A new pulsed chemical vapor deposition（PCVD） process has been developed to fabricate iron（Fe） and iron carbide(Fe1-xCx) thin films at low temperature range from 150 ℃ to 230 ℃.The process employs bis（1,4-di-ter...A new pulsed chemical vapor deposition（PCVD） process has been developed to fabricate iron（Fe） and iron carbide(Fe1-xCx) thin films at low temperature range from 150 ℃ to 230 ℃.The process employs bis（1,4-di-tert-butyl-1,3-diazabutadienyl）iron（Ⅱ） as iron source and hydrogen gas or hydrogen plasma as the coreactant.The films deposited with hydrogen gas are demonstrated polycrystalline with body-centered cubic Fe.However,for the films deposited with hydrogen plasma,the amorphous phase of iron carbide is obtained.The influence of the deposition temperature on iron and iron carbide characteristics have been investigated.展开更多
We report the growth of Al N epilayers on c-plane sapphire substrates by pulsed metal organic chemical vapor deposition（MOCVD）. The sources of trimethylaluminium（TMAl） and ammonia were pulse introduced into the re...We report the growth of Al N epilayers on c-plane sapphire substrates by pulsed metal organic chemical vapor deposition（MOCVD）. The sources of trimethylaluminium（TMAl） and ammonia were pulse introduced into the reactor to avoid the occurrence of the parasitic reaction. Through adjusting the duty cycle ratio of TMAl to ammonia from 0.8 to 3.0, the growth rate of Al N epilayers could be controlled in the range of 0.24 m/h to 0.93 m/h. The high-resolution x-ray diffraction（HRXRD） measurement showed that the full width at half maximum（FWHM） of the（0002） and（10-12） reflections for a sample would be 194 arcsec and 421 arcsec, respectively. The step-flow growth mode was observed in the sample with the atomic level flat surface steps, in which a root-mean-square（RMS） roughness was lower to 0.2 nm as tested by atomic force microscope（AFM）. The growth process of Al N epilayers was discussed in terms of crystalline quality, surface morphology,and residual stress.展开更多
Pulsed metal organic chemical vapor deposition is introduced into the growth of InGaN channel heterostructure for improving material qualities and transport properties. High-resolution transmission electron microscopy...Pulsed metal organic chemical vapor deposition is introduced into the growth of InGaN channel heterostructure for improving material qualities and transport properties. High-resolution transmission electron microscopy imaging shows the phase separation free InGaN channel with smooth and abrupt interface. A very high two-dimensional electron gas density of approximately 1.85 x 10^13 cm-2 is obtained due to the superior carrier confinement. In addition, the Hall mobility reaches 967 cruZ/V-s, owing to the suppression of interface roughness scattering. Furthermore, temperature-dependent Hall measurement results show that InGaN channel heterostructure possesses a steady two-dimensional electron gas density over the tested temperature range, and has superior transport properties at elevated temperatures compared with the traditional GaN channel heterostructure. The gratifying results imply that InGaN channel heterostructure grown by pulsed metal organic chemical vapor deposition is a promising candidate for microwave power devices.展开更多
Nearly lattice-matched InAIGaN/GaN heterostructure is grown on sapphire substrates by pulsed metal organic chemical vapor deposition and excellent high electron mobility transistors are fabricated on this heterostruct...Nearly lattice-matched InAIGaN/GaN heterostructure is grown on sapphire substrates by pulsed metal organic chemical vapor deposition and excellent high electron mobility transistors are fabricated on this heterostructure. The electron mobility is 1668.08cm2/V.s together with a high two-dimensional-electron-gas density of 1.43 × 10^13 cm-2 for the InAlCaN/CaN heterostructure of 2Onto InAlCaN quaternary barrier. High electron mobility transistors with gate dimensions of 1 × 50 μm2 and 4μm source-drain distance exhibit the maximum drain current of 763.91 mA/mm, the maximum extrinsic transconductance of 163.13 mS/mm, and current gain and maximum oscillation cutoff frequencies of 11 GHz and 21 GHz, respectively.展开更多
