We investigate the effect of the formation process under pulse and dc modes on the performance of one transistor and one resistor （1 T1R） resistance random access memory （RRAM） device. All the devices are operated...We investigate the effect of the formation process under pulse and dc modes on the performance of one transistor and one resistor （1 T1R） resistance random access memory （RRAM） device. All the devices are operated under the same test conditions, except for the initial formation process with different modes. Based on the statistical results, the high resistance state （FIRS） under the dc forming mode shows a lower value with better distribution compared with that under the pulse mode. One of the possible reasons for such a phenomenon originates from different properties of conductive filament （CF） formed in the resistive switching layer under two different modes. For the dc forming mode, the formed filament is thought to be continuous, which is hard to be ruptured, resulting in a lower HRS. However, in the case of pulse forming, the filament is discontinuous where the transport mechanism is governed by hopping. The low resistance state （LRS） can be easily changed by removing a few trapping states from the conducting path. Hence, a higher FIRS is thus observed. However, the HRS resistance is highly dependent on the length of the gap opened. A slight variation of the gap length will cause wide dispersion of resistance.展开更多
Nonvolatile memories have emerged in recent years and have become a leading candidate towards replacing dynamic and static random-access memory devices.In this article,the performances of T1O_2 and TaO_2nonvolatile me...Nonvolatile memories have emerged in recent years and have become a leading candidate towards replacing dynamic and static random-access memory devices.In this article,the performances of T1O_2 and TaO_2nonvolatile memristive devices were compared and the factors that make TaO_2 memristive devices better than T1O_2 memristive devices were studied.TaO_2 memristive devices have shown better endurance performances（10~8times more switching cycles） and faster switching speed（5 times） than TiO_2 memristive devices.Electroforming of TaO_2 memristive devices requires ~ 4.5 times less energy than TiO_2 memristive devices of a similar size.The retention period of TaO_2 memristive devices is expected to exceed 10 years with sufficient experimental evidence.In addition to comparing device performances,this article also explains the differences in physical device structure,switching mechanism,and resistance switching performances of TiO_2 and TaO_2 memristive devices.This article summarizes the reasons that give TaO_2 memristive devices the advantage over TiO_2 memristive devices,in terms of electroformation,switching speed,and endurance.展开更多
基金Supported by the National Basic Research Program of China under Grant Nos 2011CBA00602,2010CB934200,2011CB921804,2011CB707600,2011AA010401,and 2011AA010402the National Natural Science Foundation of China under Grant Nos61322408,61334007,61376112,61221004,61274091,61106119,61106082,and 61006011
文摘We investigate the effect of the formation process under pulse and dc modes on the performance of one transistor and one resistor （1 T1R） resistance random access memory （RRAM） device. All the devices are operated under the same test conditions, except for the initial formation process with different modes. Based on the statistical results, the high resistance state （FIRS） under the dc forming mode shows a lower value with better distribution compared with that under the pulse mode. One of the possible reasons for such a phenomenon originates from different properties of conductive filament （CF） formed in the resistive switching layer under two different modes. For the dc forming mode, the formed filament is thought to be continuous, which is hard to be ruptured, resulting in a lower HRS. However, in the case of pulse forming, the filament is discontinuous where the transport mechanism is governed by hopping. The low resistance state （LRS） can be easily changed by removing a few trapping states from the conducting path. Hence, a higher FIRS is thus observed. However, the HRS resistance is highly dependent on the length of the gap opened. A slight variation of the gap length will cause wide dispersion of resistance.
文摘Nonvolatile memories have emerged in recent years and have become a leading candidate towards replacing dynamic and static random-access memory devices.In this article,the performances of T1O_2 and TaO_2nonvolatile memristive devices were compared and the factors that make TaO_2 memristive devices better than T1O_2 memristive devices were studied.TaO_2 memristive devices have shown better endurance performances（10~8times more switching cycles） and faster switching speed（5 times） than TiO_2 memristive devices.Electroforming of TaO_2 memristive devices requires ~ 4.5 times less energy than TiO_2 memristive devices of a similar size.The retention period of TaO_2 memristive devices is expected to exceed 10 years with sufficient experimental evidence.In addition to comparing device performances,this article also explains the differences in physical device structure,switching mechanism,and resistance switching performances of TiO_2 and TaO_2 memristive devices.This article summarizes the reasons that give TaO_2 memristive devices the advantage over TiO_2 memristive devices,in terms of electroformation,switching speed,and endurance.
