Overview of High Voltage SiC Power Semiconductor Devices: Development and Application

Research on high voltage(HV)silicon carbide(SiC)power semiconductor devices has attracted much attention in recent years.This paper overviews the development and status of HV SiC devices.Meanwhile,benefits of HV SiC devices are presented.The technologies and challenges for HV SiC device application in converter design are discussed.The state-of-the-art applications of HV SiC devices are also reviewed.

适用于SiC MOSFET的漏源电压积分自适应快速短路保护电路研究

SiC MOSFET因其高击穿电压、高开关速度、低导通损耗等性能优势而被广泛应用于各类电力电子变换器中。然而,由于其短路耐受时间仅为2~7μs,且随母线电压升高而缩短,快速可靠的短路保护电路已成为其推广应用的关键技术之一。为应对不同母线电压下的Si C MOSFET短路故障,文中提出一种基于漏源电压积分的自适应快速短路保护方法(drain-sourcevoltageintegration-basedadaptivefast short-circuit protection method,DSVI-AFSCPM),研究所提出的DSVI-AFSCPM在硬开关短路(hardswitchingfault,HSF)和负载短路(fault under load,FUL)条件下的保护性能,进而研究不同母线电压对DSVI-AFSCPM的作用机理。同时,探究Si CMOSFET工作温度对其响应速度的影响。最后,搭建实验平台,对所提出的DSVI-AFSCPM在发生硬开关短路和负载短路时不同母线电压、不同工作温度下的保护性能进行实验测试。实验结果表明,所提出的DSVI-AFSCPM在不同母线电压下具有良好的保护速度自适应性,即母线电压越高,短路保护速度越快,并且其响应速度受Si CMOSFET工作温度影响较小,两种短路工况下工作温度从25℃变化到125℃,短路保护时间变化不超过90 ns。因此,该文为Si CMOSFET在不同母线电压下的可靠使用提供一定技术支撑。

SiC MOSFET高温栅氧可靠性研究

碳化硅SiC(silicon carbide)具有优良的电学和热学特性,是一种前景广阔的宽禁带半导体材料。SiC材料制成的功率MOSFET(metal-oxide-semiconductor field-effect transistor)非常适合应用于大功率领域,而高温栅氧可靠性是大功率MOSFET最需要关注的特性之一。通过正压高温栅偏试验和负压高温栅偏试验对比了自研SiC MOSFET和国外同规格SiC MOSFET的高温栅氧可靠性。负压高温栅偏试验结果显示自研SiC MOSFET与国外SiC MOSFET的阈值电压偏移量基本相等,阈值电压偏移量百分比最大相差在4.52%左右。正压高温栅偏试验的结果显示自研SiC MOSFET的阈值电压偏移量较小,与国外SiC MOSFET相比,自研SiC MOSFET的阈值电压偏移量百分比最大相差11%。自研器件占优势的原因是在SiC/SiO2界面处引入了适量的氮元素,钝化界面缺陷的同时,减少了快界面态的产生,使总的界面态密度被降到最低。

采用大芯片的高功率密度SiC功率模块设计

碳化硅SiC(silicon carbide)器件具备耐高压、低损耗和高热导率等优势,对电动汽车行业发展具有重要意义。提出一种利用大芯片封装的SiC MOSFET功率模块设计,并开展实验分析模块的电气性能;搭建仿真对仅有电特性与电特性和温度负反馈结合这2种情况下模块温度进行对比研究。仿真结果表明,在相同工作条件下,采用大芯片封装设计的SiC MOSFET功率模块导通电流能力更强,温度变化更小,电气性能有所提升。

SiC MOSFET驱动特性及器件国产化后的影响分析

碳化硅金属氧化物半导体场效应晶体管SiC MOSFET(silicon carbide metal-oxide-semiconductor field-effect transistor)作为一种新型、广泛应用的开关器件,在实际应用中具有更快的开关速度和更低的器件损耗,可以提高变换器的效率,体现更好的性能。针对SiC MOSFET驱动特性,分析寄生参数对其的影响;搭建双脉冲实验平台,分析栅源电压与SiC MOSFET导通时间的关系;针对现有国产SiC MOSFET存在的不足之处,基于搭建的实验平台及其他电源产品,对SiC MOSFET进行国产化器件替代后导通时间、驱动损耗及负压幅值变化的相关分析。

