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Experiment and simulation on degradation and burnout mechanisms of SiC MOSFET under heavy ion irradiation 被引量:2
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作者 张鸿 郭红霞 +9 位作者 雷志锋 彭超 张战刚 陈资文 孙常皓 何玉娟 张凤祁 潘霄宇 钟向丽 欧阳晓平 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第2期525-534,共10页
Experiments and simulation studies on 283 MeV I ion induced single event effects of silicon carbide(SiC) metal–oxide–semiconductor field-effect transistors(MOSFETs) were carried out. When the cumulative irradiation ... Experiments and simulation studies on 283 MeV I ion induced single event effects of silicon carbide(SiC) metal–oxide–semiconductor field-effect transistors(MOSFETs) were carried out. When the cumulative irradiation fluence of the SiC MOSFET reached 5×10^(6)ion·cm^(-2), the drain–gate channel current increased under 200 V drain voltage, the drain–gate channel current and the drain–source channel current increased under 350 V drain voltage. The device occurred single event burnout under 800 V drain voltage, resulting in a complete loss of breakdown voltage. Combined with emission microscope, scanning electron microscope and focused ion beam analysis, the device with increased drain–gate channel current and drain–source channel current was found to have drain–gate channel current leakage point and local source metal melt, and the device with single event burnout was found to have local melting of its gate, source, epitaxial layer and substrate. Combining with Monte Carlo simulation and TCAD electrothermal simulation, it was found that the initial area of single event burnout might occur at the source–gate corner or the substrate–epitaxial interface, electric field and current density both affected the lattice temperature peak. The excessive lattice temperature during the irradiation process appeared at the local source contact, which led to the drain–source channel damage. And the excessive electric field appeared in the gate oxide layer, resulting in drain–gate channel damage. 展开更多
关键词 heavy ion silicon carbide metal–oxide–semiconductor field-effect transistors(sic mosfet) drain–gate channel drain–source channel single event burnout TCAD simulation
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Proton induced radiation effect of SiC MOSFET under different bias 被引量:1
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作者 张鸿 郭红霞 +11 位作者 雷志锋 彭超 马武英 王迪 孙常皓 张凤祁 张战刚 杨业 吕伟 王忠明 钟向丽 欧阳晓平 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第10期708-715,共8页
Radiation effects of silicon carbide metal–oxide–semiconductor field-effect transistors(SiC MOSFETs)induced by 20 MeV proton under drain bias(V_(D)=800 V,V_(G)=0 V),gate bias(V_(D)=0 V,V_(G)=10 V),turn-on bias(V_(D)... Radiation effects of silicon carbide metal–oxide–semiconductor field-effect transistors(SiC MOSFETs)induced by 20 MeV proton under drain bias(V_(D)=800 V,V_(G)=0 V),gate bias(V_(D)=0 V,V_(G)=10 V),turn-on bias(V_(D)=0.5 V,V_(G)=4 V)and static bias(V_(D)=0 V,V_(G)=0 V)are investigated.The drain current of SiC MOSFET under turn-on bias increases linearly with the increase of proton fluence during the proton irradiation.When the cumulative proton fluence reaches 2×10^(11)p·cm^(-2),the threshold voltage of SiC MOSFETs with four bias conditions shifts to the left,and the degradation of electrical characteristics of SiC MOSFETs with gate bias is the most serious.In the deep level transient spectrum test,it is found that the defect energy level of SiC MOSFET is mainly the ON2(E_(c)-1.1 eV)defect center,and the defect concentration and defect capture cross section of SiC MOSFET with proton radiation under gate bias increase most.By comparing the degradation of SiC MOSFET under proton cumulative irradiation,equivalent 1 MeV neutron irradiation and gamma irradiation,and combining with the defect change of SiC MOSFET under gamma irradiation and the non-ionizing energy loss induced by equivalent 1 MeV neutron in SiC MOSFET,the degradation of SiC MOSFET induced by proton is mainly caused by ionizing radiation damage.The results of TCAD analysis show that the ionizing radiation damage of SiC MOSFET is affected by the intensity and direction of the electric field in the oxide layer and epitaxial layer. 展开更多
关键词 PROTON silicon carbide metal–oxide–semiconductor field-effect transistor(sic mosfet) degradation defect ionization radiation damage
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功率器件功率循环测试技术的挑战与分析 被引量:8
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作者 邓二平 严雨行 +4 位作者 陈杰 谢露红 王延浩 赵雨山 黄永章 《中国电机工程学报》 EI CSCD 北大核心 2023年第13期5132-5150,共19页
功率循环测试被称为考核功率器件封装可靠性最重要的实验,尤其是碳化硅金属–氧化物半导体场效应晶体管(silicon carbon metal-oxide-semiconductor field-effect transistor,SiC MOSFET)功率器件的快速发展,是近几年的研究热点。与其... 功率循环测试被称为考核功率器件封装可靠性最重要的实验,尤其是碳化硅金属–氧化物半导体场效应晶体管(silicon carbon metal-oxide-semiconductor field-effect transistor,SiC MOSFET)功率器件的快速发展,是近几年的研究热点。与其他可靠性测试不同的是,功率循环测试原理虽然简单,但测试技术、测试方法和数据处理却涉及到半导体物理、电磁学、传热学、结构力学和信号分析等多学科交叉,处理不当将得到错误的结论。文中基于功率循环测试基本原理,从测试技术、测试方法和数据处理3个大方面对其存在的挑战进行深入分析,并提出相应的解决方案。测试技术主要包括电气测量噪声、结温测量延时和数据采集点,电气测量噪声和测量延时影响功率循环测试中结温的准确性,数据采集点则是影响器件的失效模式判定和寿命。测试方法主要包括结温测试方法、电流激励方法和宽禁带器件SiC MOSFET的相关测试方法,其中电流激励方法会影响器件的失效机理和寿命,需要特别关注。数据处理部分则是从可靠性数理统计角度出发,探究测试样本数量和对测试结果的修正,以得到准确的测试结果。该文可以为功率循环测试技术和设备的发展奠定一定理论和方法基础,为功率循环测试和数据分析提供一些借鉴。 展开更多
关键词 功率器件 碳化硅金属–氧化物半导体场效应晶体管 功率循环测试 挑战与分析
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