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Morphology Investigation of Electrolessly Deposited Ag Film on Ag-Activated p-Type Silicon(111) Wafer
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作者 佟浩 王春明 《Chinese Journal of Chemistry》 SCIE CAS CSCD 2006年第4期457-462,共6页
A method of electroless silver deposition on silver activated p-type silicon(111) wafer was proposed. The silver seed layer was deposited firstly on the wafer in the solution of 0.005 mol/L AgNO3 +0.06 mol/L HE The... A method of electroless silver deposition on silver activated p-type silicon(111) wafer was proposed. The silver seed layer was deposited firstly on the wafer in the solution of 0.005 mol/L AgNO3 +0.06 mol/L HE Then the silver film was electrolessly deposited on the seed layer in the electroless bath of AgNO3+NH3+acetic acid+NH2NH2 (pH 10.2). The morphology of the seed layer and the silver films prepared under the condition of the different bath composition was compared by atomic force microscopy. The reflectance of the silver films with different thickness was characterized by Fourier transform infrared spectrometry. The experimental results indicate that the seed layer possesses excellent catalytic activity toward electroless silver deposition and rotating of the silicon wafer during the electroless silver deposition could lead to formation of the smoother silver film. 展开更多
关键词 silicon(111) wafer electroless deposition SILVER
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H_(2)S在Cr(111)面上吸附与解离的第一性原理研究 被引量:1
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作者 江佐禹 黄本生 +1 位作者 何子涛 罗霞 《原子与分子物理学报》 CAS 北大核心 2024年第2期9-14,共6页
采用了第一性原理研究了H_(2)S在Cr(111)面的吸附解离过程,利用吸附能、吸附构型和偏态密度图(PDOS)研究了H_(2)S及其解离产物在Cr(111)面上的吸附情况,都偏向倾斜吸附在Cr(111)面.同时研究了HS/H和S/H共吸附情况,得到共吸附物质在Cr(1... 采用了第一性原理研究了H_(2)S在Cr(111)面的吸附解离过程,利用吸附能、吸附构型和偏态密度图(PDOS)研究了H_(2)S及其解离产物在Cr(111)面上的吸附情况,都偏向倾斜吸附在Cr(111)面.同时研究了HS/H和S/H共吸附情况,得到共吸附物质在Cr(111)面上有明显的相互作用.最后使用线性同步和二次同步变换方法确定了解离反应的过渡态,了解到第一、二步解离的活化能分别为1.65 eV、0.82 eV,H_(2)S分子在Cr(111)面上的解离过程是放热反应,反应能为-2.90 eV. 展开更多
关键词 H_(2)S Cr(111) 吸附 解离 第一性原理
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OH^(*)对Ni(111)上甲烷部分氧化成CO影响的理论计算
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作者 陈鹏 孟园园 +2 位作者 丁传敏 王俊文 王莲 《低碳化学与化工》 CAS 北大核心 2024年第11期28-35,共8页
为促进我国能源结构转型和缓解能源短缺压力,将储量丰富的天然气(甲烷)部分氧化成合成气具有重要的现实意义。该过程常用的催化剂为Ni基催化剂,其存在易积炭失活的问题。深入研究Ni基催化剂表面的催化机理有助于解决该问题。基于密度泛... 为促进我国能源结构转型和缓解能源短缺压力,将储量丰富的天然气(甲烷)部分氧化成合成气具有重要的现实意义。该过程常用的催化剂为Ni基催化剂,其存在易积炭失活的问题。深入研究Ni基催化剂表面的催化机理有助于解决该问题。基于密度泛函理论的第一性原理计算方法,确定了甲烷部分氧化中相关物种在Ni(111)上最有利的吸附构型,并通过二聚体方法搜索了反应过程中各基元反应的过渡态,分析了Ni(111)上甲烷部分氧化生成CO的整个过程。结果表明,CH^(*)在Ni(111)上的吸附能为6.98 eV,CH2^(*)脱氢生成CH^(*)的活化能为0.28 eV,远低于CH^(*)脱氢的活化能(1.29 eV),说明CH^(*)可在Ni表面大量存在,并且其变化可影响整个反应途径。在甲烷部分氧化生成CO的整个过程中,OH^(*)氧化CH^(*)生成CO^(*)时的活化能为1.48 eV,较C^(*)被O^(*)直接氧化生成CO的活化能(1.59 eV)低0.11 eV,因此形成OH^(*)更有利于CO的生成。在CH^(*)被OH^(*)氧化生成CO^(*)的过程中,经历了CHOH^(*)→COH^(*)→CO^(*)的转化过程,整个转化过程的活化能为0.91 eV;而CHOH^(*)→CHO^(*)→CO^(*)的转化过程的活化能为0.73 eV,因此CHOH^(*)更倾向于脱氢生成CHO^(*)进而生成CO^(*),甲烷部分氧化生成CO^(*)的最佳反应路径为CH_4^(*)→CH_3^(*)→CH_(2)^(*)→CH^(*)+OH^(*)→CHOH^(*)→CHO^(*)→CO^(*)。 展开更多
关键词 OH^(*) 甲烷部分氧化 Ni(111) 密度泛函理论
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Growth Conditions of Φ100 mm n <111> FZ Silicon Single Crystal
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作者 周旗钢 曾世铭 +2 位作者 张福珍 陈勇钢 孙华英 《Rare Metals》 SCIE EI CAS CSCD 1995年第2期154-157,共4页
For large diarneter silicon single crystal, the solid-liquid growth interface is necessary to be a coneaveshape with a certain radius range. If the change of the radius of growth interface is not in this limited range... For large diarneter silicon single crystal, the solid-liquid growth interface is necessary to be a coneaveshape with a certain radius range. If the change of the radius of growth interface is not in this limited range,the growth of DF (dislocation free) sinsle crystal is very difficult. The growth of FZ-Si single crystal was stud-ied. It is found that the growth speed ( 2. 5~2. 7 mm/min) as well as the rotation speed (3. 5 r/min) for theΦ100 mm crystal can be smaller . comparing with the Φ76. 