Study on guided-mode resonance characteristic of multilayer dielectric grating with broadband and wide using-angle

Guided-mode resonance in a diffraction band of multilayer dielectric gratings may lead to a catastrophic result in laser system, especially in the ultrashort pulse laser system, so the inhibition of guided-mode resonance is very important. In this paper the characteristics of guided-mode resonance in multilayer dielectric grating are studied with the aim of better understanding the physical process of guided-mode resonance and designing a broadband multilayer dielectric grating with no guided-mode resonance. By employing waveguide theory, all guided-wave modes appearing in multilayer dielectric grating are found, and the incident conditions, separately, corresponding to each guided-wave mode are also obtained. The electric field enhancement in multilayer dielectric grating is shown obviously. Furthermore, from the detailed analyses on the guided-mode resonance conditions, it is found that the reduction of the grating period would effectively avoid the appearing of guided-mode resonance. And the expressions for calculating maximum periods, which ensure that no guided-mode resonance occurs in the requiring broad angle or wavelength range, are first reported. The above results calculated by waveguide theory and Fourier mode method are compared with each other, and they are coincident completely. Moreover, the method that relies on waveguide theory is more helpful for understanding the guided-mode resonance excited process and analyzing how each parameter affects the characteristic of guided-mode resonance. Therefore, the effects of multilayer dielectric grating parameters, such as period, fill factor, thickness of grating layer, et al., on the guided-mode resonance characteristic are discussed in detail based on waveguide theory, and some meaningful results are obtained.

Analysis of restriction factors of widening diffraction bandwidth of multilayer dielectric grating

In order to design a multilayer dielectric grating with wide-bandwidth diffraction spectrum, the restriction factors of both the reflection bandwidth of multilayer dielectric high-reflectivity mirror and the guided-mode resonance phe- nomenon are studied in detail. The reflection characteristics of high-reflectivity mirror in zeroth and -lst transmitted diffraction orders are quantitatively evaluated. It is found that the reflection bandwidth of high-reflectivity mirror in -lst transmitted diffraction order, which determines the final diffraction bandwidth of multilayer dielectric grating, is evidently compressed. Furthermore, it is demonstrated that the reducing of grating period is an effective approach to the elimination of guided mode resonance over a required broad band range both spectrally and angularly. In addition, the expressions for calculating the maximum period ensuring no guided mode resonance in the required bandwidth are derived. Finally, two high-efficiency pulse-compression gratings with broad-band are presented.

Broadband achromatic phase retarder based on metal-multilayer dielectric grating

A new achromatic phase retarder based on a metal-multilayer dielectric grating structure is designed using the rigorous coupled wave analysis method and the genetic algorithm. The optimized phase retarder can maintain phase retardation around 90°from 900 nm to 1200 nm, and the maximum deviation is less than 4.5% while the diffraction efficiencies of TE and TM waves are both higher than 95%. Numerical analysis shows the designed phase retarder has a high fabrication tolerance of groove depth, duty cycle and incident angle. This achromatic phase retarder is simple in design and stable in performance, and can be widely used in optical systems.

Nanosecond laser conditioning of multilayer dielectric gratings for picosecond–petawatt laser systems

Multilayer dielectric gratings(MLDGs)are crucial for pulse compression in picosecond-petawatt laser systems.Bulged nodular defects,embedded in coating stacks during multilayer deposition,influence the lithographic process and performance of the final MLDG products.In this study,the integration of nanosecond laser conditioning(NLC)into different manufacturing stages of MLDGs was proposed for the first time on multilayer dielectric films(MLDFs)and final grating products to improve laser-induced damage performance.The results suggest that the remaining nodular ejection pits introduced by the two protocols exhibit a high nanosecond laser damage resistance,which remains stable when the irradiated laser fluence is more than twice the nanosecond-laser-induced damage threshold(nanosecond-LIDT)of the unconditioned MLDGs.Furthermore,the picosecond-LIDT of the nodular ej ection pit conditioned on the MLDFs was approximately 40%higher than that of the nodular defects,and the loss of the grating structure surrounding the nodular defects was avoided.Therefore,NLC is an effective strategy for improving the laser damage resistance of MLDGs.

