The plasma window is an advanced apparatus that can work as the interface between a vacuum and a high pressure region. It can be used in many applications that need atmosphere-vacuum interface, such as a gas target, e...The plasma window is an advanced apparatus that can work as the interface between a vacuum and a high pressure region. It can be used in many applications that need atmosphere-vacuum interface, such as a gas target, electron beam welding, synchrotron radiation and a spallation neutron source. A test bench of the plasma window is constructed in Peking University. A series of experiments and the corresponding parameter measurements have been presented in this article. The experiment result indicates the feasibility of such a facility acting as an interface between a vacuum and a high pressure region.展开更多
Cerium dioxide, CeO2, is a potentially superior material in a myriad of areas, and many methods have been proposed to deposit single crystal CeO2 thin films. A novel fabrication technique utilizing dual plasma generat...Cerium dioxide, CeO2, is a potentially superior material in a myriad of areas, and many methods have been proposed to deposit single crystal CeO2 thin films. A novel fabrication technique utilizing dual plasma generated by metal vacuum arc (MEVVA) and radio frequency (RF) is discussed in this paper. We have recently conducted a systematic investigation to determine the optimal process window to deposit CeO2 thin films'on Si(100) substrates. The X-ray diffraction results show the existence of CeO2(100) in the as-deposited sample.展开更多
Plasma X-ray sources for biological microscopy have been produced by focusing single shots from Nd:glass laser onto carbon rod targets at irradiances between 1 × 1013 W⋅cm−2 and 3 × 1013 W...Plasma X-ray sources for biological microscopy have been produced by focusing single shots from Nd:glass laser onto carbon rod targets at irradiances between 1 × 1013 W⋅cm−2 and 3 × 1013 W⋅cm−2 to expose test objects. The optimum parameters needed for obtaining high accurate information on the samples under test namely: the minimum energies and irradiances at a range of angles between the incoming laser beam and the normal to the resist, the depth of exposure of the photoresist as a function of incident laser energy (and irradiance) were concluded in this work.展开更多
基金Supported by National Natural Science Foundation of China(10805003,91026012)
文摘The plasma window is an advanced apparatus that can work as the interface between a vacuum and a high pressure region. It can be used in many applications that need atmosphere-vacuum interface, such as a gas target, electron beam welding, synchrotron radiation and a spallation neutron source. A test bench of the plasma window is constructed in Peking University. A series of experiments and the corresponding parameter measurements have been presented in this article. The experiment result indicates the feasibility of such a facility acting as an interface between a vacuum and a high pressure region.
基金The work was supported by Hong Kong RGC CERG9040344 and 9040412, RGC / Germany Joint Schemes9050084 and 9050150, and CityU S
文摘Cerium dioxide, CeO2, is a potentially superior material in a myriad of areas, and many methods have been proposed to deposit single crystal CeO2 thin films. A novel fabrication technique utilizing dual plasma generated by metal vacuum arc (MEVVA) and radio frequency (RF) is discussed in this paper. We have recently conducted a systematic investigation to determine the optimal process window to deposit CeO2 thin films'on Si(100) substrates. The X-ray diffraction results show the existence of CeO2(100) in the as-deposited sample.
文摘Plasma X-ray sources for biological microscopy have been produced by focusing single shots from Nd:glass laser onto carbon rod targets at irradiances between 1 × 1013 W⋅cm−2 and 3 × 1013 W⋅cm−2 to expose test objects. The optimum parameters needed for obtaining high accurate information on the samples under test namely: the minimum energies and irradiances at a range of angles between the incoming laser beam and the normal to the resist, the depth of exposure of the photoresist as a function of incident laser energy (and irradiance) were concluded in this work.
