Erbium （Er） doped in nanocrystalline Si （nc-Si：Er） surrounded by SiO2 is investigated by selectivelyexcited photoluminescence（PL） technique. Optical transitions come from nc-Si （peak located at 1.39 eV, denote...Erbium （Er） doped in nanocrystalline Si （nc-Si：Er） surrounded by SiO2 is investigated by selectivelyexcited photoluminescence（PL） technique. Optical transitions come from nc-Si （peak located at 1.39 eV, denoted as Enc-Si） and Er ions （peak located at 0. 81 eV, denoted as EEr） are measured when nc-Si：Er is excited by 1. 519 eV or higher excitation photon energy（Eex）. Although the Eex of 1.42 eV exceeds the peak energies of Enc-Si and EEr the Enc-Si and EE, emissions are unobserved. A resonant enhancement of the EEr emission is observed in nc-Si：Er. While the PL peak intensitiy of the Enc-Si transition is quenched under this Eex. The resonant-enhanced effect in nc-Si ：Er indicates that the energy transfer process of carriers from nc-Si to nearby Er ions is enhanced by resonant excitation.展开更多
利用等离子增强化学气相沉积(PECVD)技术,采用NH_3等离子体预氮化法淀积α-SiN_x介质膜,同时结合layer by layer生长nc-Si的方法一次性原位制备了α-SiN_x/nc-Si/α-SiN_x双势垒结构样品.通过原子力显微镜(AFM)测量,估算了nc-Si的密度为...利用等离子增强化学气相沉积(PECVD)技术,采用NH_3等离子体预氮化法淀积α-SiN_x介质膜,同时结合layer by layer生长nc-Si的方法一次性原位制备了α-SiN_x/nc-Si/α-SiN_x双势垒结构样品.通过原子力显微镜(AFM)测量,估算了nc-Si的密度为1.2×10^(11)cm^(-2).通过C-V测量研究镶嵌在SiN_x双势垒层中的nc-Si颗粒的电荷存储现象.C-V曲线出现明显的迥滞现象,迴滞窗口约为1 V,表明结构中电荷存储特性.根据迴滞窗口,计算了结构中存储电荷的密度,发现存储电荷密度与nc-Si层的晶粒密度具有相同的数量级.展开更多
基金Supported by the Natural Science Foundation for Key Program of Jiangsu Higher Education Institu-tions of China(08KJA510002)the″Six Top Talents″Project of Jiangsu Province+2 种基金the Application Research Program of Nantong,China(K2007016,K2008024)the Creative Talents Foundation of Nantong Universitythe Natural Science Foundation(07Z122)of Nantong University~~
文摘Erbium （Er） doped in nanocrystalline Si （nc-Si：Er） surrounded by SiO2 is investigated by selectivelyexcited photoluminescence（PL） technique. Optical transitions come from nc-Si （peak located at 1.39 eV, denoted as Enc-Si） and Er ions （peak located at 0. 81 eV, denoted as EEr） are measured when nc-Si：Er is excited by 1. 519 eV or higher excitation photon energy（Eex）. Although the Eex of 1.42 eV exceeds the peak energies of Enc-Si and EEr the Enc-Si and EE, emissions are unobserved. A resonant enhancement of the EEr emission is observed in nc-Si：Er. While the PL peak intensitiy of the Enc-Si transition is quenched under this Eex. The resonant-enhanced effect in nc-Si ：Er indicates that the energy transfer process of carriers from nc-Si to nearby Er ions is enhanced by resonant excitation.
文摘利用等离子增强化学气相沉积(PECVD)技术,采用NH_3等离子体预氮化法淀积α-SiN_x介质膜,同时结合layer by layer生长nc-Si的方法一次性原位制备了α-SiN_x/nc-Si/α-SiN_x双势垒结构样品.通过原子力显微镜(AFM)测量,估算了nc-Si的密度为1.2×10^(11)cm^(-2).通过C-V测量研究镶嵌在SiN_x双势垒层中的nc-Si颗粒的电荷存储现象.C-V曲线出现明显的迥滞现象,迴滞窗口约为1 V,表明结构中电荷存储特性.根据迴滞窗口,计算了结构中存储电荷的密度,发现存储电荷密度与nc-Si层的晶粒密度具有相同的数量级.
