The novel sulfonated polyimide membranes were successfully synthesized by thermal imidization with monomers of 4,4＇-（hexafluoroisopropylidene）diphthalic anhydride （6FDA）, 4,4＇-diamino- diphenyl ether-2,2＇-disul...The novel sulfonated polyimide membranes were successfully synthesized by thermal imidization with monomers of 4,4＇-（hexafluoroisopropylidene）diphthalic anhydride （6FDA）, 4,4＇-diamino- diphenyl ether-2,2＇-disulfonic acid （SODA） and 3,3 ＇-diaminochalcone （3DAC）. Photosensitive chalcone moiety was introduced to the main chain of copolymers, and the photocrosslinking of resulting copolymer in aqueous electrolyte was attempted. A series of sulfonated copolyimide precursors containing chalcone functional groups in the main chain were prepared with different sulfonation degrees by controlling the molar ratio of SODA, 6FDA and 3DAC. The polymer membranes were prepared from these sulfonated aromatic precursors by solution casting and subsequent thermal imidization. The crosslinking with UV irradiation was attempted in the presence or absence of distilled water. The characterizations of the resulting membrane such as the ion-exchange capacity, water absorption and ionic conductivity were performed with respect to the copolymer compositions and the photocrosslinking conditions.展开更多
Positive type photosensitive polyimide is used as the modification layer in the thin film transistors production process. The photosensitive polyimide is not only used as the second insulating layer, it can also be us...Positive type photosensitive polyimide is used as the modification layer in the thin film transistors production process. The photosensitive polyimide is not only used as the second insulating layer, it can also be used instead of a mask because of the photosensitivity. A suitable curing condition can help photosensitive polyimide form the high performance polyimide with orderly texture inside, and the performance of imidization depends on the precise control of temperature, time, and heat control during the curing process. Therefore, experiments of different stepped up heating tests are made, and the ability of protecting silicon dioxide is analyzed.展开更多
Photosensitive polyimide precursor containing glycol monocinnamate group was synthesized by a new method. The photoresist, made from the above polyimide precursor, was spin coated onto silicon wafers, prebaked...Photosensitive polyimide precursor containing glycol monocinnamate group was synthesized by a new method. The photoresist, made from the above polyimide precursor, was spin coated onto silicon wafers, prebaked and then exposed to UV light. The appropriate conditions of the photolithographic procedures were determined. This photosensitive polyimide precursor showed good light sensitivity and the polyimide which was obtained by heating the polyimide precursor had a high thermal stability.展开更多
Photosensitive polyimide/titania hybrid was prepared successfully by sol gel process. This hybrid material posseses a good photolithographic property under UV exposure. The introduction of titania leads to the increas...Photosensitive polyimide/titania hybrid was prepared successfully by sol gel process. This hybrid material posseses a good photolithographic property under UV exposure. The introduction of titania leads to the increase in refractive index of the hybrid.展开更多
The soluble photosensitive polyimides were synthesized by the copolymerization of 3,3′-diaminochalcone (mDAC),bis(3-aminophenyl)-3,5-bis(trifluoromethyl)phenyl phosphine oxide (mDA6FPPO) and 4,4′-(hexafluoroisopropy...The soluble photosensitive polyimides were synthesized by the copolymerization of 3,3′-diaminochalcone (mDAC),bis(3-aminophenyl)-3,5-bis(trifluoromethyl)phenyl phosphine oxide (mDA6FPPO) and 4,4′-(hexafluoroisopropylidene)-diphthalic anhydride (6FDA).The polymers were characterized by FT-IR spectrum, and the properties of polymers were also discussed.The results show that the polyimides have excellent solubility in conventional organic solvents such as NMP,DMF,THF and acetone.The T_ gs of polyimides are ranged in 256℃～277℃.The polymers are stable up to over 400℃ and the residual weights at 800℃ are between 46%～50%.The resulting polyimides have good adhesive properties,and they were found to increase with increasing the mDA6FPPO content.The photosensitivity of the polymers was investigated by observations of UV-Vis spectral changes during UV irradiation.展开更多
基金Funded by the New & Renewable Energy R&D Program(2009T100100606) under the Ministry of Knowledge Economy of Koreathe National Research Foundation of Korea (NRF) through the Human Resource Training Project for Regional Innovation
文摘The novel sulfonated polyimide membranes were successfully synthesized by thermal imidization with monomers of 4,4＇-（hexafluoroisopropylidene）diphthalic anhydride （6FDA）, 4,4＇-diamino- diphenyl ether-2,2＇-disulfonic acid （SODA） and 3,3 ＇-diaminochalcone （3DAC）. Photosensitive chalcone moiety was introduced to the main chain of copolymers, and the photocrosslinking of resulting copolymer in aqueous electrolyte was attempted. A series of sulfonated copolyimide precursors containing chalcone functional groups in the main chain were prepared with different sulfonation degrees by controlling the molar ratio of SODA, 6FDA and 3DAC. The polymer membranes were prepared from these sulfonated aromatic precursors by solution casting and subsequent thermal imidization. The crosslinking with UV irradiation was attempted in the presence or absence of distilled water. The characterizations of the resulting membrane such as the ion-exchange capacity, water absorption and ionic conductivity were performed with respect to the copolymer compositions and the photocrosslinking conditions.
文摘Positive type photosensitive polyimide is used as the modification layer in the thin film transistors production process. The photosensitive polyimide is not only used as the second insulating layer, it can also be used instead of a mask because of the photosensitivity. A suitable curing condition can help photosensitive polyimide form the high performance polyimide with orderly texture inside, and the performance of imidization depends on the precise control of temperature, time, and heat control during the curing process. Therefore, experiments of different stepped up heating tests are made, and the ability of protecting silicon dioxide is analyzed.
文摘Photosensitive polyimide precursor containing glycol monocinnamate group was synthesized by a new method. The photoresist, made from the above polyimide precursor, was spin coated onto silicon wafers, prebaked and then exposed to UV light. The appropriate conditions of the photolithographic procedures were determined. This photosensitive polyimide precursor showed good light sensitivity and the polyimide which was obtained by heating the polyimide precursor had a high thermal stability.
文摘Photosensitive polyimide/titania hybrid was prepared successfully by sol gel process. This hybrid material posseses a good photolithographic property under UV exposure. The introduction of titania leads to the increase in refractive index of the hybrid.
文摘The soluble photosensitive polyimides were synthesized by the copolymerization of 3,3′-diaminochalcone (mDAC),bis(3-aminophenyl)-3,5-bis(trifluoromethyl)phenyl phosphine oxide (mDA6FPPO) and 4,4′-(hexafluoroisopropylidene)-diphthalic anhydride (6FDA).The polymers were characterized by FT-IR spectrum, and the properties of polymers were also discussed.The results show that the polyimides have excellent solubility in conventional organic solvents such as NMP,DMF,THF and acetone.The T_ gs of polyimides are ranged in 256℃～277℃.The polymers are stable up to over 400℃ and the residual weights at 800℃ are between 46%～50%.The resulting polyimides have good adhesive properties,and they were found to increase with increasing the mDA6FPPO content.The photosensitivity of the polymers was investigated by observations of UV-Vis spectral changes during UV irradiation.
