围绕压阻传感器领域对高性能类金刚石(Diamond Like Carbon,DLC)薄膜压阻敏感材料的需求,针对金属掺杂DLC存在的载流子输运行为和实际多工况(如温度、湿度等)下压阻性能不明的问题,本工作以Ti-石墨复合拼接靶为靶材,采用高功率脉冲磁控...围绕压阻传感器领域对高性能类金刚石(Diamond Like Carbon,DLC)薄膜压阻敏感材料的需求,针对金属掺杂DLC存在的载流子输运行为和实际多工况(如温度、湿度等)下压阻性能不明的问题,本工作以Ti-石墨复合拼接靶为靶材,采用高功率脉冲磁控溅射技术,高通量制备出4种Ti含量(原子分数为0.43%~4.11%)的Ti掺杂类金刚石(Ti-DLC)薄膜,研究了Ti含量对薄膜组分结构、电学性能、变湿度环境下压阻性能的影响规律。结果表明:Ti含量(原子分数)在0.43%~4.11%范围内,掺杂Ti原子均以固溶形式均匀镶嵌于非晶碳网络中,Ti-DLC薄膜电学行为表现为典型半导体特性,在200~350 K温度范围内,薄膜电阻率均随温度升高而降低。载流子传导机制在200~270 K内为Mott型三维变程跳跃传导,在270~350 K范围内则为热激活传导。Ti-DLC薄膜压阻系数(Gauge Factor,GF)最大值为95.1,在20%~80%相对湿度范围内,所有样品GF均随湿度增加而增大,这可能是引入的固溶Ti原子缩短了导电相之间的平均距离,同时吸附表面水分子导致电阻变化。展开更多
Series of TiO 2-ZnO heterojunction composite films with different n（Zn）/n（Ti） ratios were prepared by UDP450 magnetron sputter ion plating equipment, and the mole ratio of Zn to Ti was controlled by adjusting the ...Series of TiO 2-ZnO heterojunction composite films with different n（Zn）/n（Ti） ratios were prepared by UDP450 magnetron sputter ion plating equipment, and the mole ratio of Zn to Ti was controlled by adjusting the current values of sputtering target. The effects of n（Zn）/n（Ti） on the microstructures of TiO2-ZnO films were investigated by SEM, AFM, Raman and XPS, and their photocatalytic decomposition of methyl orange solutions was evaluated. The results show that an increase in n（Zn）/n（Ti） typically results in a decrease in the grain size of composite films firstly and then an increase of grain size, while an increase in n（Zn）/n（Ti） leads to an increase in film roughness firstly and then a decrease in film roughness. Both grain size and roughness of TiO2-ZnO films reach the maximum and minimum at n（Zn）/n（Ti） of 1/9.3, respectively. The n（Zn）/n（Ti） shows little effect on the valences of Zn and Ti elements, which mainly exist in the form of TiO2 and ZnO phases. The n（Zn）/n（Ti） has influence on the amount of anatase/rutile TiO2 heterojunction in the film. With increase of the n（Zn）/n（Ti）, the absorption intensity of the composite film increases and the absorption region extends to 450 nm, which is redshifted as much as 150 nm in comparison with the pure TiO2 films. However, the photocatalytic abilities of heterogeneous composite films do not depend on the n（Zn）/n（Ti） but rather on the microstructures of the TiO2-ZnO composite films. Degradation rate of the film reaches the maximum and the photocatalytic decomposition of pollutants works best when n（Zn）/n（Ti）=1：9.3.展开更多
In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characte...In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction（XRD）, scanning electron microscopy（SEM） and high-resolution transmission electron microscopy（HRTEM）. It is interesting to find that the microstructure of pure Ti films was characterized by the composite structure of amorphous-like matrix embodied with nanocrystallines, and the crystallization was improved with the increase of bias voltage. The hardness of Ti films measured by nanoindentation tests shows a linear relationship with grain sizes in the scale of 6-15 nm. However, the pure Ti films exhibit a soft tendency characterized by a smaller slope of Hall-Petch relationship. In addition, the effect of bias voltage on the growth orientation of Ti films was discussed.展开更多
In this paper, diamond-like carbon (DLC) films were deposited on Ti alloy by electro-deposition. DLC films were brown andcomposed of the compact grains whose diameter was about 400 nm. Examined by XPS, the main compos...In this paper, diamond-like carbon (DLC) films were deposited on Ti alloy by electro-deposition. DLC films were brown andcomposed of the compact grains whose diameter was about 400 nm. Examined by XPS, the main composition of the filmswas carbon. In the Raman spectrum, there were a broad peak at 1350 cm^(-1) and a broad peak at 1600 cm^(-1), which indicatedthat the films were DLC films.展开更多
A study was conducted to develop low-friction, wear-resistant surfaces on high temperature alloys for the temperature range from 26℃ to 900℃. The approach investigated consists of modifying the naturally occurring o...A study was conducted to develop low-friction, wear-resistant surfaces on high temperature alloys for the temperature range from 26℃ to 900℃. The approach investigated consists of modifying the naturally occurring oxide film in order to improve its tribological properties. Improvement is needed at low temperatures where the oxide film, previously formed at high temperature, spalls due to stresses induced by sliding. Experiments with Ti, W and Ta additions show a beneficial effect when added to Ni and Ni-base alloys. Low friction can be maintained down to 100℃ from 900℃. For unalloyed Ni friction and surface damage increases at 400℃ to 500℃. Two new alloys were perpared based on the beneficial results of binary alloys and ZrO2 diffusion in Ni.Low friction at temperature above 500℃ and reasonable values (0.32~0.42) at low temperature are obtained.展开更多
