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Negative voltage bandgap reference with multilevel curvature compensation technique 被引量:1
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作者 刘溪 刘倩 +2 位作者 靳哓诗 赵永瑞 李宗昊 《Journal of Semiconductors》 EI CAS CSCD 2016年第5期114-120,共7页
A novel high-order curvature compensation negative voltage bandgap reference (NBGR) based on a novel multilevel compensation technique is introduced. Employing an exponential curvature compensation (ECC) term with... A novel high-order curvature compensation negative voltage bandgap reference (NBGR) based on a novel multilevel compensation technique is introduced. Employing an exponential curvature compensation (ECC) term with many high order terms in itself, in a lower temperature range (TR) and a multilevel curvature compen- sation (MLCC) term in a higher TR, a flattened and better effect of curvature compensation over the TR of 165℃ (--40 to 125 ℃) is realised. The MLCC circuit adds two convex curves by using two sub-threshold operated NMOS. The proposed NBGR implemented in the Central Semiconductor Manufacturing Corporation (CSMC) 0.5 #m BCD technology demonstrates an accurate voltage of-1.183 V with a temperature coefficient (TC) as low as 2.45 ppm/℃over the TR of 165℃ at a -5.0 V power supply; the line regulation is 3 mV/V from a -5 to -2 V supply voltage. The active area of the presented NBGR is 370×180 μm2. 展开更多
关键词 negative voltage bandgap reference ECC multilevel curvature-compensation TC line regulation
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