Polycrystalline ZnS films were prepared by pulsed laser deposition （PLD） on quartz glass substrates under different growth conditions at different substrate temperatures of 20, 200, 400, and 600 ℃, which is a suita...Polycrystalline ZnS films were prepared by pulsed laser deposition （PLD） on quartz glass substrates under different growth conditions at different substrate temperatures of 20, 200, 400, and 600 ℃, which is a suitable alternative to chemical bath deposited （CBD） CdS as a buffer layer in Cu（In,Ga）Se2 （CIGS） solar cells. X-ray diffraction studies indicate the films are polycrystalline with zinc-blende structure and they exhibit preferential orientation along the cubic phase β-ZnS （111） direction, which conflicts with the conclusion of wurtzite structure by Murali that the ZnS films deposited by pulse plating technique was polycrystalline with wurtzite structure. The Raman spectra of grown films show Al mode at approximately 350 cm^-1, generally observed in the cubic phase β-ZnS compounds. The planar and the cross-sectional morphology were observed by scanning electron microscopic. The dense, smooth, uniform grains are formed on the quartz glass substrates through PLD technique. The grain size of ZnS deposited by PLD is much smaller than that of CdS by conventional CBD method, which is analyzed as the main reason of detrimental cell performance. The composition of the ZnS films was also measured by X-ray fluorescence. The typical ZnS films obtained in this work are near stoichiometric and only a small amount of S-rich. The energy band gaps at different temperatures were obtained by absorption spectroscopy measurement, which increases from 3.2 eV to 3.7 eV with the increasing of the deposition temperature. ZnS has a wider energy band gap than CdS （2.4 eV）, which can enhance the blue response of the photovoltaic cells. These results show the high-quality of these substitute buffer layer materials are prepared through an all-dry technology, which can be used in the manufacture of CIGS thin film solar cells.展开更多
Ferroelectric materials were widely applied for actuators and sensors. Barium zirconate titanate Ba(Zr0.25Ti0.75)O3 thin film was grown on Pt/Ti/SiO2/Si(100) substrates by pulsed laser deposition. Structure and surfac...Ferroelectric materials were widely applied for actuators and sensors. Barium zirconate titanate Ba(Zr0.25Ti0.75)O3 thin film was grown on Pt/Ti/SiO2/Si(100) substrates by pulsed laser deposition. Structure and surface morphology of the thin film were studied by X-ray diffractometry(XRD) and scan electronic microscopy(SEM). The composition and chemical state near the film surface were obtained by X-ray photoelectron spectroscopy(XPS). On the sample surface,O 1s spectra can be assigned to those from the lattice and surface adsorbed oxygen ions,while C1s only result from surface contamination. The result shows that only one chemical state is found for each spectrum of Ba 3d,Zr 3d and Ti 2p photoelectron in the BZT thin film.展开更多
Chemical vapor deposited （CVD） diamond film has broad application foreground in high-tech fields. But polycrystalline CVD self-standing diamond thick film has rough surface and non-uniform thickness that adversely a...Chemical vapor deposited （CVD） diamond film has broad application foreground in high-tech fields. But polycrystalline CVD self-standing diamond thick film has rough surface and non-uniform thickness that adversely affect its extensive applications. Laser polishing is a useful method to smooth self-standing diamond film. At present, attentions have been focused on experimental research on laser polishing, but the revealing of theoretical model and the forecast of polishing process are vacant. The paper presents a finite element model to simulate and analyze the mechanism of laser polishing diamond based on laser thermal conduction theory. The experimental investigation is also carried out on Nd：YAG pulsed laser smoothing diamond thick film. The simulation results have good accordance with the results of experimental results. The temperature and thermal stress fields are investigated at different incidence angles and parameters of Nd：YAG pulsed laser. The pyramidal-like roughness of diamond thick film leads to the non-homogeneous temperature fields. The temperature at the peak of diamond film is much higher than that in the valley, which leads to the smoothing of diamond thick film. The effect of laser parameters on the surface roughness and thickness of graphite transition layer is also carried out. The results show that high power density laser makes the diamond surface rapid heating, evaporation and sublimation after its graphitization. It is also found that the good polish quality of diamond thick film can be obtained by a combination of large incident angle, moderate laser pulsed energy, large repetition rate and moderate laser pulse width. The results obtained here provide the theoretical basis for laser polishing diamond film with high efficiency and high quality.展开更多