高抗激光损伤阈值光栅后处理抛光技术研究

脉冲压缩光栅是实现高能量激光的核心光学元器件,其制造过程中产生的表面污染物和微结构缺陷成为限制高功率激光系统发展的技术瓶颈,为了提升光栅的激光诱导损伤阈值,提出利用磁性复合流体进行脉冲压缩光栅(PCG)后处理抛光研究。对抛光前后光栅样品的微观结构,表面形貌、表面粗糙度、衍射效率和激光诱导损伤阈值等参数进行测量,进行抛光前后光栅表面质量和光栅性能的评估。研究发现,磁性复合流体抛光能够在不破坏实际光栅结构的前提下抑制加工过程产生的毛刺,微结构缺陷等;经3 min抛光后,光栅顶部表面粗糙度从21.36 nm下降到3.73 nm;激光诱导损伤阈值从2.8 J/cm^(2)提高到3.8 J/cm^(2),抗激光损伤性能提升35.7%,且不影响衍射效率。实验结果表明:磁性复合流体抛光是一种可以提高光栅元件表面质量,提升光栅元件光学性能的有效方法。

Multilayer dielectric grating pillar-removal damage induced by a picosecond laser

Multilayer dielectric gratings typically remove multiple-grating pillars after picosecond laser irradiation;however,the dynamic formation process of the removal is still unclear.In this study,the damage morphologies of multilayer dielectric gratings induced by an 8.6-ps laser pulse were closely examined.The damage included the removal of a single grating pillar and consecutive adjacent grating pillars and did not involve the destruction of the internal high-reflection mirror structure.Comparative analysis of the two damage morphological characteristics indicated the removal of adjacent pillars was related to an impact process caused by the eruption of localized materials from the left-hand pillar,exerting impact pressure on its adjacent pillars and eventually resulting in multiple pillar removal.A finite-element strain model was used to calculate the stress distribution of the grating after impact.According to the electric field distribution,the eruptive pressure of the dielectric materials after ionization was also simulated.The results suggest that the eruptive pressure resulted in a stress concentration at the root of the adjacent pillar that was sufficient to cause damage,corresponding to the experimental removal of the adjacent pillar from the root.This study provides further understanding of the laser-induced damage behavior of grating pillars and some insights into reducing the undesirable damage process for practical applications.

大尺寸衍射光学元件的扫描离子束刻蚀

总结了大尺寸衍射光学元件离子束刻蚀技术的研究进展。针对自行研制的KZ-400离子束刻蚀装置,提出了组合石墨束阑结构和多位置分步刻蚀策略来提高离子束刻蚀深度的均匀性,目前在450mm尺寸内的刻蚀深度均匀性最高可达±1%。建立了针对多层介质膜光栅的衍射强度一维空间分布在线检测系统以及用于透射衍射光学元件离子束刻蚀深度的等厚干涉在线检测系统,实现了对大尺寸衍射光学元件离子束刻蚀终点的定量、科学控制,提高了元件离子束刻蚀工艺的成功率。利用上述技术,成功研制出一系列尺寸的多层介质膜光栅、光束采样光栅、色分离光栅以及同步辐射光栅等多种衍射光学元件。

退火温度对宽带脉冲压缩光栅载体金属/介质多层高反膜的影响

分别以金(Au)作为金属层材料,氧化铪(HfO2)与氧化硅(SiO2)作为高低折射率层材料,利用物理气相沉积方法制备了用于宽带脉冲压缩光栅制作的金属/介质多层高反膜,研究了退火温度对其表面均方根粗糙度、反射率及抗化学清洗破坏能力的影响。实验结果表明:退火前后样品表面均方根粗糙度变化很小;提高退火温度能提高金属/介质多层膜的抗化学清洗破坏能力,但反射率会随之下降。250℃退火10 h后金属/介质多层膜不仅可以承受住化学清洗过程,而且反射率下降也比较小,可以作为金属/介质多层膜的最佳退火工艺。

