Design and Realization of Resonant Tunneling Diodes with New Material Structure

A new material structure with Al 0.22Ga 0.78As/In 0.15Ga 0.85As/GaAs emitter spacer layer and GaAs/In 0.15- Ga 0.85As/GaAs well for resonant tunneling diodes is designed and the corresponding device is fabricated.RTDs DC characteristics are measured at room temperature. Peak-to-valley current ratio and the available current density for RTDs at room temperature are computed.Analysis on these results suggests that adjusting material structure and optimizing fabrication processes will be an effective means to improve the quality of RTDs.

RTD太赫兹探测器与片上天线的匹配技术

高信息传输速率和大带宽容量的太赫兹通信被认为是实现6G的关键技术,这需要高效、稳定和紧凑的太赫兹源和探测器。为提升探测性能,研究了一种共振隧穿二极管(RTD)与缝隙天线片上集成的准光式太赫兹探测器。针对电路的高频损耗和寄生效应问题,采用协同考虑阻抗匹配因子和天线辐射效率的设计准则,设计了0.67 THz的小偏压RTD偏馈式探测器。采用高频结构仿真器(HFSS)和先进设计系统(ADS)软件联合仿真表征其探测性能,当输入功率为-30 dBm时,该探测器在0.67 THz的电流灵敏度达2.349 A/W,相比微波段采用阻抗匹配因子最大的设计准则,灵敏度提升了28.01%。

Development of a simple two-step lithography fabrication process for resonant tunneling diode using air-bridge technology

This article reports on the development of a simple two-step lithography process for double barrier quantum well(DBQW)InGaAs/AlAs resonant tunneling diode(RTD)on a semi-insulating indium phosphide(InP)substrate using an air-bridge technology.This approach minimizes processing steps,and therefore the processing time as well as the required resources.It is particularly suited for material qualification of new epitaxial layer designs.A DC performance comparison between the proposed process and the conventional process shows approximately the same results.We expect that this novel technique will aid in the recent and continuing rapid advances in RTD technology.

Piezoelectric polarization and quantum size effects on the vertical transport in AlGaN/GaN resonant tunneling diodes

In this work,the electronic properties of resonant tunneling diodes（RTDs） based on GaN-AlxGa（1-x）N double barriers are investigated by using the non-equilibrium Green functions formalism（NEG）.These materials each present a wide conduction band discontinuity and a strong internal piezoelectric field,which greatly affect the electronic transport properties.The electronic density,the transmission coefficient,and the current–voltage characteristics are computed with considering the spontaneous and piezoelectric polarizations.The influence of the quantum size on the transmission coefficient is analyzed by varying GaN quantum well thickness,AlxGa1-xN width,and the aluminum concentration xAl.The results show that the transmission coefficient more strongly depends on the thickness of the quantum well than the barrier;it exhibits a series of resonant peaks and valleys as the quantum well width increases.In addition,it is found that the negative differential resistance（NDR） in the current–voltage（I–V） characteristic strongly depends on aluminum concentration xAl.It is shown that the peak-to-valley ratio（PVR） increases with xAlvalue decreasing.These findings open the door for developing vertical transport nitrides-based ISB devices such as THz lasers and detectors.

SWITCHING CHARACTERISTICS AND ANALYSIS OF RESONANT TUNNELING DIODES

Resonant tunneling diode （RTD） of AlAs/InGaAs/AlAs double barrier-single well structure was designed and fabricated. The devices showed current-voltage characteristics with peak-valley current ratio of 4 ： 1 at room temperature. The scattering parameter of RTD was measured by using an HP8510（C） network analyzer. Equivalent circuit parameters were obtained by curve fitting and optimized. The RTD switching time was estimated using the measured capacitance and average negative differential resistance. The minimum rise time of the sample was estimated to be 21 ps.

Comparison of resonant tunneling diodes grown on freestanding GaN substrates and sapphire substrates by plasma-assisted molecular-beam epitaxy

AlN/GaN resonant tunneling diodes(RTDs)were grown separately on freestanding Ga N(FS-GaN)substrates and sapphire substrates by plasma-assisted molecular-beam epitaxy(PA-MBE).Room temperature negative differential resistance(NDR)was obtained under forward bias for the RTDs grown on FS-GaN substrates,with the peak current densities(Jp)of 175-700 kA/cm^(2)and peak-to-valley current ratios(PVCRs)of 1.01-1.21.Two resonant peaks were also observed for some RTDs at room temperature.The effects of two types of substrates on epitaxy quality and device performance of GaN-based RTDs were firstly investigated systematically,showing that lower dislocation densities,flatter surface morphology,and steeper heterogeneous interfaces were the key factors to achieving NDR for RTDs.

