Reduced threshold current density of GaN-based green laser diode by applying polarization doping p-cladding layer

Absorption induced by activated magnesium(Mg)in a p-type layer contributes considerable optical internal loss in Ga Nbased laser diodes(LDs).An LD structure with a distributed polarization doping(DPD)p-cladding layer(CL)without intentional Mg doping was designed and fabricated.The influence of the anti-waveguide structure on optical confinement was studied by optical simulation.The threshold current density,slope efficiency of LDs with DPD p-CL,and Mg-doped CL,respectively,were compared.It was found that LDs with DPD p-CL showed lower threshold current density but reduced slope efficiency,which were caused by decreasing internal loss and hole injection,respectively.

High-Temperature Performance Analysis of AlGaN/GaN Polarization Doped Field Effect Transistors Based on the Quasi-Multi-Channel Model

We report on the temperature-dependent dc performance of A1GaN/GaN polarization doped field effect transistors （PolFETs）. The rough decrements of drain current and transeonductance with the operation temperature are observed. Compared with the conventional HFETs, the drain current drop of the PolFET is smaller. The transeonductance drop of PolFETs at different gate biases shows different temperature dependences. From the aspect of the unique carrier behaviors of graded AlGaN/GaN heterostructure, we propose a quasi-multi-channel model to investigate the physics behind the temperature-dependent performance of AlGaN/GaN PolFETs.

Structural,electronic,and magnetic behaviors of 5d transition metal atom substituted divacancy graphene：A first-principles study

Structural, electronic, and magnetic behaviors of 5d transition metal（TM） atom substituted divacancy（DV） graphene are investigated using first-principles calculations. Different 5d TM atoms（Hf, Ta, W, Re, Os, Ir, and Pt） are embedded in graphene, these impurity atoms replace 2 carbon atoms in the graphene sheet. It is revealed that the charge transfer occurs from 5d TM atoms to the graphene layer. Hf, Ta, and W substituted graphene structures exhibit a finite band gap at high symmetric K-point in their spin up and spin down channels with 0.783 μB, 1.65 μB, and 1.78 μB magnetic moments,respectively. Ir and Pt substituted graphene structures display indirect band gap semiconductor behavior. Interestingly, Os substituted graphene shows direct band gap semiconductor behavior having a band gap of approximately 0.4 e V in their spin up channel with 1.5 μB magnetic moment. Through density of states（DOS） analysis, we can predict that d orbitals of 5d TM atoms could be responsible for introducing ferromagnetism in the graphene layer. We believe that our obtained results provide a new route for potential applications of dilute magnetic semiconductors and half-metals in spintronic devices by employing 5d transition metal atom-doped graphene complexes.