介质膜光栅槽形无损检测方法的研究

为了从理论上探究介质膜基底光刻胶光栅掩模槽形的检测方法,对此种光栅掩模建立了以C方法为理论基础的衍射效率理论计算的数学模型,并将从实际光栅掩模的SEM照片得出的光栅槽形参数带入到该模型中,得到了一系列-1级衍射光的光谱分布曲线,这些曲线的变化趋势与一定光栅槽形相对应,提出了通过测量衍射光的光谱分布曲线判断光栅槽形的无损检测方法。分析表明,该方法在光栅槽形的检测过程中,可以较为有效地判断光刻胶是否到底,而这一点在掩模的制作工艺中至关重要。

提高多层介质膜脉宽压缩光栅阈值的清洗方法(英文)

采用HPM溶液(盐酸、双氧水和去离子水的混合液)结合氧等离子体对多层介质膜脉宽压缩光栅进行清洗研究。用X射线光电子能谱检测光栅表面的元素成分及其原子含量的变化。实验结果表明,氧等离子体处理能有效去除光栅表面残留光刻胶和碳氟化合物;再经HPM溶液清洗,反应离子束刻蚀和氧等离子体处理过程产生的金属污染物被进一步去除。经过上述清洗工艺处理后,光栅一级衍射效率仍保持在95%以上,光栅表面激光诱导损伤阈值达到1.6J/cm2(1053nm,10ps)。实验结果说明了氧等离子体和HPM溶液相结合能有效清洗多层介质膜脉宽压缩光栅,并显著提高光栅损伤阈值。

基于多层介质膜光栅的谱合成系统光束特性分析

针对多层介质膜光栅在光束谱合成系统中的应用,利用光线追迹方法,建立了基于多层介质膜光栅的谱合成系统光传输模型.多层介质膜光栅引入的相位调制包括浮雕表面上光程差与浮雕结构光程差两部分,且受到光栅槽深、占空比和光束入射角等因素的影响.利用衍射积分方法和光束非相干叠加原理,计算模拟了基于多层介质膜光栅的谱合成系统的合成光束光强分布.在此基础上,利用强度二阶矩方法分析了合成光束的光束质量,并讨论了多层介质膜光栅的槽深、占空比和制作误差等因素对合成光束特性的影响.结果表明:改变多层介质膜光栅的槽深和占空比以及中心光束入射角会影响合成光束能量,但不会影响合成光束的光束质量,合成光束的光束质量始终保持与单个子光束的光束质量相当;多层介质膜光栅的制作误差对合成光束的光束质量和能量均存在明显影响.

多层介质膜偏振无关光栅的研制

介绍了一种应用于光纤激光光谱合束的高衍射效率多层介质膜偏振无关光栅的设计及制作,给出了设计参数、制作流程和最终制作的偏振无关光栅的测量结果,在1.044-1.084μm波长范围内,实验测得的TE偏振光、TM偏振光的平均衍射效率分别为89.7%,93.8%。

HfO_2顶层多层介质膜脉宽压缩光栅的Piranha溶液清洗

为了提高HfO2顶层多层介质膜脉宽压缩光栅(PCG)的抗激光损伤性能,使用Piranha溶液(浓硫酸和双氧水的混合液)清洗PCG去除其制作工艺和使用过程中残留在表面的污染物,包括CHF3作为工作气体对HfO2进行反应离子束刻蚀生成的碳氟化合物及金属氟化物。对Piranha溶液的清洗温度、组成成分、清洗时间、清洗遍数等参数进行了系统研究,用扫描电子显微镜(SEM)观察清洗前后的PCG表面形貌,用X射线光电子能谱仪(XPS)检测清洗前后PCG表面的元素成分及其原子分数的变化,并分析了各残留污染物的去除机理。实验结果表明:Piranha溶液能有效去除PCG表面污染物,而且清洗温度越高,清洗遍数越多,对PCG表面残留污染物的去除效果越显著。在90℃下60min有效活性时间内,使用浓硫酸和双氧水体积比为2∶1的Piranha溶液清洗3遍以上,PCG表面残留的F元素的原子分数接近0.1%(XPS的分辨极限),达到良好的清洗效果。