A Model for Cu-Se Resonant Tunneling Diodes Fabricated by Negative Template Assisted Electrodeposition Technique

In this paper, the authors present and discuss a model for Cu-Se nano resonant tunneling diodes (RTDs) fabricated by negative template assisted electrodeposition technique and formulate the mathematical equations for it. The model successfully explains the experimental findings.

Theoretical Study of Electronic Transmission in Resonant Tunneling Diodes Based on GaAs/AlGaAs Double Barriers under Bias Voltage

In this paper, we theoretically study the quantum size effects on the electronic transmission and current density of the electrons in GaAs/AlGaAs resonant tunneling diodes by solving the coupled equations Schrodinger-Poisson self-consistently. It is found that the resonant peaks of the trans-mission coefficients shift towards the lower energy regions as the applied bias voltage increases. Our results indicate that the transmission coefficient depends strongly on the variation of the thickness of collector and emitter. We also study the effect of the doping concentration located in the emitter and collector regions on the transmission and current density. We found that the dop-ing concentration can greatly affect the transmission coefficient and the current density;in partic-ular it increases the peak of the current density and displaces the position of the maxima of the current dependence on the applied bias voltage.

Generation and Shaping of Soliton-Like Pulses along Resonant Tunneling Diodes NMOS Varactors Lattice

The characteristics of N-type accumulation-mode MOS (NMOS) varactors line periodically loaded with resonant tunneling diodes (RTDs) are used for soliton-like pulses generation and shaping. The problem of wide pulse breaking up into multiple pulses rather than a single is solved. Applying perturbative analysis, we show that the dynamics of the nonlinear transmission line (NLTL) is reduced to expanded Korteweg-de Vries (KdV) equation. Moreover, numerical integration of nonlinear differential and difference equations that result from the mathematical analysis of the line is discussed. As results, NLTL can simultaneously sharpen both leading and trailing of pulse edges and one could obtain a rising and sharpening step pulse.

Fabrication of an AlAs/In_(0.53)Ga_ ( 0.47)As/InAs Resonant Tunneling Diode on InP Substrate for High-Speed Circuit Applications

A high performance AlAs/In0.53 Ga0.47 As/InAs resonant tunneling diode （RTD） on InP substrate is fabricated by inductively coupled plasma etching. This RTD has a peak-to-valley current ratio （PVCR） of 7. 57 and a peak current density Jp = 39.08kA/cm^2 under forward bias at room temperature. Under reverse bias, the corresponding values are 7.93 and 34.56kA/cm^2 . A resistive cutoff frequency of 18.75GHz is obtained with the effect of a parasitic probe pad and wire. The slightly asymmetrical current-voltage characteristics with a nominally symmetrical structure are also discussed.

Comparison and Analysis of Two Microwave Equivalent-Circuit Models for Resonant Tunneling Diode

The distinction between two microwave equivalent-circuit models,quasi Esaki tunneling model (QETM) and quantum well injection transit model (QWITM),for the resonant tunneling diode (RTD) is discussed in details,and two groups of circuit parameters are extracted from experiment data by the least square fit method.Both theory analysis and the comparison of fit results demonstrate that QWITM is much more precise than QETM.In addition,the rationality of QWITM circuit's parameters confirms it too.On this basis,the resistive frequency is calculated,whose influence factors and improvement method are simply discussed as well.

A novel micro-accelerometer with adjustable sensitivity based on resonant tunnelling diodes

Resonant tunnelling diodes （RTDs） have negative differential resistance effect, and the current-voltage characteristics change as a function of external stress, which is regarded as mesc-piezoresistance effect of RTDs. In this paper, a novel micro-accelerometer based on AlAs/GaAs/In0.1Ga0.9As/GaAs/AlAs RTDs is designed and fabricated to be a four-beam-mass structure, and an RTD-Wheatstone bridge measurement system is established to test the basic properties of this novel accelerometer. According to the experimental results, the sensitivity of the RTD based micro-accelerometer is adjustable within a range of 3 orders when the bias voltage of the sensor changes. The largest sensitivity of this RTD based miero-accelerometer is 560.2025 mV/g which is about 10 times larger than that of silicon based micro piezoresistive accelerometer, while the smallest one is 1.49135 mV/g.

Influence of spacer layer thickness on the current-voltage characteristics of pseudomorphic AlAs/In_(0.53)Ga_(0.47)As/InAs resonant tunnelling diodes

This paper investigates the dependence of current voltage characteristics of AlAs/In0.53Ga0.47As/InAs resonant tunnelling diodes （RTDs） on spacer layer thickness. It finds that the peak and the valley current density J in the negative differential resistance （NDR） region depends strongly on the thickness of the spacer layer. The measured peak to valley current ratio of RTDs studied here is shown to improve while the current density through RTDs decreases with increasing spacer layer thickness below a critical value.

