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Diamond Like Carbon Film Deposited on Porous Silicon as Passivation Coating
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作者 QU Jian-hua XIA Yi-ben +3 位作者 WANG Lin-jun MO Yao-wu TANG Ding-yuan (College of Material Science and Engineering, Shanghai University, Shanghai 201800, CHN National lab. of Infrared Physics, Chinese Academy of Sciences, Shanghai 200083, CHN) 《Semiconductor Photonics and Technology》 CAS 2000年第2期100-104,共5页
By depositing diamond like carbon (DLC) film with radio frequency plasma chemical vapor deposition (RFPCVD) method, a new surface passivation technique for photoluminescence porous silicon (PS) has been studied. The s... By depositing diamond like carbon (DLC) film with radio frequency plasma chemical vapor deposition (RFPCVD) method, a new surface passivation technique for photoluminescence porous silicon (PS) has been studied. The surface microstructure and photoelectric properties of both porous silicon and DLC coated PS have been analyzed by using AFM, FTIR and PL spectrotrieters. The results show the DLC film with dense and homogenous nanometer grains can be deposited on the PS used as passivation coating as it can terminate oxide reaction on the surface of the PS. Furthermore, certain ratio of hydrogen existed in the DLC film can be improved to form hydride species on the DLC/PS interface as the centers of the luminescence so that the DLC coating is of benefit not only to the passivation of the PS but also to the improvement of its luminescent intensity. 展开更多
关键词 Diamond like carbon film passivation coating porous silicon PHOTOLUMINESCENCE
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Characterization and Application of Diamond-like Carbon Films
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作者 侯清润 高炬 +1 位作者 杨晔 迟宁 《Rare Metals》 SCIE EI CAS CSCD 1998年第3期48-53,共6页
Diamond like carbon films were synthesized by the pulsed laser deposition method under a magnetic filed. The magnetic field was used to enhance the hardness of the films. Analysis with transmission electron microscop... Diamond like carbon films were synthesized by the pulsed laser deposition method under a magnetic filed. The magnetic field was used to enhance the hardness of the films. Analysis with transmission electron microscopy and atomic force microscopy were carried out to characterize the films. As a protective coating, the film was deposited on porous silicon. The influence of the coating on the photoluminescence properties of porous silicon was studied. 展开更多
关键词 Diamond like carbon films TEM AFM porous silicon PHOTOLUMINESCENCE
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Luminescent Properties of Porous Si Passivated by Diamond Film and DLC Film
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作者 Linjun WANG, Yiben XIA, Weili ZHANG, Minglong ZHANG and Weimin SHISchool of Materials Science & Engineering, Shanghai Univ., Shanghai 201800, China 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2004年第2期145-148,共4页
Surface passivation methods for porous Si (PS) surfaces, i.e., depositing diamond film or diamond-like carbon (DLC) film on PS surfaces, were attempted. Two emission bands, weak blue band and strong red band existed i... Surface passivation methods for porous Si (PS) surfaces, i.e., depositing diamond film or diamond-like carbon (DLC) film on PS surfaces, were attempted. Two emission bands, weak blue band and strong red band existed in the PL spectrum of diamond film coated on PS, were discovered by the photoluminescence measurements. The luminescent mechanism and stability were discussed. The results indicated that diamond film may stabilize the PL wavelength and intensity of PS, and therefore could become a promising passivation film of porous Si. The PL properties of PS coated by DLC films, including hydrogenated diamond like carbon (DLC:H) film and nitrogen doped DLC film (DLC:N) were also studied in this paper. The DLC films may stabilize the PL of PS, but the photoluminescent intensity was obviously weaker than that of diamond film coated PS. 展开更多
关键词 porous Si passivation Diamond film diamond-like carbon film
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Mechanical Properties of Composite SiNx/DLC Films Prepared by Filtered Cathodic Arc of Graphite Incorporated with RF Sputtering of Silicon Nitride
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作者 Phuwanai Bunnak Yongping Gong +2 位作者 Supanee Limsuwan Artorn Pokaipisit Pichet Limsuwan 《Materials Sciences and Applications》 2013年第9期564-571,共8页