动态高温反偏应力下的SiC MOSFET测试平台及其退化机理研究

为研究SiC MOSFET在动态漏源应力下的退化机理,开发了一种具有dVds/dt可调功能、最高可达80 V/ns的动态反向偏置测试平台。针对商用SiC MOSFET进行动态高温反偏实验,讨论高电压变化率的动态漏源应力对SiC MOSFET电学特性的影响。实验结果显示,器件的阈值电压和体二极管正向导通电压增加,说明器件JFET区上方的栅氧层和体二极管可能发生了退化。通过Sentaurus TCAD分析了在高漏源电压及高电压变化率下平面栅型SiC MOSFET的薄弱位置,在栅氧层交界处和体二极管区域设置了空穴陷阱,模拟动态高温反偏对SiC MOSFET动静态参数的影响。

Development and Prospect of SiC Power Devices in Power Grid

碳化硅作为一种宽禁带材料,具有高击穿场强、高饱和电子漂移速率、高热导率等优点,可以实现高压、大功率、高频、高温应用的新型功率半导体器件。该文对碳化硅功率半导体器件的最新发展进行回顾,包括碳化硅功率二极管、MOSFET、IGBT和晶闸管,对其在电力系统的应用现状与前景进行展望。高压大容量碳化硅功率半导体器件的迅速发展,将对电力系统的发展带来深远的影响。

SiC MOSFET的质子单粒子效应

SiC金属氧化物半导体场效应晶体管(MOSFET)在深空探测领域具有广阔的应用前景,但空间质子引发的单粒子效应(SEE)对航天器稳定运行造成了严重威胁。对平面栅结构与非对称沟槽栅结构的SiC MOSFET进行了能量为70、100与200 MeV的质子辐照实验。实验结果表明,两种SiC MOSFET的单粒子烧毁(SEB)阈值电压均大于额定漏源电压的75%;SEB阈值电压随质子能量升高而降低。对两种器件进行辐照后栅应力测试发现,两种结构的器件由于沟道不同而对栅应力的响应存在差异;不同的质子能量会在栅极引入不同程度的辐射损伤,低能质子更容易在栅氧化层发生碰撞而引入氧化物潜在损伤。该研究可为揭示SiC MOSFET质子SEE机理和评估抗辐射能力提供参考。

SiC MOSFET器件高温下最大电流导通能力评估方法

碳化硅SiC(silicon carbide)器件被认为是一种良好的耐高温半导体器件,高功率密度和高温应用需要更深入地研究损耗和散热问题。研究了SiC MOSFET功率模块在高温下的最大电流导通能力,考虑了电气性能和散热的相互关系。在建立SiC MOSFET器件的热电耦合模型配合系统散热模型的基础上,分析了热失控过程的机理。通过热电联合仿真确定了一款SiC功率模块高温下的电流容量,与实验结果相比误差约为4%,验证了所提方法的有效性。

A review of manufacturing technologies for silicon carbide superjunction devices

Superjunction technology is believed to reach the optimal specific on-resistance and breakdown voltage trade-off.It has become a mainstream technology in silicon high-voltage metal oxide semiconductor field effect transistor devices.Numerous efforts have been conducted to employ the same concept in silicon carbide devices.These works are summarized here.

SiC激光退火欧姆接触模拟分析及实验研究

实现高可靠性、低电阻欧姆接触是获得高性能SiC功率半导体器件的前提,其直接决定功率器件的能耗水平。激光退火凭借局域化、温升快、控制灵活、精度高、连续能量输出稳定等优点,成为SiC功率器件的新一代主流退火技术。总结了近年来国内外SiC功率器件激光退火研究进展,详细模拟分析了激光退火原理中光热传输特性,设计了355 nm紫外激光退火实验系统,对Ni/SiC进行了激光退火实验,在激光能量密度为2.55 J/cm^(2)条件下,比接触电阻为9.49×10^(-5)Ω·cm^(2)。研究结果对SiC功率器件激光退火欧姆接触性能提升提供了理论和数据支撑。

基于栅极参考电压的SiC MOSFET栅极氧化物健康状态在线监测方法

栅极氧化物退化是限制SiC MOSFET进一步广泛应用的关键可靠性问题。在线监测能够实时获取栅极氧化物健康状态,是提升SiC MOSFET可靠性的重要手段,因此提出一种基于栅极参考电压的SiC MOSFET栅极氧化物健康状态在线监测方法,并详细介绍了利用栅极参考电压监测栅极氧化物健康状态的基本原理;提出一种栅极参考电压在线提取电路,经脉冲测试验证可以实现在线提取,经老化试验验证可以有效监测栅极氧化物健康状态。所提电路可以集成在栅极驱动中,不会显著增加系统复杂程度。

High Power, Room Temperature Terahertz Emitters Based on Dopant Transitions in 6H-Silicon Carbide

Electrically pumped high power terahertz （THz） emitters that operated above room temperature in a pulse mode were fabricated from nitrogen-doped n-type 6H-SiC. The emission spectra had peaks centered on 5 THz and 12 THz （20 meV and 50 meV） that were attributed to radiative transitions of excitons bound to nitrogen donor impurities. Due to the relatively deep binding energies of the nitrogen donors, above 100 meV, and the high thermal conductivity of the SiC substrates, the THz output power and operating temperature were significantly higher than previous dopant based emitters. With peak applied currents of a few amperes, and a top surface area of 1 mm2, the device emitted up to 0.5 mW at liquid nitrogen temperature （77 K）, and tens of microwatts up to 333 K. This result is the highest temperature of THz emission reported from impurity-based emitters.

