Radial and Angular Resolved Langmuir Probe Diagnosis of a Pulsed Vacuum Arc Plasma

Vacuum arc ion sources are known for delivering high currents of ion beams in many technological applications. There is a great need in the present ion accelerator injection research for a titanium vacuum arc source to produce high-ionized plasma, in which its parameter is extremely important to match the extractors geometry and the extraction voltage. In this paper, the radial and angular distributions of the titanium cathodic vacuum arc plasma parameters are measured by a cylindrical Langmuir probe and analyzed by the Druyvesteyn method from the I-V curves. The electron density ne is about 10^（17）m^（-3） and the effective electron temperature Tefr is in the range of 6.12-11.11 eV in the free expansion cup before the ion extraction. The measured distribution of ne over the expansion cross-section is non-uniform and axially unsymmetrical with its form similar to the Gaussian distribution, and most of the plasma is concentrated into an area whose radius is smaller than 5 mm. Teff has a nearly uniform distribution over the expansion cross-section during the discharge. The results of the plasma parameters＇ non-uniformity encourage the researchers to make some optimization designs to improve the parameter distributions, and then to facilitate ion extraction.

Fast Diagnosis of Transient Plasma by Langmuir Probe

A method for the fast measurement of electron temperature and density with temporal resolution in transient plasma has been implemented by Langmuir probe. The diagnostic system consists of a single Lang- muir probe driven by a high frequency sinusoidal voltage. The current and voltage spectrum on the probe were detected synchronously by an oscilloscope with sampling rate being at least 5 times higher than the frequency of sweep voltage. The system has been used to diagnose the transient plasma generated by hypervelocity-impact of LY12 aluminum projectile into LY12 aluminum target.

Plasma diagnosis of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition

Filtered cathodic vacuum arc(FCVA)deposition is regarded as an important technique for the synthesis of tetrahedral amorphous carbon(ta-C)films due to its high ionization rate,high deposition rate and effective filtration of macroparticles.Probing the plasma characteristics of arc discharge contributes to understanding the deposition mechanism of ta-C films on a microscopic level.This work focuses on the plasma diagnosis of an FCVA discharge using a Langmuir dualprobe system with a discrete Fourier transform smoothing method.During the ta-C film deposition,the arc current of graphite cathodes and deposition pressure vary from 30 to 90 A and from 0.3 to 0.9 Pa,respectively.The plasma density increases with arc current but decreases with pressure.The carbon plasma density generated by the arc discharge is around the order of10^(10)cm^(-3).The electron temperature varies in the range of 2-3.5 eV.As the number of cathodic arc sources and the current of the focused magnetic coil increase,the plasma density increases.The ratio of the intensity of the D-Raman peak and G-Raman peak(I_(D)/I_(G))of the ta-C films increases with increasing plasma density,resulting in a decrease in film hardness.It is indicated that the mechanical properties of ta-C films depend not only on the ion energy but also on the carbon plasma density.

Diagnosis of the Argon Plasma in a PECVD Coating Machine

A Langmuir probe plasma diagnostic system was developed to measure the plasma parameters in a PECVD vacuum coating machine. The plasma was a capacitively coupled plasma （CCP） driven by a radio-frequency （RF） power supply. To avoid the disturbance of radio-frequency field on the Langmuir probe measurement, a passive compensation method was applied. This method allowed the ＇dc＇ component to be passed and measured in the probe circuit. It was found that the electron temperature in the range from 2.7 eV to 6.4 eV decreased with the increase in RF power. The measured plasma density ranged from 8×10^16 m^-3 to 0.85×10^15 m^-3 and increased with the increase in RF power.

Improvement of the Harmonic Technique of Probe for Measurements of Electron Temperature and Ion Density

Conventional Langmuir probe techniques usually face the difficulty of being used in processing plasmas where dielectric compounds form,due to rapid failure by surface insulation.A solution to the problem,the so-called harmonic probe technique,had been proposed and shown effectiveness.In this study,the technique was investigated in detail by changing bias signal amplitudes V_0,and evaluated its accuracy by comparing with the conventional Langmuir probe.It was found that the measured electron temperature Teincreased with V_0,but showing a relatively stable region when V_0〉Te/e in which it was close to the true Tevalue.This is contrary to the general consideration that V_0should be smaller than Te/e for accurate measurement of Te.The phenomenon is interpreted by the non-negligible change of the ion current with V_0at low V_0values.On the other hand,the measured nialso increased with V_0due to the sheath expansion,and to improve the accuracy of niit needs to linearly extrapolate the ni-V_0trend to V_0=0.The results were applied to a diagnosis of the plasmas for chemical vapor deposition of diamond-like carbon thin films and the relationship between plasma parameters and films deposition rates was obtained.