多层介质膜脉冲压缩光栅激光损伤特性研究进展

本文结合国内外研究情况,概括性介绍了用于啁啾脉冲放大系统中的多层介质膜脉冲压缩光栅的激光损伤特性研究进展,包括多层介质膜的损伤、表面浮雕结构的损伤,以及介质膜光栅损伤的影响因素。在关于介质膜光栅激光损伤的影响因素中又分别介绍了槽型结构、制备工艺、激光参数、脉冲数量、热应力和杂质缺陷对其抗激光损伤阈值的影响。最后,从结构设计、制备工艺以及后期处理等方面,介绍了提高多层介质膜光栅抗激光损伤阈值的常用方法。

多层介质膜脉宽压缩光栅清洗方法研究

采用SPM(Sulfuric-Peroxide Mixtures,98wt%H2SO4+30wt%H2O2)+兆声(方法1)和氧等离子体+HPM(Hydrochloric/Peroxide Mixture,37wt%HCl+30wt%H2O2+DIH2O)+兆声(方法2)两种清洗方法对多层介质膜脉宽压缩光栅进行清洗,并对清洗前后样品的表面元素含量、衍射效率、表面粗糙度、表面温升以及激光损伤阈值等参数进行测量以评估两种清洗方法清洗效果。在入射角70°,脉宽12 ns,s偏振,波长1064 nm的激光辐照下,经过清洗方法1清洗后的光栅样品单脉冲激光损伤阈值为7.55 J/cm2,而方法2清洗后的样品损伤阈值为5.32 J/cm2。另外,虽然经过方法2清洗后样品表面杂质含量更低,但是在衍射效率、表面粗糙度和表面温升都劣于经方法1清洗后的样品,进一步分析发现方法2中氧等离子体清洗过程引入的Fe元素影响了其样品损伤性能和温升性能。因此,SPM清洗方法可以作为多层介质膜脉宽压缩光栅提升抗激光损伤性能的优化清洗方案。

多层介质膜光栅激光预处理(英文)

在N-on-1测试模式下研究了多层介质膜光栅的激光预处理效应。实验发现,激光预处理之后多层介质光栅膜的阈值能提高到处理前阈值的1.5～2.0倍。预处理机制可能是低能量密度激光辐照减少了光栅表面的污染物并降低了光栅表面的粗糙度。激光预处理可以作为优化光栅结构、酸洗等一系列提高多层介质膜光栅阈值方法的一个补充。

Laser induced damage of multi-layer dielectric used in pulse compressor gratings

Laser induced damage threshold (LIDT) of multi-layer dielectric used in pulse compressor gratings (PCG) was investigated. The sample was prepared by e-beam evaporation (EBE). LIDT was detected following ISO standard 11254-1.2. It was found that LIDTs of normal and 51.2° incidence (transverse electric (TE) mode) were 14.14 and 9.31 J/cm2, respectively. A Nomarski microscope was employed to map the damage morphology, and it was found that the damage behavior was pit-concave-plat structure for normal incidence, while it was pit structure for 51.2° incidence with TE mode. The electric field distribution was calculated to illuminate the difference of LIDT between the two incident cases.

光纤激光器光谱合束技术综述

对实现高功率、高光束质量输出的光纤激光器光谱合束技术进行了综述。针对体布拉格光栅合束和多层介质膜光栅合束两种技术方案进行介绍,从合束原理、高功率窄线宽光纤激光器单元、光栅器件以及合束方案等方面进行分析。同时,针对近年来国内外在光纤激光光谱合束技术领域的发展也进行了归纳性的介绍。

纳秒脉冲激光对多层介质膜光栅的预处理研究

在1-on-1和N-on-1实验对比基础上提出并验证了多层介质膜光栅的激光预处理效应．实验表明激光处理后多层介质膜光栅阈值能提高到处理前的1．5-2倍，激光预处理能够有效减少多层介质膜光栅表面光栅结构区的杂质污染和微结构缺陷，同时不损伤顶层光栅结构．

介质反射光栅中多层膜计算的研究

介绍了采用增强透射矩阵进行计算的严格耦合波方法,将这种方法应用到介质反射光栅的多层膜计算中。通过与商用软件计算结果的对比,证明这种计算方法的计算结果是准确可信的。与已有的计算方法比较,该方法简化了介质反射光栅的计算工作。