Review of My Research Work on Ferroelectric Films and Si-Based Device Applications: Opportunity and Challenge

Ferroelectric materials have many interesting physical properties such as ferroelectricity, pyroelectricity, piezoelectricity, and opto-electricity, and applying ferroelectric materials in the forms of thin and thick films and integrating them on the silicon substrate as electronic and MEMS devices is a very attractive research area and challenging. In this paper, we report our research works on ferroelectric MEMS and ferroelectric films for electronic device applications. Pyroelectric thin film infrared sensors have been made, characterized, and a 32×32 array with its size of 1cm×1cm has been obtained on Si membrane. Ferroelectric thin films in amorphous phase have been applied to make silicon based hydrogen gas sensors with the metal/amorphous ferroelectric film/metal device structure, and its turn-on voltage of about 4.5V at ～1000 ppm in air is about 7 times of the best value reported in the literature. For the application of electron emission flat panel display, ferroelectric BST thin films with excess Ti concentrations have been coated on Si tips, the threshold voltage of those ferroelectric film coated tips has been reduced about one order from ～70 V/μm to 4～10 V/μm for different Ti concentrations, and however, the electron emission current density has been increased at least 3～4 order for those coated tips compared to that of the bare Si tips. To fulfill in the thickness gap between thin film of typical ～1 μm made by PVD/CVD and polished ceramic wafer of ～50 μm from the bulk, piezoelectric films with thickness in a range of 1～30 μm have been successfully deposited on Si substrate at a low temperature of 650oC by a novel hybridized deposition technique, and piezoelectric MEMS ultrasonic arrays have been very recently obtained with the sound pressure level up to ～120 dB. More detailed results will be presented and mechanisms will be discussed.

High power impulse magnetron sputtering and its applications

High power impulse magnetron sputtering（HiPIMS） has attracted a great deal of attention because the sputtered material is highly ionized during the coating process,which has been demonstrated to be advantageous for better quality coating.Therefore,the mechanism of the HiPIMS technique has recently been investigated.In this paper,the current knowledge of HiPIMS is described.We focus on the mechanical properties of the deposited thin film in the latest applications,including hard coatings,adhesion enhancement,tribological performance,and corrosion protection layers.A description of the electrical,optical,photocatalytic,and functional coating applications are presented.The prospects for HiPIMS are also discussed in this work.

Review on theory and applications of wavefront recording plane framework in generation and processing of digital holograms

The wavefront recording plane （WRP）, subsequently generalized to be known as the virtual diffraction plane （VDP）, is a recent concept that has been successfully deployed in fast generation and processing of digital holograms. In brief, the WRP and its extension, the VDP, is a hypothetical plane that is located between the hologram and the object scene, and which is at close proximity to the latter. As such, the fringe patterns on the hypothetical plane are carrying the holistic information of the hologram, as well as the local optical properties of the object scene. This important property enables a hologram to be processed with classical image processing techniques that are normally unsuitable for handling holographic information. In this paper we shall review a number of works, that have been developed based on the framework of the WRP and the VDP.

A Brief Review on Application of Information Technique to Agrometeorological Disaster Reduction

Disaster reduction strategy of agrometeorological disasters is a very complicated systematic project. The system is divided into two subsystems: agrometeorological disaster subsystem and dis aster reduction strategy subsystem. The agrometeorological disaster subsystem incIudes the whole process of disaster from occurrence, development to extinction. The subsystem of disaster reduction strategy is strategy measures included prevention, resistance and remedy of disaster The system involves monitoring, forecasting, prevention, resistance, control, loss assessment of disaster and efficiency analysis of disaster reduction. Therefore, modern information techniques (remote sensing, artificial intelligence, crop simulation etc. ) are necessary for improving the a bility of prevention and reduction of