Enhanced near-infrared （NIR） electroluminescence （EL） of a metal-oxide-semiconductor light emitting device （MOSLED） made on CO2 laser-annealed SiOx film is demonstrated. An EL power of near 50 nW from CO2 laser ...Enhanced near-infrared （NIR） electroluminescence （EL） of a metal-oxide-semiconductor light emitting device （MOSLED） made on CO2 laser-annealed SiOx film is demonstrated. An EL power of near 50 nW from CO2 laser rapid-thermal-annealing （RTA） MOSLED under a biased voltage of 85 V and a current density of 2.3 mA/cm^2 is preliminarily reported.展开更多
FePt films with a high degree of order S of the L10 structure （S 〉 0.90） and well defined [001] crystalline growth perpendicular to the film plane are fabricated on thermally oxidized Si substrates by the addition ...FePt films with a high degree of order S of the L10 structure （S 〉 0.90） and well defined [001] crystalline growth perpendicular to the film plane are fabricated on thermally oxidized Si substrates by the addition of ZnO and a successive rapid thermal annealing （RTA） process. The optimum condition to prepare high-ordering L10 FePtZnO films is 20 vol% ZnO addition and 450 ℃ annealing. The effect of the ZnO additive on the ordering process of the L10 FePtZnO films is discussed. In the annealing process, Zn atoms move to the film surface and evaporate. The motion of the Zn atoms accelerates the intergrain exchange and decreases the ordering temperature.展开更多
文摘Enhanced near-infrared （NIR） electroluminescence （EL） of a metal-oxide-semiconductor light emitting device （MOSLED） made on CO2 laser-annealed SiOx film is demonstrated. An EL power of near 50 nW from CO2 laser rapid-thermal-annealing （RTA） MOSLED under a biased voltage of 85 V and a current density of 2.3 mA/cm^2 is preliminarily reported.
文摘FePt films with a high degree of order S of the L10 structure （S 〉 0.90） and well defined [001] crystalline growth perpendicular to the film plane are fabricated on thermally oxidized Si substrates by the addition of ZnO and a successive rapid thermal annealing （RTA） process. The optimum condition to prepare high-ordering L10 FePtZnO films is 20 vol% ZnO addition and 450 ℃ annealing. The effect of the ZnO additive on the ordering process of the L10 FePtZnO films is discussed. In the annealing process, Zn atoms move to the film surface and evaporate. The motion of the Zn atoms accelerates the intergrain exchange and decreases the ordering temperature.
