Recent advances in electronic and photonic devices, such as artificial skin, wearable systems, organic and inorganic light-emitting diodes, have gained consider- able commercial and scientific interest in the academe ...Recent advances in electronic and photonic devices, such as artificial skin, wearable systems, organic and inorganic light-emitting diodes, have gained consider- able commercial and scientific interest in the academe and in industries. However, low-cost and high-throughput nano-manufacturing is difficult to realize with the use of traditional photolithographic processes. In this review, we summarize the status and the limitations of current nano- patterning techniques for scalable and flexible functional devices in terms of working principle, resolution, and processing speed. Finally, several remaining unsolved problems in nano-manufacturing are discussed, and future research directions are highlighted.展开更多
The paper proposes a novel nano-patterning method called electrically induced nanostructuring, where an external electric field, insteadof the external mechanical pressure, is applied to generate an electrohydrody- na...The paper proposes a novel nano-patterning method called electrically induced nanostructuring, where an external electric field, insteadof the external mechanical pressure, is applied to generate an electrohydrody- namic force acting on the polymer-air interface to drive the polymer＇ s flow into the mold cavities. This electri- cally induced nanostrueturing method no longer requires a large mechanical pressure externally applied for actua- ting the polymer filling in the mold cavities, and has been used to successfully fabricate micro/nano pillar arrays of a high aspect ratio （up to 10）, which have been usually considered to be ＂difficult to fabricate＂ by conventional molding or nanoimprinting processes.展开更多
III-nitride materials are of great importance in the development of modern optoelectronics,but they have been limited over years by low light utilization rate and high dislocation densities in heteroepitaxial films gr...III-nitride materials are of great importance in the development of modern optoelectronics,but they have been limited over years by low light utilization rate and high dislocation densities in heteroepitaxial films grown on foreign substrate with limited refractive index contrast and large lattice mismatches.Here,we demonstrate a paradigm of high-throughput manufacturing bioinspired microstructures on warped substrates by flexible nanoimprint lithography for promoting the light extraction capability.We design a flexible nanoimprinting mold of copolymer and a two-step etching process that enable high-efficiency fabrication of nanoimprinted compound-eye-like Al2O3 microstructure(NCAM)and nanoimprinted compound-eye-like SiO_(2)microstructure(NCSM)template,achieving a 6.4-fold increase in throughput and 25%savings in economic costs over stepper projection lithography.Compared to NCAM template,we find that the NCSM template can not only improve the light extraction capability,but also modulate the morphology of AlN nucleation layer and reduce the formation of misoriented GaN grains on the inclined sidewall of microstructures,which suppresses the dislocations generated during coalescence,resulting in 40%reduction in dislocation density.This study provides a low-cost,high-quality,and high-throughput solution for manufacturing microstructures on warped surfaces of III-nitride optoelectronic devices.展开更多
基金Acknowledgements The authors acknowledge financial support given by the National Natural Science Foundation of China （Grant Nos. 91323303, 61401292, 61405133, 61505131, and 61575135）, the Jiangsu Science andTechnology Department （Grant Nos. BK20140350, BK20140348, and BK20150309）, the Specialized Research Fund for the Doctoral Program of Higher Education （Grant No. 20133201120027）, the China Postdoctoral Science Foundation （Grant No. 2015M571816）, and the project of the Priority Academic Program Development （PAPD） of Jiangsu Higher Education Institutions.
文摘Recent advances in electronic and photonic devices, such as artificial skin, wearable systems, organic and inorganic light-emitting diodes, have gained consider- able commercial and scientific interest in the academe and in industries. However, low-cost and high-throughput nano-manufacturing is difficult to realize with the use of traditional photolithographic processes. In this review, we summarize the status and the limitations of current nano- patterning techniques for scalable and flexible functional devices in terms of working principle, resolution, and processing speed. Finally, several remaining unsolved problems in nano-manufacturing are discussed, and future research directions are highlighted.
基金Major Research Plan of NSFC on Nanomanufacturing(No.90923040)National Basic Research Program of China(No.2009CB724202)
文摘The paper proposes a novel nano-patterning method called electrically induced nanostructuring, where an external electric field, insteadof the external mechanical pressure, is applied to generate an electrohydrody- namic force acting on the polymer-air interface to drive the polymer＇ s flow into the mold cavities. This electri- cally induced nanostrueturing method no longer requires a large mechanical pressure externally applied for actua- ting the polymer filling in the mold cavities, and has been used to successfully fabricate micro/nano pillar arrays of a high aspect ratio （up to 10）, which have been usually considered to be ＂difficult to fabricate＂ by conventional molding or nanoimprinting processes.
基金supported by the National Natural Science Foundation of China(52075394)the National Key R&D Program of China(2022YFB3603603 and 2021YFB3600204)+1 种基金the Key Research and Development Program of Hubei Province(2023BAB137)the Knowledge Innovation Program of Wuhan-Basic Research,the National Youth Talent Support Program,and the Fundamental Research Funds for the Central Universities.
文摘III-nitride materials are of great importance in the development of modern optoelectronics,but they have been limited over years by low light utilization rate and high dislocation densities in heteroepitaxial films grown on foreign substrate with limited refractive index contrast and large lattice mismatches.Here,we demonstrate a paradigm of high-throughput manufacturing bioinspired microstructures on warped substrates by flexible nanoimprint lithography for promoting the light extraction capability.We design a flexible nanoimprinting mold of copolymer and a two-step etching process that enable high-efficiency fabrication of nanoimprinted compound-eye-like Al2O3 microstructure(NCAM)and nanoimprinted compound-eye-like SiO_(2)microstructure(NCSM)template,achieving a 6.4-fold increase in throughput and 25%savings in economic costs over stepper projection lithography.Compared to NCAM template,we find that the NCSM template can not only improve the light extraction capability,but also modulate the morphology of AlN nucleation layer and reduce the formation of misoriented GaN grains on the inclined sidewall of microstructures,which suppresses the dislocations generated during coalescence,resulting in 40%reduction in dislocation density.This study provides a low-cost,high-quality,and high-throughput solution for manufacturing microstructures on warped surfaces of III-nitride optoelectronic devices.
