A sputtering-type microwave multipolar ECR plasma processing for preparing thin films, is built with Nd-Fe-B magnets and 2.45 GHz, TE<sub>10</sub> mode microwave. The plasma distributions in the axial dire...A sputtering-type microwave multipolar ECR plasma processing for preparing thin films, is built with Nd-Fe-B magnets and 2.45 GHz, TE<sub>10</sub> mode microwave. The plasma distributions in the axial direction, which is important for preparing thin films, are found to be very sensitive to the magnetic potential fields in plasma chamber. The plasma parameters are also influenced by the background gas pressure.展开更多
文摘A sputtering-type microwave multipolar ECR plasma processing for preparing thin films, is built with Nd-Fe-B magnets and 2.45 GHz, TE<sub>10</sub> mode microwave. The plasma distributions in the axial direction, which is important for preparing thin films, are found to be very sensitive to the magnetic potential fields in plasma chamber. The plasma parameters are also influenced by the background gas pressure.