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n-型SrTiO_3半导瓷非线性Ⅴ-Ⅰ关系研究——Ⅱ非线性Ⅴ-Ⅰ关系的定量计算
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作者 华渊 《石家庄铁道大学学报(自然科学版)》 1990年第4期51-60,共10页
本文在文“n-型S_rT_iO_3半导瓷非线性V-I关系定性描述”的基础上,对n-型S_rT_iO_3半导瓷非线性V-I特性曲线上3个特征区的电压电流关系作了定量推导和计算。对计算结果与实验结论作了比较,给出不超过3%的最大误差。
关键词 SrTiO3 半导瓷 非线性V-I特性
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n-型SrTiO_3半导瓷非线性V-I关系研究 Ⅰ 非线性V-I关系的定性描述 被引量:1
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作者 华渊 《石家庄铁道大学学报(自然科学版)》 1990年第2期43-48,共6页
本文对一次烧成工艺和二次烧成法制成的n-型SrTiO_3半导瓷的非线性V-Ⅰ关系作了定性描述。着重讨论了V-Ⅰ特性曲线3个区的导电机理。根据烧成工艺,建立了改进的双层晶界势垒模型。在此基础上,对n-型SrTiO_3半导瓷非线性V-Ⅰ特性曲线上3... 本文对一次烧成工艺和二次烧成法制成的n-型SrTiO_3半导瓷的非线性V-Ⅰ关系作了定性描述。着重讨论了V-Ⅰ特性曲线3个区的导电机理。根据烧成工艺,建立了改进的双层晶界势垒模型。在此基础上,对n-型SrTiO_3半导瓷非线性V-Ⅰ特性曲线上3个特征区的电压电流关系作了定量推导和计算。对计算结果与实验结论作了比较,给出不超过3%的最大误差。 展开更多
关键词 SrTiO3 半导瓷 非线性V-I特性
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Improved empirical DC I-V model for 4H-SiC MESFETs 被引量:1
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作者 CAO QuanJun ZHANG YiMen ZHANG YuMing LV HongLiang WANG YueHu TANG XiaoYan GUO Hui 《Science in China(Series F)》 2008年第8期1184-1192,共9页
A novel empirical large signal direct current (DC)Ⅰ-Ⅴ model is presented considering the high saturation voltage, high pinch-off voltage, and wide operational range of drain voltage for 4H-SiC MESFETs. A compariso... A novel empirical large signal direct current (DC)Ⅰ-Ⅴ model is presented considering the high saturation voltage, high pinch-off voltage, and wide operational range of drain voltage for 4H-SiC MESFETs. A comparison of the presented model with Statz, Materka, Curtice-Cubic, and recently reported 4H-SiC MESFET large signal Ⅰ-Ⅴ models is made through the Levenberg-Marquardt method for fitting in nonlinear regression. The results show that the new model has the advantages of high accuracy, easily making initial value and robustness over other models. The more accurate results are obtained by the improved channel modulation and saturation voltage coefficient when the device is operated in the sub-threshold and near pinch-off region. In addition the new model can be implemented to CAD tools directly, using for design of 4H-SiC MESFET based RF&MW circuit, particularly MMIC (microwave monolithic integrate circuit). 展开更多
关键词 4H-SiC MESFET DC - characteristics empirical model Levenberg-Marquardt method nonlinear regression
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ANOMALOUS V-I CHARACTER IN n-Ge SEMICONDUCTOR OF ACCEPTOR HEAT DEFECT COMPENSATION AT ROOM TEMPERATURE
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作者 邢旭 刘益春 +1 位作者 齐秀英 焦志伟 《Chinese Science Bulletin》 SCIE EI CAS 1991年第19期1606-1609,共4页
Since anomalous Hall effect, anomalous magnetoresistance effect and anomalous electric conductivity effect were discovered in n-Ge semiconductor at room temperature, anomalous Hall effect has been successfully explain... Since anomalous Hall effect, anomalous magnetoresistance effect and anomalous electric conductivity effect were discovered in n-Ge semiconductor at room temperature, anomalous Hall effect has been successfully explained with the inversion layers model. In order to investigate further the law that gives rise to anomalous electromagnetic features in n-Ge sample at room temperature, heat treatment to n-Ge sample was performed so as to cause acceptor heat defect compensation in n-Ge semiconductor, which will form an inversion layer 展开更多
关键词 HEAT DEFECT normal - characteristIC CURVE ANOMALOUS -characteristic curve.
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