This study shows a silver electrodeposition model (EDM) on a graphite substrate. The electrolyte was a 0.01 M solution of pure silver and chromium nitrate using an electrolyzing cell. EDC with current density up to 20...This study shows a silver electrodeposition model (EDM) on a graphite substrate. The electrolyte was a 0.01 M solution of pure silver and chromium nitrate using an electrolyzing cell. EDC with current density up to 20 mA/cm<sup>2</sup> and 15 mV and pulse current were studied. Results revealed that silver deposited at a rate of 0.515 mg/cm<sup>2</sup>/min with 12 mA/cm<sup>2</sup> that decreases to 0.21 and 0.16 mg/cm<sup>2</sup>·min with the decrease of current density to 6 and 5 mA/cm<sup>2</sup> respectively. The model postulates that silver ions (a) were first hydrated before diffusing (b) from the solution bulk to the cathode vicinity, The next step (c) involved the chemical adsorption of these ions on certain accessible sites of the graphite substrate (anode), The discharged entities (d) adhere to the graphite surface by Van der Vales force. Silver ions are deposited because the discharge potential of silver is low (0.38 mV) as compared to other metal ions like chromium (0.82 mV). Pulse current controls silver deposition due to flexibility in controlling steps (a)-(c) of the deposition mechanisms. Parameters like current density, current on-time, current-off time, duty cycle (ratio of current on time and total pulse time) and pulse frequency influenced the shape and size of the deposits. Step (b) suggested that silver particles were deposited in a monolayer thickness. The silver layer turned multiple after fully satisfying the accessible sites with the monolayer. The activation energy ΔE value amounts to 86.32 kJ/mol/K. At high temperature and current density, homogeneous diffusion occurs.展开更多
基金financially supported by National Natural Science Foundation of China(No.11775028)Collaborative Innovation Center of Green Printing&Publishing Technology(No.15208)Beijing Institute of Graphic Communication Project(Nos.Ea201801 04190119001-020 and 12000400001)
文摘A new pulsed chemical vapor deposition（PCVD） process has been developed to fabricate iron（Fe） and iron carbide(Fe1-xCx) thin films at low temperature range from 150 ℃ to 230 ℃.The process employs bis（1,4-di-tert-butyl-1,3-diazabutadienyl）iron（Ⅱ） as iron source and hydrogen gas or hydrogen plasma as the coreactant.The films deposited with hydrogen gas are demonstrated polycrystalline with body-centered cubic Fe.However,for the films deposited with hydrogen plasma,the amorphous phase of iron carbide is obtained.The influence of the deposition temperature on iron and iron carbide characteristics have been investigated.
基金Project supported by the National High Technology Research and Development Program of China(Grant No.2015AA016801)Guangdong Provincial Scientific and Technologic Planning Program,China(Grant No.2014B010119002)
文摘We report the growth of Al N epilayers on c-plane sapphire substrates by pulsed metal organic chemical vapor deposition（MOCVD）. The sources of trimethylaluminium（TMAl） and ammonia were pulse introduced into the reactor to avoid the occurrence of the parasitic reaction. Through adjusting the duty cycle ratio of TMAl to ammonia from 0.8 to 3.0, the growth rate of Al N epilayers could be controlled in the range of 0.24 m/h to 0.93 m/h. The high-resolution x-ray diffraction（HRXRD） measurement showed that the full width at half maximum（FWHM） of the（0002） and（10-12） reflections for a sample would be 194 arcsec and 421 arcsec, respectively. The step-flow growth mode was observed in the sample with the atomic level flat surface steps, in which a root-mean-square（RMS） roughness was lower to 0.2 nm as tested by atomic force microscope（AFM）. The growth process of Al N epilayers was discussed in terms of crystalline quality, surface morphology,and residual stress.