用Langmuir探针法标定的发射光谱法诊断等离子体电子密度及分布

电子密度是低温等离子体的重要参数之一,仅采用发射光谱或Langmuir探针一种诊断方法,很难测量出该参数及其分布。针对这一问题,提出了用Langmuir探针法标定的发射光谱法,用于诊断等离子体电子密度及其分布。通过对一定长度表面波等离子体源的实验测量,验证了该方法的可行性。对于电子温度变化不大的等离子体,利用本文提出的诊断方法,可以测量出其电子密度及其分布。提出的诊断方法为低温等离子体参数的实验诊断提供了一种新的途径。

Langmuir探针测量低温等离子体参数特性实验

介绍了Langmuir探针测量等离子体参数特性的实验原理和方法,采用Langmuir单探针诊断了电子回旋共振等离子体参数的分布特性。结果表明,在一定微波功率下,气压增加,等离子体密度趋于饱和。将Langmuir单探针测量等离子体特性实验引入高年级近代物理实验课程的综合创新实验,使得学生在动手实验的过程中接触到物理学科研究前沿领域的技术与知识,激发学生的创新意识和提高创新能力。

鞘层电容对快速扫描双探针伏安曲线的影响

建造了基于多偶极腔体热阴极放电形式搭建的500kHz不对称快速扫描双探针系统,以电容对测量结果的影响进行实验研究。对不同扫描频率下不同尺寸的快速扫描不对称朗缪尔双探针受离子饱和电流及鞘电流影响的结果进行了对比分析。这项研究对于不同扫描频率下快速扫描不对称双探针的选择应用有着参考和指导意义。

朗谬尔探针用于VAC等离子体诊断的初步研究

简要分析了朗谬尔（Ｌａｎｇｍｕｉｒ）探针用于真空电弧镀膜（ＶＡＣ）等离子体诊断的可行性及理论适用性问题．介绍了一种可用于ＶＡＣ等离子体在线监测的探针诊断系统，并利用此系统分析了不同工艺参数下等离子体参数的变化．

螺旋波激发氢等离子体的电子温度及密度研究

采用射频调谐朗缪尔单探针方法对螺旋波激发的氢等离子体I-V特性曲线进行了测量。运用Druyvestey方法对氢等离子体的电子能量分布(EEDF)及电子密度ne的变化规律进行了研究,并与发射光谱诊断结果进行了比较。结果表明:ne随着射频功率的增大成线性增大,本实验中最大值可达到1012cm-3量级,电子平均能量E随着射频功率的增大逐渐升高,并逐渐达到饱和;ne随着工作气压的增加而增大并出现峰值,存在一个最佳气压范围(2 Pa^4 Pa)使ne达到最大,E则随着工作气压的增加逐渐减小;氢气流量对ne的影响非常小,当氢气流量达到一定值(12 sccm)后,ne几乎不变化,E随着氢气流量的增加逐渐降低,最后趋于稳定;朗缪尔单探针方法与发射光谱法诊断的结果基本一致。

采用发射光谱和朗缪尔探针诊断低温低压氢等离子体

使用发射光谱诊断法和Langmuir探针诊断法,测量了螺旋波激发等离子体化学气相沉积装置中产生的氢等离子体的发射光谱和电流-电压曲线。运用日冕模型和Druyvestey方法,对不同放电参数条件下激发态氢原子密度?等离子体密度及电子能量分布的变化规律进行了研究。结果表明:激发态氢原子密度随射频功率增大而增大,随工作气压的增大先增大,后缓慢下降。等离子体密度随射频功率增大线性增大,随工作气压的增加也是先增大,出现峰值后缓慢下降。电子平均能量随射频功率的变化是先增大,后达到平衡;随着工作气压的增大逐渐减小。两种诊断方法得到的结果基本相符。在低温低压等离子诊断中,两种诊断方法结合使用,可以得到更准确和更多的等离子体信息。

微阴极电弧推力器羽流探针诊断研究

微阴极电弧推力器(micro-cathode arc thruster,μCAT)具备功率低和结构简单的特点,能够满足微纳卫星的任务需求,具有良好的发展前景。μCAT羽流的诊断可以揭示推力器的加速机理,对提高其性能具有重要意义。利用朗缪尔三探针对μCAT羽流进行诊断,得到了μCAT羽流不同位置的电子温度、电子密度和离子速度等羽流特性,研究了外加磁场、充电时间和阴极材料对羽流特性的影响。研究结果表明,μCAT放电初期产生的等离子体电子温度较高,密度较大;随着等离子体向下游运动,电子温度和电子密度降低,离子速度增大;外加磁场的磁感应强度越强,电子温度和离子速度越高,电子密度有所降低;磁场位置适当向推力器下游平移,能够有效提高推力器中轴线的电子密度;μCAT充电时间越长,电子温度、电子密度和离子速度越大;相比于CuW和AgW阴极,Ti阴极羽流的电子温度更高,电子密度更低。

同轴电极结构下真空放电等离子体生成及传播特性(英文)