Design and fabrication of 10-kV silicon–carbide p-channel IGBTs with hexagonal cells and step space modulated junction termination extension

10-kV 4 H–SiC p-channel insulated gate bipolar transistors(IGBTs) are designed, fabricated, and characterized in this paper. The IGBTs have an active area of 2.25 mm^2 with a die size of 3 mm× 3 mm. A step space modulated junction termination extension(SSM-JTE) structure is introduced and fabricated to improve the blocking performance of the IGBTs.The SiC p-channel IGBTs with SSM-JTE termination exhibit a leakage current of only 50 nA at-10 kV. To improve the on-state characteristics of SiC IGBTs, the hexagonal cell(H-cell) structure is designed and compared with the conventional interdigital cell(I-cell) structure. At an on-state current of 50 A/cm^2, the voltage drops of I-cell IGBT and H-cell IGBT are10.1 V and 8.3 V respectively. Meanwhile, on the assumption that the package power density is 300 W/cm^2, the maximum permissible current densities of the I-cell IGBT and H-cell IGBT are determined to be 34.2 A/cm^2 and 38.9 A/cm^2 with forward voltage drops of 8.8 V and 7.8 V, respectively. The differential specific on-resistance of I-cell structure and H-cell structure IGBT are 72.36 m?·cm^2 and 56.92 m?·cm^2, respectively. These results demonstrate that H-cell structure silicon carbide IGBT with SSM-JTE is a promising candidate for high power applications.

中子辐射导致的SiC功率器件漏电增加特性研究

基于14 MeV中子辐照研究了碳化硅(silicon carbide,SiC)肖特基势垒二极管(Schottky barrier diode,SBD)和金属氧化物半导体场效应晶体管(metal oxide semiconductor field effect transistor,MOSFET)器件的位移损伤退化特性.结果表明:总注量为1.18×10^(11)cm^(-2)的中子辐照不会引起SBD正向I-V特性的明显退化,但会导致反向漏电流出现显著增大.通过深能级瞬态谱测试发现中子辐照在SiC中引入的缺陷簇形成了能级位置E_(C)—1.034 eV处的缺陷.该深能级缺陷可能导致SiC漂移层费米能级向禁带中央移动,引起了肖特基势垒的降低,最终导致反向漏电流的增大.此外,中子辐照也会导致SiC MOSFET栅漏电增大.对应栅电压V_(gs)=15 V时,辐照后器件栅电流比辐照前增大了近3.3倍.中子辐照在氧化层中引入的施主型缺陷导致辐照前后MOSFET器件的栅氧导电机制发生了变化.缺陷对载流子越过栅氧化层势垒有辅助作用,从而导致栅漏电的增加.深能级瞬态谱测试结果表明中子辐照还会导致MOSFET器件沟道附近SiC材料中本征缺陷状态的改变,同时形成了新的Si空位缺陷能级,但这些缺陷不是导致器件性能退化的主要原因.

Experiment and simulation on degradation and burnout mechanisms of SiC MOSFET under heavy ion irradiation

Experiments and simulation studies on 283 MeV I ion induced single event effects of silicon carbide(SiC) metal–oxide–semiconductor field-effect transistors(MOSFETs) were carried out. When the cumulative irradiation fluence of the SiC MOSFET reached 5×10^(6)ion·cm^(-2), the drain–gate channel current increased under 200 V drain voltage, the drain–gate channel current and the drain–source channel current increased under 350 V drain voltage. The device occurred single event burnout under 800 V drain voltage, resulting in a complete loss of breakdown voltage. Combined with emission microscope, scanning electron microscope and focused ion beam analysis, the device with increased drain–gate channel current and drain–source channel current was found to have drain–gate channel current leakage point and local source metal melt, and the device with single event burnout was found to have local melting of its gate, source, epitaxial layer and substrate. Combining with Monte Carlo simulation and TCAD electrothermal simulation, it was found that the initial area of single event burnout might occur at the source–gate corner or the substrate–epitaxial interface, electric field and current density both affected the lattice temperature peak. The excessive lattice temperature during the irradiation process appeared at the local source contact, which led to the drain–source channel damage. And the excessive electric field appeared in the gate oxide layer, resulting in drain–gate channel damage.

