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THE OPTIMIZATION OF THE HULL FORM WITH THE MINIMUM WAVE MAKING RESISTANCE BASED ON RANKINE SOURCE METHOD 被引量:23
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作者 ZHANG Bao-ji MA Kun JI Zhuo-shang 《Journal of Hydrodynamics》 SCIE EI CSCD 2009年第2期277-284,共8页
The hull form optimization concerns one of the most important applications of wave making resistance theories. In order to obtain a hull form with the minimum wave making resistance, an optimization design method base... The hull form optimization concerns one of the most important applications of wave making resistance theories. In order to obtain a hull form with the minimum wave making resistance, an optimization design method based on the CFD is proposed, which combines the Rankine source method with the nonlinear programming (NLP). The bow-body shape is optimized with the minimum wave making resistance as the objective function. A hull form modification function is introduced to represent an improved hull surface, which can be used to generate a new smooth hull surface by multiplying it by the offset data of the original hull surface. The parameters of the hull form modification function are taken as the design variables. Other constraint conditions can also be considered, for example, in optimizing the lines of the bow, appropriate displacements can be taken as the basic constraints. S60 hull form is selected as the original hull. Three improved hulls are obtained by optimal design. Rankine source method proves to be an effective method in ship form optimization based on analysis of the resistance performance and lines of the improved hull. 展开更多
关键词 Rankine source method CFD NLP optimization method wave making resistance
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Application of resist-profile-aware source optimization in 28 nm full chip optical proximity correction 被引量:1
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作者 Jun Zhu David Wei Zhang +6 位作者 Chinte Kuo Qing Wang Fang Wei Chenming Zhang Han Chen Daquan He Stephen D.Hsu 《Journal of Semiconductors》 EI CAS CSCD 2017年第7期83-88,共6页
As technology node shrinks, aggressive design rules for contact and other back end of line(BEOL)layers continue to drive the need for more effective full chip patterning optimization. Resist top loss is one of the m... As technology node shrinks, aggressive design rules for contact and other back end of line(BEOL)layers continue to drive the need for more effective full chip patterning optimization. Resist top loss is one of the major challenges for 28 nm and below technology nodes, which can lead to post-etch hotspots that are difficult to predict and eventually degrade the process window significantly. To tackle this problem, we used an advanced programmable illuminator(FlexRay) and Tachyon SMO(Source Mask Optimization) platform to make resistaware source optimization possible, and it is proved to greatly improve the imaging contrast, enhance focus and exposure latitude, and minimize resist top loss thus improving the yield. 展开更多
关键词 integrated circuits OPC source optimization lithography resist top loss
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Thermal performance analysis of non-uniform height rectangular fin based on constructal theory and entransy theory 被引量:4
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作者 YANG Ai Bo CHEN Lin Gen +2 位作者 XIE Zhi Hui FENG Hui Jun SUN Feng Rui 《Science China(Technological Sciences)》 SCIE EI CAS CSCD 2016年第12期1882-1891,共10页
A model of non-uniform height rectangular fin, in which the variation of base's thickness and width are taken into account, is established in this paper. The dimensionless maximum thermal resistance(DMTR) and the ... A model of non-uniform height rectangular fin, in which the variation of base's thickness and width are taken into account, is established in this paper. The dimensionless maximum thermal resistance(DMTR) and the dimensionless equivalent thermal resistance(DETR) defined based on the entransy dissipation rate(EDR) are taken as performance evaluation indexes. According to constructal theory, the variations of the two indexes with the geometric parameters of the fin are analyzed by using a finite-volume computational fluid dynamics code, the effects of the fin-material fraction on the two indexes are analyzed. It is found that the two indexes decrease monotonically as the ratio between the front height and the back height of the fin increases subjected to the non-uniform height rectangular fin. When the model is reduced to the uniform height fin, the two indexes increase first and then decrease with increase in the ratio between the height of the fin and the fin space. The fin-material fraction has no effect on the change rule of the two indexes with the ratio between the height of the fin and the fin space. The sensitivity of the DETR to the geometric parameters of the fin is higher than that of the DMTR to the geometric parameters. The results obtained herein can provide some theoretical support for the thermal design of rectangular fins. 展开更多
关键词 constructal design entransy theory maximum thermal resistance equivalent thermal resistance rectangular fin generalized thermodynamic optimization
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