采用放电电流为100～300 A、持续时间为13μs的单脉冲电源,设计了两种同轴电极结构作为放电阳极,分别为筒状电极、喷嘴状电极。利用MAXWELL 3D电场仿真软件对两种电极结构下的电场分布进行了仿真分析,并采用探针法对放电生成的等离子体的参数进行了测量,分析讨论了同轴电极结构对真空放电等离子体生成特性的影响。选取喷嘴状电极结构作为阳极,分别测量了采用铅、铝、铜三种材质的阴极时生成的等离子体的扩散速度及能量。实验与仿真结果表明:当阳极为喷嘴状电极时阴极尖端的电场强度较大,测得放电电流较大,击穿电压较低,等离子体密度也较大;采用铝材质阴极时生成的等离子体扩散速度最快,采用铅材质阴极时生成的等离子体的离子动能最大。

利用静电双探针对辉光放电等离子体诊断分析

阐述了利用Langmuir双探针诊断等离子体参数的基本原理,对圆柱腔中的空气辉光放电等离子体进行了双探针诊断,通过实验测得伏安特性曲线,计算得出等离子体密度和电子温度。分析了密度参数变化与放电电流大小之间的关系。最后将诊断结果与准光腔系统进行比较,二者虽略有差别,但差别不大,且变化趋势一致。验证了采用本双探针系统诊断辉光放电等离子体密度的可靠性。

PECVD镀膜机等离子体静电探针诊断

开发了一个朗缪尔探针等离子体诊断系统,对PECVD真空镀膜机进行了等离子体参数诊断。该镀膜机内的等离子体是电容偶合激发方式的氩等离子体,激发源为射频电源(13.56MHz)。在射频功率为40W到140W的范围内,使用该朗缪尔探针对镀膜机中氩等离子体的参数(等离子体密度和电子温度)进行了诊断分析。结果表明:电子温度在2.7eV和6.4eV之间,并且随着射频功率的增加而降低。而等离子体的密度在0.85×1015m-3到8×1016m-3的范围随着射频电源的增加而增加。

基于LabVIEW的集成式多探针等离子体诊断系统

为了提高电推进羽流诊断自动化程度,解决传统等离子体诊断方法测试周期长、精度低和数据处理复杂等问题,以LabVIEW为开发平台研制了一种电推力器羽流自动诊断系统。该系统集成了Langmuir单探针、Langmuir双探针、RPA离子能量分析仪和法拉第筒等几种常见静电探针,可通过软件实现不同探针的选择切换,扫描电源波形控制、电流及电压信号采集、曲线降噪与滤波、数据处理及计算结果显示和保存等功能。与传统逐点手动方法相比,该系统显著地提高了等离子体羽流诊断的速度和精度。

真空断路器弧后阶段鞘层发展过程的探针阵列诊断方法

真空断路器开断过程中弧后残余等离子体密度演变规律是关乎其开断性能的重要特征。基于探针诊断电子饱和区域工作原理,该文提出一种真空断路器弧后阶段鞘层发展过程的探针阵列诊断方法。设计探针阵列布置方式、探针阵列控制电路、探针阵列数据处理流程。基于可拆卸真空腔体和合成试验回路,搭建探针诊断实验平台,开展真空电弧弧后残余等离子体电子密度探针阵列诊断实验,得到探针阵列电流的衰减规律以及弧后电子密度的二维分布。研究表明:真空断路器弧后残余等离子体电子密度数量级范围为10^(10)~10^(11)cm^(-3),测量结果与已有文献结果偏差不超过5%,衰减时间范围为30~40μs,弧后阶段鞘层的发展规律与已有文献的诊断结果一致。结果验证了探针阵列诊断弧后阶段鞘层发展过程的有效性,为真空断路器弧后残余等离子体电子密度的测量提供一种经济、有效的诊断方法。

用于真空电弧涂镀中的静电探针诊断装置

本文介绍了一套能准确诊断真空电弧等离子体参数的Ｌａｎｇｍｕｉｒ探针系统。测得典型参数：电子温度０．６－０．７ｅＶ，等离子体电位２Ｖ，电子浓度２×１０￣（１５）／ｍ￣３。该装置可用于自动监控成膜过程。

真空电弧镀膜中等离子体参数的实验研究

本文运用Ｌａｎｓｍｕｉｒ静电探针技术，对真空电弧镀膜过程中，基片鞘层附近区域的电子能量电子密度值及其受基片偏压影响而改变的关系进行了实验测量。结果表明，在环境压力为５．３２Ｐａ电弧电流为７５Ａ，进行钛金属薄膜沉积时，等离子体参数的特征值表征为电子能量值１～５ｅＶ．电子密度值１０１１ｃｍ－３左右；且随着基片偏压值的增大，电子能量有缓慢的增加，而电子密度则显著下降。最后，对测量结果进行了分析与讨论。

固体工质等离子体发生器流场参数的诊断

利用朗缪尔探针和发射光谱两种诊断手段,测量了某固体工质等离子体发生器的喷流流场参数。结果表明,在输入功率为2kW时,发生器可持续稳定工作300s;发生器燃烧室内最高温度为800K。稳定工作时,发生器壳体结构正常,没有发现损毁现象;等离子体喷流的电子密度为1011～1012cm-3量级,电子温度为1.5～3.5eV。