A uniform, dense and defect free Cr2O3 thin film, which is amorphous at ambient temperature, was applied on the surface of intermetallic Fe3Al by electrodeposition reaction sintering, and the effect of this film on th...A uniform, dense and defect free Cr2O3 thin film, which is amorphous at ambient temperature, was applied on the surface of intermetallic Fe3Al by electrodeposition reaction sintering, and the effect of this film on the oxidation of Fe3Al at 900 ℃ in air was studied. The films and the oxide scales were analyzed by TEM, EDAX,SEM and XRD.It is proved that, by surface applied Cr2O3 thin film,a continuous, protective,fine grained α-Al2O3 scale was formed on Fe3Al. As a result, the adherence of the scale and oxidation resistance of Fe3Al were improved.展开更多
The Y_2O_3 thin film was applied on Fe-3Al intermetallic compound by electrodeposition and thermal decomposition. The cyclic oxidation of the Fe-3Al specimens with and without surfaceapplied Y_2O_3 thin film was carri...The Y_2O_3 thin film was applied on Fe-3Al intermetallic compound by electrodeposition and thermal decomposition. The cyclic oxidation of the Fe-3Al specimens with and without surfaceapplied Y_2O_3 thin film was carried out at 900 ℃ in air. The results show that the selective oxidation of Al in Fe-3Al was promoted, and both of the plasticity and the adhesion of the oxide scale formed on Fe3Al were improved and the high temperature oxidation resistance of Fe3Al was enhanced markedly.展开更多
A series of W1?xAlxN films(0<x<38.6%,mole fraction)were deposited by reactive magnetron sputtering.The composition,microstructure,mechanical properties and oxidation resistance of the films were characterized by...A series of W1?xAlxN films(0<x<38.6%,mole fraction)were deposited by reactive magnetron sputtering.The composition,microstructure,mechanical properties and oxidation resistance of the films were characterized by EPMA,XRD,XPS,nano-indentation,SEM and HRTEM.The effect of Al content on the microstructure and oxidation resistance of W1?xAlxN films was investigated.The results show that WN film has a face-centered cubic structure.The preferred orientation changes from(111)to(200).The W1?xAlxN films consist of a mixture of face-centered cubic W(Al)N and hexagonal wurtzite structure AlN phases.The hardness of the W1?xAlxN films first increases and then decreases with the Al content increasing.The maximum hardness is36GPa,which is obtained at32.4%Al(mole fraction).Compared with WN film,the W1-xAlxN composite films show much better oxidation resistance because of the formation of dense Al2O3oxide layer on the surface.展开更多
Anodic oxide films grown on titanium alloy Ti-10V-2Fe-3Al in the solution of sodium tartrate, then sealed in boiling deionised water and calcium acetate solution were observed by using field emission scanning electron...Anodic oxide films grown on titanium alloy Ti-10V-2Fe-3Al in the solution of sodium tartrate, then sealed in boiling deionised water and calcium acetate solution were observed by using field emission scanning electron microscopy （FE-SEM）, and were chemically analysed by using energy dispersive spectroscopy （EDS）. Corrosion behaviour was investigated in a 3.5% sodium chloride solution, using electrochemical impedance spectroscopy （EIS）. The morphology of the anodic oxide films was dependent on the sealing processes. The surface sealed in calcium acetate solution presented a more homogeneous and smooth structure compared with that sealed in boiling deionised water. The corrosion resistance of the oxide films sealed in calcium acetate solution was better than that sealed in boiling deionised water.展开更多
Transparent conductive oxide （TCO） thin film is a kind of functional material which has potential applications in solar cells and atomic oxygen （AO） resisting systems in spacecrafts. Of TCO, ZnO：Al （ZAO） and In...Transparent conductive oxide （TCO） thin film is a kind of functional material which has potential applications in solar cells and atomic oxygen （AO） resisting systems in spacecrafts. Of TCO, ZnO：Al （ZAO） and In2O3：Sn （ITO） thin films have been widely used and investigated. In this study, ZAO and ITO thin films were irradiated by AO with different amounts of fluence. The as-deposited samples and irradiated ones were characterized by X-ray diffraction （XRD）, scanning electron microscopy （SEM） and Hall-effect measurement to investigate the dependence of the structure, morphology and electrical properties of ZAO or ITO on the amount of fluence of AO irradiation. It is noticed that AO has erosion effects on the surface of ZAO without evident influences upon its structure and conductive properties. Moreover, as the amount of AO fluence rises, the carrier concentration of ITO decreases causing the resistivity to increase by at most 21.7%.展开更多
Thin layer polycrystal oxides (amorphous and micro-crystalline) TiO2(Fe2O3, SnO2 and ln2O3 · Sn) are prepared by the organometallic chemical vapor deposition (MO-CVD) technique at 300-410℃ . Their structures, su...Thin layer polycrystal oxides (amorphous and micro-crystalline) TiO2(Fe2O3, SnO2 and ln2O3 · Sn) are prepared by the organometallic chemical vapor deposition (MO-CVD) technique at 300-410℃ . Their structures, surface states and photoelectrochemical properties are described by X-ray diffraction (XRD), electron microscopy and three electrode methods. The experiments indicate that these thin layer oxides are suitable for formly transparent conductive coating to serve as photoelectrodes and photocatalysts for splitting of water.展开更多
文摘A uniform, dense and defect free Cr2O3 thin film, which is amorphous at ambient temperature, was applied on the surface of intermetallic Fe3Al by electrodeposition reaction sintering, and the effect of this film on the oxidation of Fe3Al at 900 ℃ in air was studied. The films and the oxide scales were analyzed by TEM, EDAX,SEM and XRD.It is proved that, by surface applied Cr2O3 thin film,a continuous, protective,fine grained α-Al2O3 scale was formed on Fe3Al. As a result, the adherence of the scale and oxidation resistance of Fe3Al were improved.
