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Influence of Negative Bias Voltage on the Mechanical and Tribological Properties of MoS_2/Zr Composite Films 被引量:1
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作者 宋文龙 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2011年第3期412-416,共5页
MoS2/Zr composite films were deposited on the cemented carbide YT14 (WC+14%TiC+6%Co) by medium-frequency magnetron sputtered and coupled with multi-arc ion plated techniques.The influence of negative bias voltage ... MoS2/Zr composite films were deposited on the cemented carbide YT14 (WC+14%TiC+6%Co) by medium-frequency magnetron sputtered and coupled with multi-arc ion plated techniques.The influence of negative bias voltage on the composite film properties,including adhesion strength,micro-hardness,thickness and tribological properties were investigated.The results showed that proper negative bias voltage could significantly improve the mechanical and tribological properties of composite films.The effects of negative bias voltage on film properties were also put forward.The optimal negative bias voltage was -200 V under this experiment conditions.The obtained composite films were dense,the adhesion strength was about 60 N,the thickness was about 2.4 μm,and the micro-hardness was about 9.0 GPa.The friction coefficient and wear rate was 0.12 and 2.1×10-7 cm3/N·m respectively after 60 m sliding operation against hardened steel under a load of 20 N and a sliding speed of 200 rev·min-1. 展开更多
关键词 medium-frequency magnetron sputtering multi-arc ion plating negative bias voltage MoS2/Zr composite films tribological properties
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Adhesion of NiCu Films DC Biased Plasma-Sputter-Deposited on MgO (001) 被引量:1
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作者 Hong Qiu, Mituru Hashimoto ( Beijing Keda-Tianyu Microelectronic Material Technology Development Corporation, Beijing 100083, China Applied Science School, University of Science and Technology Beijing, Beijing 100083, China Department of Applied Phys 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2000年第3期218-221,共4页
NiCu films about 60nm thick were deposited on MgO (001) substrates at 230℃ by DC plasma-sputtering at 2.7kV and 8mA in pure Ar gas using a Ni90Cu10 target. A DC bias voltage of 0, 60, 110 or 140V was applied to the ... NiCu films about 60nm thick were deposited on MgO (001) substrates at 230℃ by DC plasma-sputtering at 2.7kV and 8mA in pure Ar gas using a Ni90Cu10 target. A DC bias voltage of 0, 60, 110 or 140V was applied to the substrate during deposition. The adhesion of the film to the substrate was studied using a scratch test as a function of . The application of is very effective in increasing the adhesion of the film to the substrate. In conclusion, the adhesion increases with cleaning the substrate surface by sputtering off impurity admolecules during the film initial formation due to the energetic Ar ion particle bombardment. 展开更多
关键词 NiCu film plasma-sputter-deposition negative bias voltage ADHESION
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