A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phas...A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phase conflicts resolution approaches are described and strategies guaranteeing phase compatible during layout compaction are also discussed.An efficient CAD prototype for dark field Alt PSM based on these algorithms is implemented.The experimental results on several industry layouts show that the tool can successfully cope with the rapid growth of phase conflicts with good quality and satisfy lower resource consumption with different requirements of precision and speedup.展开更多
基于130 nm双极型晶体管与互补金属氧化物半导体(Bipolar and Complementary Metal Oxide Semiconductor,BiCMOS)工艺,采用矢量合成架构的高精度移相器架构,提出了一款满足5G与民用卫星通信应用需求的K频段4通道高精度有源移相器。在移...基于130 nm双极型晶体管与互补金属氧化物半导体(Bipolar and Complementary Metal Oxide Semiconductor,BiCMOS)工艺,采用矢量合成架构的高精度移相器架构,提出了一款满足5G与民用卫星通信应用需求的K频段4通道高精度有源移相器。在移相器输入端和输出端,为了实现单端信号与差分信号的互相转换,同时为信号链路提供一定的增益,采用了有源巴伦结构。为了以更小的芯片面积实现差分信号到4路I/Q正交信号的转换,采用了折叠朗格耦合器;为了实现高精度的相位调节控制,采用了有源矢量合成器。芯片实测结果表明,在18~22 GHz的带宽内,各通道小信号增益在-3~-2 dB之间,增益平坦度小于1 dB,在-45℃~85℃之间增益波动小于3.5 dB,6位移相器移相误差均方根(Root Mean Square,RMS)小于2.5°。芯片尺寸为2.68 mm×2.5 mm。展开更多
文摘A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phase conflicts resolution approaches are described and strategies guaranteeing phase compatible during layout compaction are also discussed.An efficient CAD prototype for dark field Alt PSM based on these algorithms is implemented.The experimental results on several industry layouts show that the tool can successfully cope with the rapid growth of phase conflicts with good quality and satisfy lower resource consumption with different requirements of precision and speedup.
文摘基于130 nm双极型晶体管与互补金属氧化物半导体(Bipolar and Complementary Metal Oxide Semiconductor,BiCMOS)工艺,采用矢量合成架构的高精度移相器架构,提出了一款满足5G与民用卫星通信应用需求的K频段4通道高精度有源移相器。在移相器输入端和输出端,为了实现单端信号与差分信号的互相转换,同时为信号链路提供一定的增益,采用了有源巴伦结构。为了以更小的芯片面积实现差分信号到4路I/Q正交信号的转换,采用了折叠朗格耦合器;为了实现高精度的相位调节控制,采用了有源矢量合成器。芯片实测结果表明,在18~22 GHz的带宽内,各通道小信号增益在-3~-2 dB之间,增益平坦度小于1 dB,在-45℃~85℃之间增益波动小于3.5 dB,6位移相器移相误差均方根(Root Mean Square,RMS)小于2.5°。芯片尺寸为2.68 mm×2.5 mm。
