期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
A CFD model for gas uniform distribution in turbulent flow for the production of titanium pigment in chloride process 被引量:4
1
作者 Yadong Li Gang Xie +3 位作者 Ting Lei Chongjun Bao Lin Tian Yanqing Hou 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2016年第6期749-756,共8页
The fluid dynamic behavior of feeding gas (TiCI4) in an annular channel affects the combination of 02 and TiCI4 in an oxidation reactor, a key piece of equipment in titanium pigment production. The numerical procedu... The fluid dynamic behavior of feeding gas (TiCI4) in an annular channel affects the combination of 02 and TiCI4 in an oxidation reactor, a key piece of equipment in titanium pigment production. The numerical procedure was validated by a 3-dimensional gas flow in the annular channel. Applying the validated model, the flow character- istics of TiCl4 in the oxidation reactor with a tangential inlet were simulated and characterized. The flow distribu- tion with five rectifying rings of different structure was simulated and analyzed. The results showed that the rectifying ring improved the distribution uniformity of the pressure and outlet velocity. Compared to the original case without a rectifying ring, the non-uniformity of the pressure and outlet velocity could be reduced by up to 91% and 69% respectively. The rectifying ring #5, which can be installed and adjusted easily, is more effective in realizing even distribution. In addition, installation of the rectifying ring effectively reduced the circulating flow in an annular channel as well as the total energy loss. 展开更多
关键词 Oxidation reactorchloride processRectifying ringComputational fluid dynamicsDimensionless pressure
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部