Composite SiNx/DLC films were deposited on Si substrate by RF magnetron sputtering of silicon nitride (Si3N4) target simultaneously with filtered cathode arc (FCA) of graphite. The RF power was fixed at 100 W whereas ... Composite SiNx/DLC films were deposited on Si substrate by RF magnetron sputtering of silicon nitride (Si3N4) target simultaneously with filtered cathode arc (FCA) of graphite. The RF power was fixed at 100 W whereas the arc currents of FCA were 20, 40, 60 and 80 A. The effects of arc current on the structure, surface roughness, density and mechanical properties of SiNx/DLC films were investigated. The results show that the arc current in the studied range has effect on the structure, surface roughness, density and mechanical properties of composite SiNx/DLC films. The composite SiNx/DLC films show the sp3 content between 53.5% and 66.7%, density between 2.54 and2.98 g/cm3, stress between 1.7 and 2.2 GPa, and hardness between 35 and 51 GPa. Furthermore, it was found that the density, stress and hardness correlate linearly with the sp3 content for composite SiNx/DLC films. 展开更多
关键词 silicon NITRIDE diamond-like carbon COMPOSITE SiNx/DLC film Filtered Cathodic arc
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The Hardness of Amorphous Si-DLC Films by Molecular Dynamics Simulations 被引量:1
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作者 兰惠清 LIU Can 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2013年第3期444-448,共5页
Silicon-doped diamond-like carbon (Si-DLC) films possess the potential to improve wear performance of DLC films in humid atmospheres and at higher temperatures. But many experimental results of Si-DLC films show tha... Silicon-doped diamond-like carbon (Si-DLC) films possess the potential to improve wear performance of DLC films in humid atmospheres and at higher temperatures. But many experimental results of Si-DLC films show that their structure and mechanical properties have changed greatly with the increasing silicon content. Therefore, molecular dynamics (MD) simulations were used to generate hydrogen-free Si-DLC films and study their nano-indentation process under the interaction of a diamond indenter. The results show that sp3/sp2(C) (only carbon atoms) always decreases with the increasing silicon content. But sp3/sp2(C+Si) ratio increases firstly and reaches a maximum at the silicon content of 0.2, and then decreases with the further increase of the silicon content. Bulk modulus and hardness of the Si-DLC films both decrease with the increasing of the silicon content, which has the same trend with Papakonstantinou and Ikeyama's results. It is concluded that the hardness of the Si-DLC films is dependent on sp3/sp2(C), not sp3/sp2(C+Si). 展开更多
关键词 diamond-like carbon film molecular dynamics silicon HARDNESS
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多孔硅的表面碳膜钝化 被引量:9
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作者 李宏建 彭景翠 +2 位作者 颜永红 瞿述 向建南 《发光学报》 EI CAS CSCD 北大核心 2000年第2期104-108,共5页
报道对多孔硅(PS)进行碳膜(CF)钝化处理的结果。红外吸收光谱表明,经钝化处理样品的表面由Si—C.Si—N和Si—O键所覆盖;荧光光谱表明,经钝化处理的样品较未处理的样品发光强度提高4~4.5倍.且发光峰位明显蓝... 报道对多孔硅(PS)进行碳膜(CF)钝化处理的结果。红外吸收光谱表明,经钝化处理样品的表面由Si—C.Si—N和Si—O键所覆盖;荧光光谱表明,经钝化处理的样品较未处理的样品发光强度提高4~4.5倍.且发光峰位明显蓝移;存放实验显示,经钝化处理的样品发光强度稳定、发光峰位不变。这些结果表明,正丁胺可以在多孔硅表面形成优良的钝化碳膜,是一种十分有效的多孔硅后处理途径。 展开更多
关键词 多孔硅 碳膜 表面钝化 荧光光谱
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碳/碳化硅复合材料静止环境下氧化行为模拟 被引量:2
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作者 周述光 曾磊 +1 位作者 国义军 刘骁 《气体物理》 2021年第4期29-36,共8页
碳/碳化硅(C/SiC)复合材料是应用于临近空间高超声速飞行器热防护的一种新型防热材料.国内外通过性能测试较多地研究了材料不同制备工艺对抗烧蚀性的影响,提出的抗烧蚀分析理论模型均基于液态氧化膜.而近期开展的C/SiC复合材料管式炉加... 碳/碳化硅(C/SiC)复合材料是应用于临近空间高超声速飞行器热防护的一种新型防热材料.国内外通过性能测试较多地研究了材料不同制备工艺对抗烧蚀性的影响,提出的抗烧蚀分析理论模型均基于液态氧化膜.而近期开展的C/SiC复合材料管式炉加热实验和试样微观形貌电镜表征显示常压下,当温度低于1696 K时,C/SiC复合材料氧化后表面形成了多孔的固态氧化膜.采用压汞法测试了氧化物孔隙.基于孔隙中的气体扩散行为,结合氧化反应动力学关系,建立了一种新的C/SiC复合材料惰性氧化模型.模型预测值与实验结果吻合良好,表明该惰性氧化模型对氧化膜厚度和质量损失具有较好的预测能力. 展开更多
关键词 碳/碳化硅 氧化膜 抗烧蚀 孔隙率 惰性氧化模型
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类金刚石薄膜对多孔硅发光的钝化作用
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作者 范轶敏 居建华 +4 位作者 张伟丽 夏义本 王志明 方志军 王林军 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 2002年第z1期28-30,共3页
介绍了类金刚石薄膜对多孔硅发光的钝化作用.类金刚石薄膜隔绝了外界对多孔硅表面的影响,使硅氢键不易断裂,从而减少了非辐射复合中心,稳定了多孔硅的发光性能.通过在类金刚石薄膜中掺氮还可以进一步提高钝化效果,因为氮使多孔硅表面... 介绍了类金刚石薄膜对多孔硅发光的钝化作用.类金刚石薄膜隔绝了外界对多孔硅表面的影响,使硅氢键不易断裂,从而减少了非辐射复合中心,稳定了多孔硅的发光性能.通过在类金刚石薄膜中掺氮还可以进一步提高钝化效果,因为氮使多孔硅表面更多的悬空键被钝化形成Si—N键,从而提高了发光强度. 展开更多
关键词 多孔硅 类金刚石薄膜 钝化.
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