The two series of as-deposited and annealed Ti/Co/Ti thin films were deposited by magnetron sputtering onto glass substrates at room temperature. The structural and magnetic properties of the films at room temperature...The two series of as-deposited and annealed Ti/Co/Ti thin films were deposited by magnetron sputtering onto glass substrates at room temperature. The structural and magnetic properties of the films at room temperature were investigated as function of Co layer thickness. X-ray diffraction (XRD) profiles show Co nanograins are formed as the hexagonal-close-packed (hcp) structure. The perpendicular coercivity of the Ti(15 nm)/Co(30 nm)/Ti(15 nm) film annealed at 450 ℃ for 30 min is about 288 kA·m-1.展开更多
Ti/TiN multilayer film was deposited on uranium surface by arc ion plating technique to improve fretting wear behavior. The morphology, structure and element distribution of the film were measured by scanning electric...Ti/TiN multilayer film was deposited on uranium surface by arc ion plating technique to improve fretting wear behavior. The morphology, structure and element distribution of the film were measured by scanning electric microscopy（SEM）, X-ray diffractometry（XRD） and Auger electron spectroscopy（AES）. Fretting wear tests of uranium and Ti/TiN multilayer film were carried out using pin-on-disc configuration. The fretting tests of uranium and Ti/TiN multilayer film were carried out under normal load of 20 N and various displacement amplitudes ranging from 5 to 100 μm. With the increase of the displacement amplitude, the fretting changed from partial slip regime（PSR） to slip regime（SR）. The coefficient of friction（COF） increased with the increase of displacement amplitude. The results indicated that the displacement amplitude had a strong effect on fretting wear behavior of the film. The damage of the film was very slight when the displacement amplitude was below 20 μm. The observations indicated that the delamination was the main wear mechanism of Ti/TiN multilayer film in PSR. The main wear mechanism of Ti/TiN multilayer film in SR was delamination and abrasive wear.展开更多
Ti33O55 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength （632nm） thickness is deposited on a silicon substrate and annealed at 400℃....Ti33O55 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength （632nm） thickness is deposited on a silicon substrate and annealed at 400℃. The ellipsometry result shows a high refractive index above 2.5 with the minimum absorption coefficient in the visible region, which is necessary for high efficiency of transparent metasurfaces. Atomic force microscopy analysis is employed to measure the roughness of the as-deposited films. It is seen from micrographs that the deposited films are very smooth with the minimum roughness to prevent scattering and absorption losses for metasurface devices. The absence of grains and cracks can be seen by scanning electron microscope analysis, which is favorable for electron beam lithography. Fourier transform infrared spectroscopy reveals the transmission and reflection obtained from the film deposited on glass substrates. The as-deposited film shows high transmission above 60%, which is in good agreement with metasurfaces.展开更多
In this work, TiO2/Ti composite films were fabricated by 2-setp MCT and the following high temperature oxidation. Antibacterial activity of the composite films treated by ultrasonic cleaning to increase the performanc...In this work, TiO2/Ti composite films were fabricated by 2-setp MCT and the following high temperature oxidation. Antibacterial activity of the composite films treated by ultrasonic cleaning to increase the performance reliability was examined. The prepared TiO2/Ti composite films showed high photocatalytic activity in the degradation of methylene blue solution. It is obvious that? TiO2/Ti composite films have antibacterial activity under UV irradiation.展开更多
Two types of Sb-doped SnO2 films on titanium substrate were prepared by the combination of electro-deposition and dip-coating (Ti/SnO2-Sb2O4/SnO2-Sb2O4) and single dip-coating (Ti/SnO2-Sb2O4), respectively. The surfac...Two types of Sb-doped SnO2 films on titanium substrate were prepared by the combination of electro-deposition and dip-coating (Ti/SnO2-Sb2O4/SnO2-Sb2O4) and single dip-coating (Ti/SnO2-Sb2O4), respectively. The surface morphology and crystalline structure of both film electrodes were characterized using X-ray diffractometry(XRD) and scanning electron microscopy(SEM). XRD spectra indicate that the rutile SnO2 forms in two films and a TiO2 crystallite exists only in Ti/SnO2-Sb2O4 electrode. SEM images show that the surface morphology of two films is typically cracked-mud structure. The photooxidation experiment was proceeded to further confirm the two electrode activity. The results show that the photoelectrocatalytic degradation efficiency of Ti/SnO2-Sb2O4 electrode with sub-layer is higher than that of simple Ti/SnO2-Sb2O4 electrode using phenol as a model organic pollutant. The Ti/SnO2-Sb2O4/SnO2-Sb2O4 photoanode has a better photoelectrochemical performance than Ti/SnO2-Sb2O4 photoanode for the removal of organic pollutants from water.展开更多
