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Edge termination study and fabrication of a 4H-SiC junction barrier Schottky diode 被引量:3
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作者 陈丰平 张玉明 +3 位作者 张义门 汤晓燕 王悦湖 陈文豪 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第11期446-450,共5页
The 4H-SiC junction barrier Schottky (JBS) diodes terminated by field guard rings and offset field plate are designed, fabricated and characterized. It is shown experimentally that a 3-μm P-type implantation window... The 4H-SiC junction barrier Schottky (JBS) diodes terminated by field guard rings and offset field plate are designed, fabricated and characterized. It is shown experimentally that a 3-μm P-type implantation window spacing gives an optimum trade-off between forward drop voltage and leakage current density for these diodes, yielding a specific on-resistance of 8.3 mΩ-cm2. A JBS diode with a turn-on voltage of 0.65 V and a reverse current density less than 1 A/cm2 under 500 V is fabricated, and the reverse recovery time is tested to be 80 ns, and the peak reverse current is 28.1 mA. Temperature-dependent characteristics are also studied in a temperature range of 75 °C-200 °C. The diode shows a stable Schottky barrier height of up to 200°C and a stable operation under a continuous forward current of 100 A/cm2. 展开更多
关键词 4H-SIC junction barrier Schottky offset field plate electrical characteristics
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