N-polar and Ⅲ-polar GaN and AlN epitaxial thin films grown side by side on single sapphire substrate was reported.Surface morphology,wet etching susceptibility and bi-axial strain conditions were investigated and the...N-polar and Ⅲ-polar GaN and AlN epitaxial thin films grown side by side on single sapphire substrate was reported.Surface morphology,wet etching susceptibility and bi-axial strain conditions were investigated and the polarity control scheme was utilized in the fabrication of Schottky barrier diode where ohmic contact and Schottky contact were deposited on N-polar domains and Ga-polar domains,respectively.The influence of N-polarity on on-state resistivity and Ⅰ–Ⅴ characteristic was discussed,demonstrating that lateral polarity structure of GaN and AlN can be widely used in new designs of optoelectronic and electronic devices.展开更多
基金Project partially supported by the National Key Research and Development Program of China(No.2016YFB0400802)the National Natural Science Foundation of China(No.61704176)the Open project of Zhejiang Key Laboratory for Advanced Microelectronic Intelligent Systems and Applications(No.ZJUAMIS1704)
文摘N-polar and Ⅲ-polar GaN and AlN epitaxial thin films grown side by side on single sapphire substrate was reported.Surface morphology,wet etching susceptibility and bi-axial strain conditions were investigated and the polarity control scheme was utilized in the fabrication of Schottky barrier diode where ohmic contact and Schottky contact were deposited on N-polar domains and Ga-polar domains,respectively.The influence of N-polarity on on-state resistivity and Ⅰ–Ⅴ characteristic was discussed,demonstrating that lateral polarity structure of GaN and AlN can be widely used in new designs of optoelectronic and electronic devices.
