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Structural and electrical properties of laser-crystallized nanocrystalline Ge films and nanocrystalline Ge/SiN_x multilayers 被引量:2
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作者 李悰 徐骏 +4 位作者 李伟 江小帆 孙胜华 徐岭 陈坤基 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第10期486-492,共7页
Nanocrystalline Ge (nc-Ge) single layers and nc-Ge/SiNx multilayers are prepared by laser annealing amorphous Ge (a-Ge) films and a-Ge/SiNx multilayers. The microstructures as well as the electrical properties of ... Nanocrystalline Ge (nc-Ge) single layers and nc-Ge/SiNx multilayers are prepared by laser annealing amorphous Ge (a-Ge) films and a-Ge/SiNx multilayers. The microstructures as well as the electrical properties of laser-crystallized samples are systematically studied by using various techniques. It is found that the optical band gap of nc-Ge film is reduced compared with its amorphous counterpart. The formed nc-Ge film is of p-type, and the dark conductivity is enhanced by 6 orders for an nc-Ge single layer and 4 orders for a multilayer. It is suggested that the carrier transport mechanism is dominant by the thermally activation process via the nanocrystal, which is different from the thermally annealed nc-Ge sample at an intermediate temperature. The carrier mobility of nc-Ge film can reach as high as about 39.4 cm2.V ^-1 .s^-1, which indicates their potential applications in future nano-devices. 展开更多
关键词 nanocrystalline ge microstructure carrier transport mobility
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