.5% to 108%, and therelative standard deviations (RSDs) are in the range of 3.1%-5.5%. 展开更多
关键词 analytical chemistry trace metal determination inductively coupled plasmaatomic emission spectrometry (ICP-AES) coprecipitation sodium tungstate
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