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Electroless plating of copper layer on surfaces of urea-formaldehyde microcapsule particles containing paraffin for low infrared emissivity 被引量:5
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作者 Xi Zhou Jian Mao Zhen Qiao 《Particuology》 SCIE EI CAS CSCD 2016年第1期159-163,共5页
A copper coating was deposited by electroless plating on the surfaces of urea-formaldehyde microcap- sules containing paraffin (UFP) particles. This composite microcapsule structure had low infrared OR) emissivity ... A copper coating was deposited by electroless plating on the surfaces of urea-formaldehyde microcap- sules containing paraffin (UFP) particles. This composite microcapsule structure had low infrared OR) emissivity and maintained a constant temperature, and could be used in IR stealth applications. The eiectroless copper layer formation and its micro-appearance, and the effect of the copper layer on the IR emissivity and thermal properties of the composite microcapsules were investigated. The IR emissivity of the composite microcapsules at wavelengths of 1-14 μm gradually decreased with increasing copper mass on the surface. After formation of an integrated copper layer, the rate of IR emissivity decrease was lower. This is because the copper coating improves the surface conductivity of the UFP; a high conductivity results in high reflectivity, which leads to a decrease in IR emissivity. The lowest IR emissivity achieved was 0.68. The phase-change enthalpy of the composite microcapsules decreased with increasing amount of copper coated on the surface because of the high density of copper. When the mass increase of the UFP after electroless copper plating was about 300%, the composite microcapsules had low IR emissivity (about 0.8) and a high phase-change enthalpy (80J/g). 展开更多
关键词 Phase-change material Urea-formaldehyde microcapsules containing paraffin particle Electroless copper plating Low infrared emissivity Enthalpy
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