This paper overviews design for manufacturing （DFM） for IC design in nano-CMOS technologies. Process/device issues relevant to the manufacturability of ICs in advanced CMOS technologies will be presented first befor...This paper overviews design for manufacturing （DFM） for IC design in nano-CMOS technologies. Process/device issues relevant to the manufacturability of ICs in advanced CMOS technologies will be presented first before an exploration on process/device modeling for DFM is done. The discussion also covers a brief introduction of DFM-aware of design flow and EDA efforts to better handle the design-manufacturing interface in very large scale IC design environment.展开更多
基金the National Natural Science Foundation of China (Grant No. 60736030)
文摘This paper overviews design for manufacturing （DFM） for IC design in nano-CMOS technologies. Process/device issues relevant to the manufacturability of ICs in advanced CMOS technologies will be presented first before an exploration on process/device modeling for DFM is done. The discussion also covers a brief introduction of DFM-aware of design flow and EDA efforts to better handle the design-manufacturing interface in very large scale IC design environment.
