We obtain molybdenum disulfide （MoS2） nanosheets （NSs） with edge sizes of 18μm by direct sulfuration of MoO3 powder spread on the SiO2/Si substrates. However, the undesirable MoO3 nanoparticles （NPs） left on th...We obtain molybdenum disulfide （MoS2） nanosheets （NSs） with edge sizes of 18μm by direct sulfuration of MoO3 powder spread on the SiO2/Si substrates. However, the undesirable MoO3 nanoparticles （NPs） left on the surface of MoS22 NSs poison the MoO3 precursor. Introducing Te vapors to react with MoS2 to form low melting point intermediate MoSxTe2-x, the evaporations of MoO3 precursor recover and MoO3 NPs disappear. Thus Te vapor is effective to suppress poisoning of the MoO3 precursor. Selecting the appropriate amount of Te vapor, we fabricate monolayer MoS22 NSs up to 70μm in edge length. This finding can be significant to understand the role of Te in the Te-assisted chemical vapor deposition growth process of layered chalcogenide materials.展开更多
Graphene-like, ternary system B-C-N atomic layer materials promise highly tunable electronic properties and a plethora of potential applications. However, thus far, experimental synthesis of the B-C-N atomic layers no...Graphene-like, ternary system B-C-N atomic layer materials promise highly tunable electronic properties and a plethora of potential applications. However, thus far, experimental synthesis of the B-C-N atomic layers normally yields a microscopic phase-segregated structure consisting of pure C and BN domains. Further, growing the truly ternary B-C-N phase layers with homogenous atomic arrangements has proven to be very challenging. Here, in designing a better- controlled process for the chemical vapor deposition （CVD） growth of B-C-N atomic layer films with the minimized C and BN phase segregation, we selected trimethyl borane （TMB）, a gaseous organoboron compound with pre-existing B--C bonds, as the molecular precursor to react with ammonia （NH3） gas that serves as the nitrification agent. The use of this unique B-C delivery precursor allows for the successful synthesis of high-quality and large-area B-C-N atomic layer films. Moreover, the TMB/NH3 reactant combination can offer a high level of tunability and control of the overall chemical composition of B-C-N atomic layers by regulating the relative partial pressure of two gaseous reactants. Electrical transport measurements show that a finite energy gap can be opened in the as-grown B-C-N atomic layers and its tunability is essentially dependent on the relative C to BN atomic compositions. On the basis of carefully controlled experiments, we show that the pre-existing B-C bonds in the TMB molecular precursor have played a crucial role in effectively reducing the C and BN phase segregation problem, thereby facilitating the formation of truly ternary B-C-N phase atomic layers.展开更多
基金Supported by the Fundamental Research Funds for the Central Universitiesthe Research Funds of Renmin University of China under Grant No 14XNLQ07
文摘We obtain molybdenum disulfide （MoS2） nanosheets （NSs） with edge sizes of 18μm by direct sulfuration of MoO3 powder spread on the SiO2/Si substrates. However, the undesirable MoO3 nanoparticles （NPs） left on the surface of MoS22 NSs poison the MoO3 precursor. Introducing Te vapors to react with MoS2 to form low melting point intermediate MoSxTe2-x, the evaporations of MoO3 precursor recover and MoO3 NPs disappear. Thus Te vapor is effective to suppress poisoning of the MoO3 precursor. Selecting the appropriate amount of Te vapor, we fabricate monolayer MoS22 NSs up to 70μm in edge length. This finding can be significant to understand the role of Te in the Te-assisted chemical vapor deposition growth process of layered chalcogenide materials.
基金Acknowledgements We acknowledge financial support from the National Natural Science Foundation of China （Nos. 21322304 and 51472267） and the National Basic Research Program of China （Nos. 2012CB933003 and 2013CB932603） and the Strategic Priority Research Program B of the Chinese Academy of Sciences （No. XDB07030100） of China.
文摘Graphene-like, ternary system B-C-N atomic layer materials promise highly tunable electronic properties and a plethora of potential applications. However, thus far, experimental synthesis of the B-C-N atomic layers normally yields a microscopic phase-segregated structure consisting of pure C and BN domains. Further, growing the truly ternary B-C-N phase layers with homogenous atomic arrangements has proven to be very challenging. Here, in designing a better- controlled process for the chemical vapor deposition （CVD） growth of B-C-N atomic layer films with the minimized C and BN phase segregation, we selected trimethyl borane （TMB）, a gaseous organoboron compound with pre-existing B--C bonds, as the molecular precursor to react with ammonia （NH3） gas that serves as the nitrification agent. The use of this unique B-C delivery precursor allows for the successful synthesis of high-quality and large-area B-C-N atomic layer films. Moreover, the TMB/NH3 reactant combination can offer a high level of tunability and control of the overall chemical composition of B-C-N atomic layers by regulating the relative partial pressure of two gaseous reactants. Electrical transport measurements show that a finite energy gap can be opened in the as-grown B-C-N atomic layers and its tunability is essentially dependent on the relative C to BN atomic compositions. On the basis of carefully controlled experiments, we show that the pre-existing B-C bonds in the TMB molecular precursor have played a crucial role in effectively reducing the C and BN phase segregation problem, thereby facilitating the formation of truly ternary B-C-N phase atomic layers.
