Recently,with the rapid development of chemical vapor deposition(CVD)technology,large area free-standing CVD diamond films have been produced successfully.However,the coarse grain size on the surface and the non-unifo...Recently,with the rapid development of chemical vapor deposition(CVD)technology,large area free-standing CVD diamond films have been produced successfully.However,the coarse grain size on the surface and the non-uniform thickness of unprocessed CVD diamond films make it difficult to meet the application requirement.The current study evaluates several existing polishing methods for CVD diamond films,including mechanical polishing,chemical mechanical polishing and tribochemical polishing technology.展开更多
CsLiB6O10(CLBO) is a new-type nonlinear optical crystal material. CLBO has many good performances, especially the frequency multiplication performance in deep ultraviolet band. CLBO has important application prospect ...CsLiB6O10(CLBO) is a new-type nonlinear optical crystal material. CLBO has many good performances, especially the frequency multiplication performance in deep ultraviolet band. CLBO has important application prospect on solid-state UV laser, broad band tunable laser and laser nucleus flame igniter. Though, CLBO will be air slaking and cracking when the ambient humidity is more than 40%, which brings more difficult on CLBO surface finishing. According to the performance and structure characteristic of CLBO crystal, a new water-free slurry applying for CLBO crystal chemical mechanical polishing(CMP) was investigated. The abrasive is SiO2. The influence of polishing processing parameter on polishing process for CLBO crystal was discussed, and the parameter optimal value of polishing plate speed, pressure, pH value and abrasive concentration were determined. Through such parameters, high efficiency and precision plane polishing was gotten. The CLBO CMP process was studied, the results show that low pressure and high speed can improve the CLBO crystal surface removal rate and flatness.展开更多
基金Science and technology plan project of Hebei Academy of Sciences(No.191408)Natural Science Foundation of Hebei Province(E2019302005)
文摘Recently,with the rapid development of chemical vapor deposition(CVD)technology,large area free-standing CVD diamond films have been produced successfully.However,the coarse grain size on the surface and the non-uniform thickness of unprocessed CVD diamond films make it difficult to meet the application requirement.The current study evaluates several existing polishing methods for CVD diamond films,including mechanical polishing,chemical mechanical polishing and tribochemical polishing technology.
文摘CsLiB6O10(CLBO) is a new-type nonlinear optical crystal material. CLBO has many good performances, especially the frequency multiplication performance in deep ultraviolet band. CLBO has important application prospect on solid-state UV laser, broad band tunable laser and laser nucleus flame igniter. Though, CLBO will be air slaking and cracking when the ambient humidity is more than 40%, which brings more difficult on CLBO surface finishing. According to the performance and structure characteristic of CLBO crystal, a new water-free slurry applying for CLBO crystal chemical mechanical polishing(CMP) was investigated. The abrasive is SiO2. The influence of polishing processing parameter on polishing process for CLBO crystal was discussed, and the parameter optimal value of polishing plate speed, pressure, pH value and abrasive concentration were determined. Through such parameters, high efficiency and precision plane polishing was gotten. The CLBO CMP process was studied, the results show that low pressure and high speed can improve the CLBO crystal surface removal rate and flatness.
