Wide-bandgap gallium oxide(Ga_(2)O_(3))is one of the most promising semiconductor materials for solar-blind(200 nm to 280 nm)photodetection.In its amorphous form,amorphous gallium oxide(a-Ga_(2)O_(3))maintains its int...Wide-bandgap gallium oxide(Ga_(2)O_(3))is one of the most promising semiconductor materials for solar-blind(200 nm to 280 nm)photodetection.In its amorphous form,amorphous gallium oxide(a-Ga_(2)O_(3))maintains its intrinsic optoelectronic properties while can be prepared at a low growth temperature,thus it is compatible with Si integrated circuits(ICs)technology.Herein,the a-Ga_(2)O_(3) film is directly deposited on pre-fabricated Au interdigital electrodes by plasma enhanced atomic layer deposition(PE-ALD)at a growth temperature of 250°C.The stoichiometric a-Ga_(2)O_(3) thin film with a low defect density is achieved owing to the mild PE-ALD condition.As a result,the fabricated Au/a-Ga_(2)O_(3)/Au photodetector shows a fast time response,high responsivity,and excellent wavelength selectivity for solar-blind photodetection.Furthermore,an ultra-thin MgO layer is deposited by PE-ALD to passivate the Au/a-Ga_(2)O_(3)/Au interface,resulting in the responsivity of 788 A/W(under 254 nm at 10 V),a 250-nm-to-400-nm rejection ratio of 9.2×10^(3),and the rise time and the decay time of 32 ms and 6 ms,respectively.These results demonstrate that the a-Ga_(2)O_(3) film grown by PE-ALD is a promising candidate for high-performance solar-blind photodetection and potentially can be integrated with Si ICs for commercial production.展开更多
目的提高聚碳酸亚丙酯(PPC)薄膜的阻隔性。方法采用等离子体增强化学气相沉积法在PPC薄膜表面上沉积SiOx层,并以阻氧性能为工艺评估指标。结果采用等离子体增强化学气相沉积法可以在PPC薄膜表面沉积SiOx层,最佳工艺条件为沉积功率150 W...目的提高聚碳酸亚丙酯(PPC)薄膜的阻隔性。方法采用等离子体增强化学气相沉积法在PPC薄膜表面上沉积SiOx层,并以阻氧性能为工艺评估指标。结果采用等离子体增强化学气相沉积法可以在PPC薄膜表面沉积SiOx层,最佳工艺条件为沉积功率150 W、六甲基硅氧烷流量为6 m L/min,氧化流量为12 m L/min、沉积时间60 min,通过沉积SiOx层,PPC薄膜的阻氧性能得到了有效的提高。结论采用等离子化学气相沉积法在PPC薄膜上沉积SiOx层可明显提高对氧气、水蒸气和紫外线的阻隔性能,并保持原有韧性。展开更多
基金This work was supported by the National Natural Science Foundation of China under Grant No.21872019 and the Innovation Group Project of Sichuan Province under Grant No.20CXTD0090This work was also partly supported by the Slovenian Research Agency under Grants No.P2-0412 and No.J2-2498 for A.Mavric and M.Valant,and No.Z1-3189 for N.Pastukhova。
文摘Wide-bandgap gallium oxide(Ga_(2)O_(3))is one of the most promising semiconductor materials for solar-blind(200 nm to 280 nm)photodetection.In its amorphous form,amorphous gallium oxide(a-Ga_(2)O_(3))maintains its intrinsic optoelectronic properties while can be prepared at a low growth temperature,thus it is compatible with Si integrated circuits(ICs)technology.Herein,the a-Ga_(2)O_(3) film is directly deposited on pre-fabricated Au interdigital electrodes by plasma enhanced atomic layer deposition(PE-ALD)at a growth temperature of 250°C.The stoichiometric a-Ga_(2)O_(3) thin film with a low defect density is achieved owing to the mild PE-ALD condition.As a result,the fabricated Au/a-Ga_(2)O_(3)/Au photodetector shows a fast time response,high responsivity,and excellent wavelength selectivity for solar-blind photodetection.Furthermore,an ultra-thin MgO layer is deposited by PE-ALD to passivate the Au/a-Ga_(2)O_(3)/Au interface,resulting in the responsivity of 788 A/W(under 254 nm at 10 V),a 250-nm-to-400-nm rejection ratio of 9.2×10^(3),and the rise time and the decay time of 32 ms and 6 ms,respectively.These results demonstrate that the a-Ga_(2)O_(3) film grown by PE-ALD is a promising candidate for high-performance solar-blind photodetection and potentially can be integrated with Si ICs for commercial production.
文摘目的提高聚碳酸亚丙酯(PPC)薄膜的阻隔性。方法采用等离子体增强化学气相沉积法在PPC薄膜表面上沉积SiOx层,并以阻氧性能为工艺评估指标。结果采用等离子体增强化学气相沉积法可以在PPC薄膜表面沉积SiOx层,最佳工艺条件为沉积功率150 W、六甲基硅氧烷流量为6 m L/min,氧化流量为12 m L/min、沉积时间60 min,通过沉积SiOx层,PPC薄膜的阻氧性能得到了有效的提高。结论采用等离子化学气相沉积法在PPC薄膜上沉积SiOx层可明显提高对氧气、水蒸气和紫外线的阻隔性能,并保持原有韧性。
