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Rapid thermal annealing effects on vacuum evaporated ITO for InGaN/GaN blue LEDs
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作者 丁艳 郭伟玲 +2 位作者 朱彦旭 刘建朋 闫薇薇 《Journal of Semiconductors》 EI CAS CSCD 2012年第6期129-132,共4页
8 mil×10 mil InGaN/GaN blue LEDs with indium tin oxide(ITO) emitting at 460 nm were fabricated. A vacuum evaporation technique was adopted to deposit ITO on P-GaN with thickness of 240 nm.The electrical and opt... 8 mil×10 mil InGaN/GaN blue LEDs with indium tin oxide(ITO) emitting at 460 nm were fabricated. A vacuum evaporation technique was adopted to deposit ITO on P-GaN with thickness of 240 nm.The electrical and optical properties of ITO films on P-GaN wafers,as well as rapid thermal annealing(RTA) effects at different temperatures(100 to 550℃) were analyzed and compared.It was found that resistivity of 450℃RTA was as low as 1.19×10^(-4)Ω·cm,along with a high transparency of 94.17%at 460 nm.AES analysis indicated the variation of oxygen content after 450℃annealing,and ITO contact resistance showed a minimized value of 3.9×10^(-3)Ω·cm^2.With 20 mA current injection,it was found that forward voltage and output power were 3.14 V and 12.57 mW.Furthermore,maximum luminous flux of 0.49 lm of ITO RTA at 550℃was measured,which is the consequence of a higher transparency. 展开更多
关键词 rapid thermal annealing light emitting diodes ito ingan/gan
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ITO对新型AlGaInP红光LED特性的影响 被引量:6
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作者 张勇辉 郭伟玲 +3 位作者 秦园 李瑞 丁天平 沈光地 《光学学报》 EI CAS CSCD 北大核心 2010年第8期2401-2405,共5页
用真空电子束蒸镀的方法制备氧化铟锡(indiumtin oxide,ITO)薄膜,制作了以300nmITO为窗口层的新型AlGaInP红光LED。在氮气环境下,对LED样品进行了40s快速热退火处理。随着退火温度增加,LED的光强先上升后下降,电压先下降后上升,并且两... 用真空电子束蒸镀的方法制备氧化铟锡(indiumtin oxide,ITO)薄膜,制作了以300nmITO为窗口层的新型AlGaInP红光LED。在氮气环境下,对LED样品进行了40s快速热退火处理。随着退火温度增加,LED的光强先上升后下降,电压先下降后上升,并且两者都在435℃达到最优值。通过霍尔测试研究退火对ITO薄膜电学特性的影响,发现这是由于ITO在经过435℃退火后,电阻率最小,载流子浓度最大,因而减小了ITO的体电阻和p型欧姆接触电阻,降低了LED工作电压,同时增加了ITO做为电流扩展层的电流扩展效果,提高了LED光强。 展开更多
关键词 光学器件 发光二极管 快速热退火 霍尔测试 氧化铟锡
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