基于PZT压电陶瓷的SiC MOSFET缓冲吸收电路

在高速关断过程中,碳化硅(silicon carbide,SiC)金属-氧化物半导体场效应晶体管器件呈现出严重的电压过冲和振荡,降低器件电压裕量。通常,采用缓冲吸收电路改善SiC器件的关断电压轨迹。然而,现有研究忽略SiC器件与吸收电路的交互规律和工作温度对吸收电路性能的影响,限制缓冲吸收电路的应用。针对这些问题,该文提出一种基于锆钛酸铅(lead zirconate titanate,PZT)压电陶瓷的缓冲吸收电路,分析PZT的温度特性,通过建立半桥电路与PZT缓冲吸收电路的高精度交互模型,揭示PZT缓冲吸收电路与SiC器件的耦合规律,利用特征方程-根轨迹方法,定量刻画PZT缓冲吸收电路的参数设计域。对比评估工作温度对多种缓冲吸收电路性能的影响。实验结果表明,所提设计方法能很好地抑制关断电压过冲与振荡,验证设计方法的有效性。相较于传统RC缓冲吸收电路,PZT缓冲吸收电路在工作温度发生变动后,仍然具有很好的抑制效果,且抑制效果随工作温度的上升而不断增强。为SiC功率器件的暂态稳定性分析,以及功率模块和缓冲吸收电路的集成设计,提供有益的参考。

Proton induced radiation effect of SiC MOSFET under different bias

Radiation effects of silicon carbide metal–oxide–semiconductor field-effect transistors(SiC MOSFETs)induced by 20 MeV proton under drain bias(V_(D)=800 V,V_(G)=0 V),gate bias(V_(D)=0 V,V_(G)=10 V),turn-on bias(V_(D)=0.5 V,V_(G)=4 V)and static bias(V_(D)=0 V,V_(G)=0 V)are investigated.The drain current of SiC MOSFET under turn-on bias increases linearly with the increase of proton fluence during the proton irradiation.When the cumulative proton fluence reaches 2×10^(11)p·cm^(-2),the threshold voltage of SiC MOSFETs with four bias conditions shifts to the left,and the degradation of electrical characteristics of SiC MOSFETs with gate bias is the most serious.In the deep level transient spectrum test,it is found that the defect energy level of SiC MOSFET is mainly the ON2(E_(c)-1.1 eV)defect center,and the defect concentration and defect capture cross section of SiC MOSFET with proton radiation under gate bias increase most.By comparing the degradation of SiC MOSFET under proton cumulative irradiation,equivalent 1 MeV neutron irradiation and gamma irradiation,and combining with the defect change of SiC MOSFET under gamma irradiation and the non-ionizing energy loss induced by equivalent 1 MeV neutron in SiC MOSFET,the degradation of SiC MOSFET induced by proton is mainly caused by ionizing radiation damage.The results of TCAD analysis show that the ionizing radiation damage of SiC MOSFET is affected by the intensity and direction of the electric field in the oxide layer and epitaxial layer.

Comparison between SiC- and Si-Based Inverters for Photovoltaic Power Generation Systems

100-W class power storage systems were developed, which comprised spherical Si solar cells, a maximum power point tracking charge control-ler, a lithium-ion battery, and one of two different types of direct current (DC)-alter- nating current (AC) converters. One inverter used SiC met-al-oxide-semicon-ductor field-effect transistors (MOSFETs) as switching devices while the other used Si MOSFETs. In these 100-W class inverters, the ON resistance was considered to have little influence on the efficiency. Nevertheless, the SiC-based inverter exhibited an approximately 3% higher DC-AC conversion efficiency than the Si-based inverter. Power loss analysis indicated that the higher efficiency resulted predominantly from lower switching and reverse recovery losses in the SiC MOSFETs compared with in the Si MOSFETs.

SiC芯片微型化及发展趋势

新能源汽车与光伏作为SiC器件发展的重要推手,促进国内碳化硅产业链日趋完善,设计和制造进展快速,部分制造商器件特性已达到或接近国际领先水平。然而,由于SiC器件价格偏高,器件成本成为限制SiC器件进一步渗透市场的最主要因素。SiC芯片微型化能够显著降低芯片成本,已成为进一步加快SiC技术在新能源领域的大规模应用的有效途径之一。文章对近年来SiC芯片微型化的发展进行了梳理总结,对芯片微型化的必要性进行了分析,并提出了SiC芯片微型化的解决办法,阐述了国际SiC芯片微型化进展,对国内SiC技术近阶段的快速发展进行了阶段性总结,并揭示了芯片微型化将面临的各种挑战。最后,对国内SiC器件发展的机遇和未来进行了展望,为进一步研发提供思路和参考。