基金supported by the National Natural Science Foundation of China(Grant Nos.61306017,61334002,61474086,and 11435010)the Young Scientists Fund of the National Natural Science Foundation of China(Grant No.61306017)
文摘Pulsed metal organic chemical vapor deposition is introduced into the growth of InGaN channel heterostructure for improving material qualities and transport properties. High-resolution transmission electron microscopy imaging shows the phase separation free InGaN channel with smooth and abrupt interface. A very high two-dimensional electron gas density of approximately 1.85 x 10^13 cm-2 is obtained due to the superior carrier confinement. In addition, the Hall mobility reaches 967 cruZ/V-s, owing to the suppression of interface roughness scattering. Furthermore, temperature-dependent Hall measurement results show that InGaN channel heterostructure possesses a steady two-dimensional electron gas density over the tested temperature range, and has superior transport properties at elevated temperatures compared with the traditional GaN channel heterostructure. The gratifying results imply that InGaN channel heterostructure grown by pulsed metal organic chemical vapor deposition is a promising candidate for microwave power devices.
基金Supported by the National Science and Technology Major Project of China under Grant No 2013ZX02308-002the National Natural Sciences Foundation of China under Grant Nos 61574108,61334002,61474086 and 61306017
文摘Nearly lattice-matched InAIGaN/GaN heterostructure is grown on sapphire substrates by pulsed metal organic chemical vapor deposition and excellent high electron mobility transistors are fabricated on this heterostructure. The electron mobility is 1668.08cm2/V.s together with a high two-dimensional-electron-gas density of 1.43 × 10^13 cm-2 for the InAlCaN/CaN heterostructure of 2Onto InAlCaN quaternary barrier. High electron mobility transistors with gate dimensions of 1 × 50 μm2 and 4μm source-drain distance exhibit the maximum drain current of 763.91 mA/mm, the maximum extrinsic transconductance of 163.13 mS/mm, and current gain and maximum oscillation cutoff frequencies of 11 GHz and 21 GHz, respectively.
基金ACKNOWLEDGMENTS This work was supported by the National Basic Research Program of China （No.2006CB92200） and the National Natural Science Foundation of China （No.10774136）.
文摘Polycrystalline ZnS films were prepared by pulsed laser deposition （PLD） on quartz glass substrates under different growth conditions at different substrate temperatures of 20, 200, 400, and 600 ℃, which is a suitable alternative to chemical bath deposited （CBD） CdS as a buffer layer in Cu（In,Ga）Se2 （CIGS） solar cells. X-ray diffraction studies indicate the films are polycrystalline with zinc-blende structure and they exhibit preferential orientation along the cubic phase β-ZnS （111） direction, which conflicts with the conclusion of wurtzite structure by Murali that the ZnS films deposited by pulse plating technique was polycrystalline with wurtzite structure. The Raman spectra of grown films show Al mode at approximately 350 cm^-1, generally observed in the cubic phase β-ZnS compounds. The planar and the cross-sectional morphology were observed by scanning electron microscopic. The dense, smooth, uniform grains are formed on the quartz glass substrates through PLD technique. The grain size of ZnS deposited by PLD is much smaller than that of CdS by conventional CBD method, which is analyzed as the main reason of detrimental cell performance. The composition of the ZnS films was also measured by X-ray fluorescence. The typical ZnS films obtained in this work are near stoichiometric and only a small amount of S-rich. The energy band gaps at different temperatures were obtained by absorption spectroscopy measurement, which increases from 3.2 eV to 3.7 eV with the increasing of the deposition temperature. ZnS has a wider energy band gap than CdS （2.4 eV）, which can enhance the blue response of the photovoltaic cells. These results show the high-quality of these substitute buffer layer materials are prepared through an all-dry technology, which can be used in the manufacture of CIGS thin film solar cells.
