One of the major advantages of utilizing atmospheric pressure plasma processing （APPP） technology to fabricate ultra-precision optics is that there is no subsurface damage during the process. In APPP, the removal fo...One of the major advantages of utilizing atmospheric pressure plasma processing （APPP） technology to fabricate ultra-precision optics is that there is no subsurface damage during the process. In APPP, the removal footprint and removal rate are critical to the capability and efficiency of the figuring of the optical surface. In this paper, an atmospheric plasma torch, which can work in both remote mode and contact mode, is presented. The footprints and the removal rates of both modes are compared by profilometer measurements. The influences of process recipes and substrate thickness for both modes are investigated through a series of experiments. When the substrate is thinner than 12 mm, the removal rate in contact mode is higher. However, the removal rate and width of the footprint decrease dramatically as the substrate thickness increases in contact mode.展开更多
In order to get ultra-smooth fused silica surface without subsurface damage efficiently, the atmospheric pressure plasma processing( APPP) method has been developed. It is based on chemical reaction between active rad...In order to get ultra-smooth fused silica surface without subsurface damage efficiently, the atmospheric pressure plasma processing( APPP) method has been developed. It is based on chemical reaction between active radicals excited by plasma and workpiece surface atoms,so the subsurface damage caused by contact stress can be avoided and atomic-level precision can be ensured. In this paper,based on the spectral quantitative analysis theory,the influence laws on material removal rate by the key factors of APPP including the flow rate of reaction gases,the input power,the processing distance and time are discussed. In addition,the results that APPP can remove the damaged surface layer and do not introduce secondary damage are proved via the nanoindentation technology.展开更多
以一株发酵性能优良的野生型酵母X-5为出发菌株,进行常压室温等离子体(atmospheric and room temperature plasma,ARTP)诱变,筛选出一株较野生型性能更加优良的猕猴桃果酒专用酵母Y-5。以猕猴桃为原料,诱变后菌株Y-5为研究对象,以菌株Y-...以一株发酵性能优良的野生型酵母X-5为出发菌株,进行常压室温等离子体(atmospheric and room temperature plasma,ARTP)诱变,筛选出一株较野生型性能更加优良的猕猴桃果酒专用酵母Y-5。以猕猴桃为原料,诱变后菌株Y-5为研究对象,以菌株Y-5接种量、发酵温度、初始pH值为影响因子,采用正交试验优化其发酵条件。诱变后菌株Y-5,产香力强,性能优于野生型,发酵力、酒精度和V_(C)含量分别比野生型高50.98%、11.15%和17.68%。经过优化后的猕猴桃果酒最佳工艺条件为酵母接种量8%,发酵温度20℃,发酵初始pH值为3.5。在该发酵条件下所得猕猴桃果酒澄清透明,酒香浓郁,风味典型,口感好。展开更多
基金supported by National Natural Science Foundation of China(Nos.51175123 and 51105112)National Science and Technology Major Project of China(No.2013ZX04006011-205)
文摘One of the major advantages of utilizing atmospheric pressure plasma processing （APPP） technology to fabricate ultra-precision optics is that there is no subsurface damage during the process. In APPP, the removal footprint and removal rate are critical to the capability and efficiency of the figuring of the optical surface. In this paper, an atmospheric plasma torch, which can work in both remote mode and contact mode, is presented. The footprints and the removal rates of both modes are compared by profilometer measurements. The influences of process recipes and substrate thickness for both modes are investigated through a series of experiments. When the substrate is thinner than 12 mm, the removal rate in contact mode is higher. However, the removal rate and width of the footprint decrease dramatically as the substrate thickness increases in contact mode.
基金Sponsored by the National Natural Science Foundation of China(Grant No.51175123 and 51105112)
文摘In order to get ultra-smooth fused silica surface without subsurface damage efficiently, the atmospheric pressure plasma processing( APPP) method has been developed. It is based on chemical reaction between active radicals excited by plasma and workpiece surface atoms,so the subsurface damage caused by contact stress can be avoided and atomic-level precision can be ensured. In this paper,based on the spectral quantitative analysis theory,the influence laws on material removal rate by the key factors of APPP including the flow rate of reaction gases,the input power,the processing distance and time are discussed. In addition,the results that APPP can remove the damaged surface layer and do not introduce secondary damage are proved via the nanoindentation technology.
文摘以一株发酵性能优良的野生型酵母X-5为出发菌株,进行常压室温等离子体(atmospheric and room temperature plasma,ARTP)诱变,筛选出一株较野生型性能更加优良的猕猴桃果酒专用酵母Y-5。以猕猴桃为原料,诱变后菌株Y-5为研究对象,以菌株Y-5接种量、发酵温度、初始pH值为影响因子,采用正交试验优化其发酵条件。诱变后菌株Y-5,产香力强,性能优于野生型,发酵力、酒精度和V_(C)含量分别比野生型高50.98%、11.15%和17.68%。经过优化后的猕猴桃果酒最佳工艺条件为酵母接种量8%,发酵温度20℃,发酵初始pH值为3.5。在该发酵条件下所得猕猴桃果酒澄清透明,酒香浓郁,风味典型,口感好。