文摘The Y_2O_3 thin film was applied on Fe-3Al intermetallic compound by electrodeposition and thermal decomposition. The cyclic oxidation of the Fe-3Al specimens with and without surfaceapplied Y_2O_3 thin film was carried out at 900 ℃ in air. The results show that the selective oxidation of Al in Fe-3Al was promoted, and both of the plasticity and the adhesion of the oxide scale formed on Fe3Al were improved and the high temperature oxidation resistance of Fe3Al was enhanced markedly.
文摘A series of W1?xAlxN films(0<x<38.6%,mole fraction)were deposited by reactive magnetron sputtering.The composition,microstructure,mechanical properties and oxidation resistance of the films were characterized by EPMA,XRD,XPS,nano-indentation,SEM and HRTEM.The effect of Al content on the microstructure and oxidation resistance of W1?xAlxN films was investigated.The results show that WN film has a face-centered cubic structure.The preferred orientation changes from(111)to(200).The W1?xAlxN films consist of a mixture of face-centered cubic W(Al)N and hexagonal wurtzite structure AlN phases.The hardness of the W1?xAlxN films first increases and then decreases with the Al content increasing.The maximum hardness is36GPa,which is obtained at32.4%Al(mole fraction).Compared with WN film,the W1-xAlxN composite films show much better oxidation resistance because of the formation of dense Al2O3oxide layer on the surface.
基金Supported by the National Natural Science Foundation of China(No.51271012)
文摘Anodic oxide films grown on titanium alloy Ti-10V-2Fe-3Al in the solution of sodium tartrate, then sealed in boiling deionised water and calcium acetate solution were observed by using field emission scanning electron microscopy （FE-SEM）, and were chemically analysed by using energy dispersive spectroscopy （EDS）. Corrosion behaviour was investigated in a 3.5% sodium chloride solution, using electrochemical impedance spectroscopy （EIS）. The morphology of the anodic oxide films was dependent on the sealing processes. The surface sealed in calcium acetate solution presented a more homogeneous and smooth structure compared with that sealed in boiling deionised water. The corrosion resistance of the oxide films sealed in calcium acetate solution was better than that sealed in boiling deionised water.
基金National Natural Science Foundation of China (50471004)
文摘Transparent conductive oxide （TCO） thin film is a kind of functional material which has potential applications in solar cells and atomic oxygen （AO） resisting systems in spacecrafts. Of TCO, ZnO：Al （ZAO） and In2O3：Sn （ITO） thin films have been widely used and investigated. In this study, ZAO and ITO thin films were irradiated by AO with different amounts of fluence. The as-deposited samples and irradiated ones were characterized by X-ray diffraction （XRD）, scanning electron microscopy （SEM） and Hall-effect measurement to investigate the dependence of the structure, morphology and electrical properties of ZAO or ITO on the amount of fluence of AO irradiation. It is noticed that AO has erosion effects on the surface of ZAO without evident influences upon its structure and conductive properties. Moreover, as the amount of AO fluence rises, the carrier concentration of ITO decreases causing the resistivity to increase by at most 21.7%.
基金Supported by the National Natural Science Foundation of China.
文摘Thin layer polycrystal oxides (amorphous and micro-crystalline) TiO2(Fe2O3, SnO2 and ln2O3 · Sn) are prepared by the organometallic chemical vapor deposition (MO-CVD) technique at 300-410℃ . Their structures, surface states and photoelectrochemical properties are described by X-ray diffraction (XRD), electron microscopy and three electrode methods. The experiments indicate that these thin layer oxides are suitable for formly transparent conductive coating to serve as photoelectrodes and photocatalysts for splitting of water.