基金Project(05001825) supported by Guangdong Provincial Natural Science Foundation of Chinaproject(KF0707) supported by the Opening Project Program of Key Laboratory of Low Dimensional Materials and Application Technology (Xiangtan University), Ministry ofEducation, China
文摘Ferroelectric materials were widely applied for actuators and sensors. Barium zirconate titanate Ba(Zr0.25Ti0.75)O3 thin film was grown on Pt/Ti/SiO2/Si(100) substrates by pulsed laser deposition. Structure and surface morphology of the thin film were studied by X-ray diffractometry(XRD) and scan electronic microscopy(SEM). The composition and chemical state near the film surface were obtained by X-ray photoelectron spectroscopy(XPS). On the sample surface,O 1s spectra can be assigned to those from the lattice and surface adsorbed oxygen ions,while C1s only result from surface contamination. The result shows that only one chemical state is found for each spectrum of Ba 3d,Zr 3d and Ti 2p photoelectron in the BZT thin film.
基金supported by National Natural Science Foundation of China (Grant No. 51005117)Graduate Innovation Fund of Nanjing University of Aeronautics and Astronautics,China (Grant No.KFJJ20110223)Priority Academic Program Development of Jiangsu Higher Education Institutions of China (PAPD)
文摘Chemical vapor deposited （CVD） diamond film has broad application foreground in high-tech fields. But polycrystalline CVD self-standing diamond thick film has rough surface and non-uniform thickness that adversely affect its extensive applications. Laser polishing is a useful method to smooth self-standing diamond film. At present, attentions have been focused on experimental research on laser polishing, but the revealing of theoretical model and the forecast of polishing process are vacant. The paper presents a finite element model to simulate and analyze the mechanism of laser polishing diamond based on laser thermal conduction theory. The experimental investigation is also carried out on Nd：YAG pulsed laser smoothing diamond thick film. The simulation results have good accordance with the results of experimental results. The temperature and thermal stress fields are investigated at different incidence angles and parameters of Nd：YAG pulsed laser. The pyramidal-like roughness of diamond thick film leads to the non-homogeneous temperature fields. The temperature at the peak of diamond film is much higher than that in the valley, which leads to the smoothing of diamond thick film. The effect of laser parameters on the surface roughness and thickness of graphite transition layer is also carried out. The results show that high power density laser makes the diamond surface rapid heating, evaporation and sublimation after its graphitization. It is also found that the good polish quality of diamond thick film can be obtained by a combination of large incident angle, moderate laser pulsed energy, large repetition rate and moderate laser pulse width. The results obtained here provide the theoretical basis for laser polishing diamond film with high efficiency and high quality.
文摘This study shows a silver electrodeposition model (EDM) on a graphite substrate. The electrolyte was a 0.01 M solution of pure silver and chromium nitrate using an electrolyzing cell. EDC with current density up to 20 mA/cm<sup>2</sup> and 15 mV and pulse current were studied. Results revealed that silver deposited at a rate of 0.515 mg/cm<sup>2</sup>/min with 12 mA/cm<sup>2</sup> that decreases to 0.21 and 0.16 mg/cm<sup>2</sup>·min with the decrease of current density to 6 and 5 mA/cm<sup>2</sup> respectively. The model postulates that silver ions (a) were first hydrated before diffusing (b) from the solution bulk to the cathode vicinity, The next step (c) involved the chemical adsorption of these ions on certain accessible sites of the graphite substrate (anode), The discharged entities (d) adhere to the graphite surface by Van der Vales force. Silver ions are deposited because the discharge potential of silver is low (0.38 mV) as compared to other metal ions like chromium (0.82 mV). Pulse current controls silver deposition due to flexibility in controlling steps (a)-(c) of the deposition mechanisms. Parameters like current density, current on-time, current-off time, duty cycle (ratio of current on time and total pulse time) and pulse frequency influenced the shape and size of the deposits. Step (b) suggested that silver particles were deposited in a monolayer thickness. The silver layer turned multiple after fully satisfying the accessible sites with the monolayer. The activation energy ΔE value amounts to 86.32 kJ/mol/K. At high temperature and current density, homogeneous diffusion occurs.