基金supported by the National Natural Science Foundation of China (Nos. 52071278, 51827801)the National Key Research and Development Program of China (No. 2018YFA0703603)。
基金Project (2010JQ6008) supported by the Natural Science Foundation of Shaanxi Province,China
文摘Series of TiO 2-ZnO heterojunction composite films with different n（Zn）/n（Ti） ratios were prepared by UDP450 magnetron sputter ion plating equipment, and the mole ratio of Zn to Ti was controlled by adjusting the current values of sputtering target. The effects of n（Zn）/n（Ti） on the microstructures of TiO2-ZnO films were investigated by SEM, AFM, Raman and XPS, and their photocatalytic decomposition of methyl orange solutions was evaluated. The results show that an increase in n（Zn）/n（Ti） typically results in a decrease in the grain size of composite films firstly and then an increase of grain size, while an increase in n（Zn）/n（Ti） leads to an increase in film roughness firstly and then a decrease in film roughness. Both grain size and roughness of TiO2-ZnO films reach the maximum and minimum at n（Zn）/n（Ti） of 1/9.3, respectively. The n（Zn）/n（Ti） shows little effect on the valences of Zn and Ti elements, which mainly exist in the form of TiO2 and ZnO phases. The n（Zn）/n（Ti） has influence on the amount of anatase/rutile TiO2 heterojunction in the film. With increase of the n（Zn）/n（Ti）, the absorption intensity of the composite film increases and the absorption region extends to 450 nm, which is redshifted as much as 150 nm in comparison with the pure TiO2 films. However, the photocatalytic abilities of heterogeneous composite films do not depend on the n（Zn）/n（Ti） but rather on the microstructures of the TiO2-ZnO composite films. Degradation rate of the film reaches the maximum and the photocatalytic decomposition of pollutants works best when n（Zn）/n（Ti）=1：9.3.
基金supported by the National Natural Science Foundation of China(Grant No:10274018)the Foundation of Hebei Provincial Education Department(Grant No:002013)the Key Foundation of Hebei Normal University(Grant No:120203).
基金Projects(51102264,51271123)supported by the National Natural Science Foundation of ChinaProjects(5313310202,13ZR1427900)supported by Shanghai Municipal Education Commission,China
文摘In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction（XRD）, scanning electron microscopy（SEM） and high-resolution transmission electron microscopy（HRTEM）. It is interesting to find that the microstructure of pure Ti films was characterized by the composite structure of amorphous-like matrix embodied with nanocrystallines, and the crystallization was improved with the increase of bias voltage. The hardness of Ti films measured by nanoindentation tests shows a linear relationship with grain sizes in the scale of 6-15 nm. However, the pure Ti films exhibit a soft tendency characterized by a smaller slope of Hall-Petch relationship. In addition, the effect of bias voltage on the growth orientation of Ti films was discussed.
基金Our work is supported by the Natural Science Fund of Jiangsu Province(BK20001414).
文摘In this paper, diamond-like carbon (DLC) films were deposited on Ti alloy by electro-deposition. DLC films were brown andcomposed of the compact grains whose diameter was about 400 nm. Examined by XPS, the main composition of the filmswas carbon. In the Raman spectrum, there were a broad peak at 1350 cm^(-1) and a broad peak at 1600 cm^(-1), which indicatedthat the films were DLC films.
文摘A study was conducted to develop low-friction, wear-resistant surfaces on high temperature alloys for the temperature range from 26℃ to 900℃. The approach investigated consists of modifying the naturally occurring oxide film in order to improve its tribological properties. Improvement is needed at low temperatures where the oxide film, previously formed at high temperature, spalls due to stresses induced by sliding. Experiments with Ti, W and Ta additions show a beneficial effect when added to Ni and Ni-base alloys. Low friction can be maintained down to 100℃ from 900℃. For unalloyed Ni friction and surface damage increases at 400℃ to 500℃. Two new alloys were perpared based on the beneficial results of binary alloys and ZrO2 diffusion in Ni.Low friction at temperature above 500℃ and reasonable values (0.32~0.42) at low temperature are obtained.