Nanoelectronic devices resonant tunnelling diodes grown on InP substrates by molecular beam epitaxy with peak to valley current ratio of 17 at room temperature

This paper reports that InAs/In0.53Ga0.47As/AlAs resonant tunnelling diodes have been grown on InP substrates by molecular beam epitaxy. Peak to valley current ratio of these devices is 17 at 300K. A peak current density of 3kA/cm^2 has been obtained for diodes with AlAs barriers of ten monolayers, and an Ino.53Ga0.47As well of eight monolayers with four monolayers of InAs insert layer. The effects of growth interruption for smoothing potential barrier interfaces have been investigated by high resolution transmission electron microscope.

Spin injection in a ferromagnet/resonant tunneling diode heterostructure

The spin transport property of a ferromagnet （FM）/insulator （Ⅰ）/resonant tunneling diode （RTD） heterostructure was studied. The transmission coefficient and spin polarization in a multilayered heterostructure was calculated by a Schrdinger wave equation. An Airy function formalism approach was used to solve this equation. Based on the transfer matrix approach,the transmittivity of the structure was determined as a function of the Feimi energy and other parameters. The result shows that the spin polarization induced by the structure oscillates with the increasing Fermi energy of the FM layer. While the thickness of the RTD is reduced,the resonant peaks become broad. In the heterostructure,the spin polarization reaches as high as 40% and can be easily controlled by the external bias voltage.

Dependence of current-voltage characteristics of pseudomorphic AlAs/In_(0.53)Ga_(0.47)As/InAs resonant tunnelling diodes on quantum well widths

This paper studies the dependence of I - V characteristics on quantum well widths in AIAs/In0.53Ga0.47As and AIAs/In0.53Ga0.47As/InAs resonant tunnelling structures grown on InP substrates. It shows that the peak and the valley current density in the negative differential resistance region are closely related with quantum well width. The measured peak current density, valley current densities and peak-to-valley current ratio of resonant tunnelling diodes are continually decreasing with increasing well width.

Monolithic Integration of GaAs-Based Resonant Tunneling Diode and High Electron Mobility Transistor

The resonant tunneling diode (RTD) is a kind of novel ultra-high speed and ultra-high frequency negative differential resistance nanoelectronic device. Integration of RTD and other three-terminal compound semiconductor devices is one important direction of high speed integrated circuit development. In this paper, monolithic integration technology of RTD and high electron mobility transistor (HEMT) based on GaAs substrate was discussed. A top-RTD and bottom-HEMT material structure was proposed and epitaxyed. Based on wet chemical etching, electron beam lithography, metal lift-off and air bridge technology, RTD and HEMT were fabricated on the same wafer. The peak-to-valley current ratio of RTD is 4 and the peak voltage is 0.5 V. The maximal transconductance is 120 mS/mm for a 0.25 μm gate length depletion mode HEMT. Current levels of two devices are basically suited. The results validate the feasibility of the designed integration process.

Quantum Coupling Effect between Quantum Dot and Quantum Well in a Resonant Tunneling Photon-Number-Resolving Detector

Excited states of lnAs quantum dots （QDs） can be energetically coupled with the confined level of OaAs quantum wells （QWs） in a thin-barrier resonant tunneling diode （RTD）. Single charge variation in the coupled QD can effectively switch on/off the resonant tunneling current passing through RTD, not only for emcient single-photon detection but also for photon-number-resolving detection. We present the study of the Q,D-QW coupling effect in the quantum dot coupled resonant tunneling diode （QD-cRTD） and figure out important factors for further improving the detector performance.

由RTD/MOSFET构成的压控振荡器的设计与实现

提出了一种基于负阻器件共振隧穿二极管(RTD)与MOSFET结合的新型压控振荡器(VCO),并利用了高级设计系统(ADS)软件对该振荡器的可行性进行了电路仿真,利用分立RTD、MOSFET器件实现了此种VCO,实际调频范围在20～26 MHz之间。RTD与三端器件的连接方式不同可呈现不同的调制I-V特性,这种调制特性对基于RTD的振荡电路的频率也会产生影响。通过深入研究这种调制对振荡电路频率产生的影响,得到多种不同于常规方法的电压控制频率方式,其中一些具有很好的线性度。因此该电路的研究对于RTD在高频、高速振荡电路中的进一步应用具有重要意义。

共振隧穿二极管(RTD)I-V特性的几个问题

对作者研制的 RTD进行了 I-V特性测量 ,并重点分析了 :(1 ) I-V特性的湿度效应 ;(2 )负阻区“表观正阻”现象 ;(3 )用负阻值估算开关时间。以上问题的分析对