Structural and optical properties of nanometric titanium oxide（TixOy） films obtained by cathodic arc plasma deposition were investigated. Phase analysis by x-ray diffraction and Fouriertransform infrared spectroscop...Structural and optical properties of nanometric titanium oxide（TixOy） films obtained by cathodic arc plasma deposition were investigated. Phase analysis by x-ray diffraction and Fouriertransform infrared spectroscopy showed the presence of anatase, rutile, Ti_2O_3, Ti_4O_7 and amorphous phases. Scanning electron microscopy images showed well-developed surface morphology with nano-patterns. Spectroscopic ellipsometry revealed film thicknesses of 53 and50 nm, variable refractive indices dependent on the light wavelength and close to zero extinction coefficients for wavelengths higher than 500 nm. On the basis of ultraviolet–visible spectroscopy data and using the Tauc equation, band gap values for direct and indirect electron transitions were determined.展开更多
The plasma-enhanced chemical vapor deposition(PECVD)technique is well suited for fabricating optical filters with continuously variable refractive index profiles;however,it is not clear how the optical and structural ...The plasma-enhanced chemical vapor deposition(PECVD)technique is well suited for fabricating optical filters with continuously variable refractive index profiles;however,it is not clear how the optical and structural properties of thin films differ when deposited on different substrates.Herein,silicon nitride films were deposited on silicon,fused silica,and glass substrates by PECVD,using silane and ammonia,to investigate the effects of the substrate used on the optical properties and structures of the films.All of the deposited films were amorphous.Further,the types and amounts of Si-centered tetrahedral Si–SivN4-v bonds formed were based upon the substrates used;Si–N4 bonds with higher elemental nitrogen content were formed on Si substrates,which lead to obtaining higher refractive indices,and the Si–SiN3 bonds were mainly formed on glass and fused silica substrates.The refractive indices of the films formed on the different substrates had a maximum difference of0.05(at 550 nm),the refractive index of SiNx films formed on silicon substrates was 1.83,and the refractive indices of films formed on glass were very close to those formed on fused silica.The deposition rates of these SiNx films are similar,and the extinction coefficients of all the films were lower than 10-4.展开更多
Optical emission spectroscopy （OES） was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition （CVD）. C2 radical was ...Optical emission spectroscopy （OES） was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition （CVD）. C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments （DOE）. An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur.展开更多
A commercial plasma immersion ion implanter has been designed and constructed to enhance the surface properties of parts and components used in aerospace applications. The implanter consists of a vacuum chamber, pumpi...A commercial plasma immersion ion implanter has been designed and constructed to enhance the surface properties of parts and components used in aerospace applications. The implanter consists of a vacuum chamber, pumping and gas inlet system, custom sample chuck, four sets of hotfilaments, threefiltered vacuum arc plasma sources, special high voltage modulator, as well as monitoring and control systems. Special attention has been paid to improve the uniformity of plasma in the chamber. The power modulator operates in both the pulse bunching and single pulse modes. The maximum pulse voltage output is 80kV, maximum pulse current is 60A, and repetition frequency is 50～500Hz. The target chuck has been specially designed for uniform implantation into multiple aerospace components with irregular geometries as well as effective sample cooling. An in situ temperature monitoring device comprising dual thermocouples has been developed. The instrument was installed in an aerospace company and has been operating reliably for a year. In addition to reporting some of the hardware innovations, data on the improvement of the lifetime of an aircraft hydraulic pump disk using a dual nitrogen treatment process m-2; 30～45kV are presented. This treatment protocol has been adopted as a standard production procedure in the factory.展开更多
基金by the Ministry of Education,Science and Technological Development of the Republic of Serbia(grant 172026)COST action MP1306
文摘Structural and optical properties of nanometric titanium oxide（TixOy） films obtained by cathodic arc plasma deposition were investigated. Phase analysis by x-ray diffraction and Fouriertransform infrared spectroscopy showed the presence of anatase, rutile, Ti_2O_3, Ti_4O_7 and amorphous phases. Scanning electron microscopy images showed well-developed surface morphology with nano-patterns. Spectroscopic ellipsometry revealed film thicknesses of 53 and50 nm, variable refractive indices dependent on the light wavelength and close to zero extinction coefficients for wavelengths higher than 500 nm. On the basis of ultraviolet–visible spectroscopy data and using the Tauc equation, band gap values for direct and indirect electron transitions were determined.
基金supported by the Project of Innovative Team of Advanced Optical Manufacturing and Detection(No.2017KCT-08-02)。
文摘The plasma-enhanced chemical vapor deposition(PECVD)technique is well suited for fabricating optical filters with continuously variable refractive index profiles;however,it is not clear how the optical and structural properties of thin films differ when deposited on different substrates.Herein,silicon nitride films were deposited on silicon,fused silica,and glass substrates by PECVD,using silane and ammonia,to investigate the effects of the substrate used on the optical properties and structures of the films.All of the deposited films were amorphous.Further,the types and amounts of Si-centered tetrahedral Si–SivN4-v bonds formed were based upon the substrates used;Si–N4 bonds with higher elemental nitrogen content were formed on Si substrates,which lead to obtaining higher refractive indices,and the Si–SiN3 bonds were mainly formed on glass and fused silica substrates.The refractive indices of the films formed on the different substrates had a maximum difference of0.05(at 550 nm),the refractive index of SiNx films formed on silicon substrates was 1.83,and the refractive indices of films formed on glass were very close to those formed on fused silica.The deposition rates of these SiNx films are similar,and the extinction coefficients of all the films were lower than 10-4.
基金the National High-Tech Research and Development Program of China (No.2002AA305508)the National Natural Science Foundation of China (No.50472095)+1 种基金the Scientific Research Foundation for the Returned Overseas Chinese Scholars (No.2003-14)Beijing Novel Project (No. 2003A13).]
文摘Optical emission spectroscopy （OES） was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition （CVD）. C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments （DOE）. An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur.
文摘A commercial plasma immersion ion implanter has been designed and constructed to enhance the surface properties of parts and components used in aerospace applications. The implanter consists of a vacuum chamber, pumping and gas inlet system, custom sample chuck, four sets of hotfilaments, threefiltered vacuum arc plasma sources, special high voltage modulator, as well as monitoring and control systems. Special attention has been paid to improve the uniformity of plasma in the chamber. The power modulator operates in both the pulse bunching and single pulse modes. The maximum pulse voltage output is 80kV, maximum pulse current is 60A, and repetition frequency is 50～500Hz. The target chuck has been specially designed for uniform implantation into multiple aerospace components with irregular geometries as well as effective sample cooling. An in situ temperature monitoring device comprising dual thermocouples has been developed. The instrument was installed in an aerospace company and has been operating reliably for a year. In addition to reporting some of the hardware innovations, data on the improvement of the lifetime of an aircraft hydraulic pump disk using a dual nitrogen treatment process m-2; 30～45kV are presented. This treatment protocol has been adopted as a standard production procedure in the factory.