基金This work was financially supported by the National Natural Science Foundation of China (No.10274018) and the Foundation of Hebei Provincial Education Department (No.2002116).
文摘The two series of as-deposited and annealed Ti/Co/Ti thin films were deposited by magnetron sputtering onto glass substrates at room temperature. The structural and magnetic properties of the films at room temperature were investigated as function of Co layer thickness. X-ray diffraction (XRD) profiles show Co nanograins are formed as the hexagonal-close-packed (hcp) structure. The perpendicular coercivity of the Ti(15 nm)/Co(30 nm)/Ti(15 nm) film annealed at 450 ℃ for 30 min is about 288 kA·m-1.
基金Projects(U1530136,51375407) supported by the National Natural Science Foundation of ChinaProject(2017TD0017) supported by the Young Scientific Innovation Team of Science and Technology of Sichuan Province,China
文摘Ti/TiN multilayer film was deposited on uranium surface by arc ion plating technique to improve fretting wear behavior. The morphology, structure and element distribution of the film were measured by scanning electric microscopy（SEM）, X-ray diffractometry（XRD） and Auger electron spectroscopy（AES）. Fretting wear tests of uranium and Ti/TiN multilayer film were carried out using pin-on-disc configuration. The fretting tests of uranium and Ti/TiN multilayer film were carried out under normal load of 20 N and various displacement amplitudes ranging from 5 to 100 μm. With the increase of the displacement amplitude, the fretting changed from partial slip regime（PSR） to slip regime（SR）. The coefficient of friction（COF） increased with the increase of displacement amplitude. The results indicated that the displacement amplitude had a strong effect on fretting wear behavior of the film. The damage of the film was very slight when the displacement amplitude was below 20 μm. The observations indicated that the delamination was the main wear mechanism of Ti/TiN multilayer film in PSR. The main wear mechanism of Ti/TiN multilayer film in SR was delamination and abrasive wear.
基金Information Technology University of the Punjab, Lahore, Pakistan for financial supportthe financial support by Engineering Research Center Program(NRF-2015R1A5A1037668)+1 种基金global Ph.D. fellowship(NRF-2016H1A2A1906519)the KRF fellowship(NRF-2017H1D3A1A02011379)through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (MSIP) of Korean government
文摘Ti33O55 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength （632nm） thickness is deposited on a silicon substrate and annealed at 400℃. The ellipsometry result shows a high refractive index above 2.5 with the minimum absorption coefficient in the visible region, which is necessary for high efficiency of transparent metasurfaces. Atomic force microscopy analysis is employed to measure the roughness of the as-deposited films. It is seen from micrographs that the deposited films are very smooth with the minimum roughness to prevent scattering and absorption losses for metasurface devices. The absence of grains and cracks can be seen by scanning electron microscope analysis, which is favorable for electron beam lithography. Fourier transform infrared spectroscopy reveals the transmission and reflection obtained from the film deposited on glass substrates. The as-deposited film shows high transmission above 60%, which is in good agreement with metasurfaces.
文摘In this work, TiO2/Ti composite films were fabricated by 2-setp MCT and the following high temperature oxidation. Antibacterial activity of the composite films treated by ultrasonic cleaning to increase the performance reliability was examined. The prepared TiO2/Ti composite films showed high photocatalytic activity in the degradation of methylene blue solution. It is obvious that? TiO2/Ti composite films have antibacterial activity under UV irradiation.
基金Projects(20476070,20876104) supported by the National Natural Science Foundation of China
文摘Two types of Sb-doped SnO2 films on titanium substrate were prepared by the combination of electro-deposition and dip-coating (Ti/SnO2-Sb2O4/SnO2-Sb2O4) and single dip-coating (Ti/SnO2-Sb2O4), respectively. The surface morphology and crystalline structure of both film electrodes were characterized using X-ray diffractometry(XRD) and scanning electron microscopy(SEM). XRD spectra indicate that the rutile SnO2 forms in two films and a TiO2 crystallite exists only in Ti/SnO2-Sb2O4 electrode. SEM images show that the surface morphology of two films is typically cracked-mud structure. The photooxidation experiment was proceeded to further confirm the two electrode activity. The results show that the photoelectrocatalytic degradation efficiency of Ti/SnO2-Sb2O4 electrode with sub-layer is higher than that of simple Ti/SnO2-Sb2O4 electrode using phenol as a model organic pollutant. The Ti/SnO2-Sb2O4/SnO2-Sb2O4 photoanode has a better photoelectrochemical performance than Ti/SnO2-Sb2O4 photoanode for the removal of organic pollutants from water.
