Accurate and precise wavelength controlling of narrowband excimer lasers is essential for the lithography of an integrated circuit. High-precision wavelength tuning and calibration of a line-narrowed Ar F laser are pr...Accurate and precise wavelength controlling of narrowband excimer lasers is essential for the lithography of an integrated circuit. High-precision wavelength tuning and calibration of a line-narrowed Ar F laser are presented in this work. The laser spectrum is narrowed to a sub-picometer with a line narrowing system. Absolute wavelength calibration of the line-narrowed laser is performed based on the optogalvanic（OG） effect using iron hollow cathode discharge（HCD）. An sccuracy of better than 0.1 pm for wavelength tuning and calibration is achieved with our homemade wavemeter.展开更多
A method for isochromatic determination in three-fringe photoelasticity is presented. It combines the phaseshifting method with cubic polynomial curve-fitting technology to eliminate the errors caused by color repetit...A method for isochromatic determination in three-fringe photoelasticity is presented. It combines the phaseshifting method with cubic polynomial curve-fitting technology to eliminate the errors caused by color repetition.We perform a demonstration of the method on a circular disc subjected to compressive loading and an injectionmolded cover with residual stresses. The test results compare well with the theoretical results.展开更多
基金supported by the National Science and Technology Major Project(No.2013ZX02202003)the National Key Research and Development Program(No.2016YFB0402201)+4 种基金K.C.Wong Education Foundation,the Program of Shanghai Technology Research Leader(No.17XD1424800)the Shanghai Sailing Program of Talented Youth in Science and Technology(No.17YF1421200)the Key Technologies R&D Program of Jiangsu(Nos.BE2014001 and BE2016005-4)the Natural Science Foundation of Shanghai(Nos.16ZR1440100and 16ZR1440200)the NSAF Foundation of National Natural Science Foundation of China(Nos.U1330134 and 61405202)
文摘Accurate and precise wavelength controlling of narrowband excimer lasers is essential for the lithography of an integrated circuit. High-precision wavelength tuning and calibration of a line-narrowed Ar F laser are presented in this work. The laser spectrum is narrowed to a sub-picometer with a line narrowing system. Absolute wavelength calibration of the line-narrowed laser is performed based on the optogalvanic（OG） effect using iron hollow cathode discharge（HCD）. An sccuracy of better than 0.1 pm for wavelength tuning and calibration is achieved with our homemade wavemeter.
基金supported by the Innovation Fund Project for Graduate Students of Shanghai under Grant No. JWCXSL1301
文摘A method for isochromatic determination in three-fringe photoelasticity is presented. It combines the phaseshifting method with cubic polynomial curve-fitting technology to eliminate the errors caused by color repetition.We perform a demonstration of the method on a circular disc subjected to compressive loading and an injectionmolded cover with residual stresses. The test results compare well with the theoretical results.