2 mm crystal with the same coil. In order to satisfythe demand of large diameter crystal . the size of coil should be large enough, and the shape should satisfy theneed of the growth interface of crystal. With the increasing of diameter , the heating power , the anode voltageand the strength of electric field within the coil should be increased, and Ar pressure in surrounding circum-stance should also be higher , from 1. 96 × 1 0 ̄4 Pa to 4. 90 × 10 ̄4 Pa.According to the above growth factors, three rods of Φ100 mm FZ-Si single crystal were grown success-fully , the weights are 8~10 kg. When the diameter of crystal cone is increased to a limited size, “remeltingarca” will occur in the surface of the crystal , which cause a failure of growing DF crystal , this reason may bethat the recrystalliztion direction has been chansed , as it does. 展开更多
关键词 e: Float-zone single crystal silicon Stress Dislocation-free silicon
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Microstructure evolution and passivation quality of hydrogenated amorphous silicon oxide(a-SiOx:H) on〈100〉- and 〈111〉-orientated c-Si wafers
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作者 Jun-Fan Chen Sheng-Sheng Zhao +9 位作者 Ling-Ling Yan Hui-Zhi Ren Can Han De-Kun Zhang Chang-Chun Wei Guang-Cai Wang Guo-Fu Hou § Ying Zhao Xiao-Dan Zhang 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第3期480-487,共8页
Hydrogenated amorphous silicon oxide(a-SiOx:H) is an attractive passivation material to suppress epitaxial growth and reduce the parasitic absorption loss in silicon heterojunction(SHJ) solar cells. In this paper, a-S... Hydrogenated amorphous silicon oxide(a-SiOx:H) is an attractive passivation material to suppress epitaxial growth and reduce the parasitic absorption loss in silicon heterojunction(SHJ) solar cells. In this paper, a-SiOx:H layers on different orientated c-Si substrates are fabricated. An optimal effective lifetime(τ(eff)) of 4743 μs and corresponding implied opencircuit voltage(iV(oc)) of 724 mV are obtained on〈100〉-orientated c-Si wafers. While τ(eff) of 2429 μs and iV_(oc) of 699 mV are achieved on 111-orientated substrate. The FTIR and XPS results indicate that the a-SiOx:H network consists of SiOx(Si-rich), Si–OH, Si–O–SiHx, SiO2 ≡ Si–Si, and O3 ≡ Si–Si. A passivation evolution mechanism is proposed to explain the different passivation results on different c-Si wafers. By modulating the a-SiOx:H layer, the planar silicon heterojunction solar cell can achieve an efficiency of 18.15%. 展开更多
关键词 a-SiO_x:H orientated WAFERS silicon HETEROJUNCTION
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Radiation-induced defects in different silicon (111) wafers by 400 keV electron irradiation
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作者 Gao, Hui Wang, Heyi Yuan, Yonggang 《Rare Metals》 SCIE EI CAS CSCD 2012年第3期290-295,共6页
The energy deposition for low-energy electron beam on Si-SiO2 models was calculated by Monte-Carlo method. Making use of electron paramagnetic resonance (EPR) technique, an investigation of the effect of dopant type a... The energy deposition for low-energy electron beam on Si-SiO2 models was calculated by Monte-Carlo method. Making use of electron paramagnetic resonance (EPR) technique, an investigation of the effect of dopant type and concentration on EPR signal variations was carried out by using p-type and n-type silicon(111) wafers with concentration of 1×1015 cm 3 and 1×1017 cm 3, and the changes of intensity of defect paramagnetic centers before and after irradiation of electrons were compared. The chemical states of Si-SiO2 structure were determined by X-ray photoelectrons spectroscopy(XPS). The results clearly indicate that the effects of dopant variations (type and concentration) are of obvious difference. Compared with p-type silicon, n-type silicon, especially with higher dopant concentration, tends to produce defect at the interface under low-energy electron irradiation with certain flux, which arises from the hole trapped on a nonbridging oxygen atom bonded to P. It is represented in the form of distinct changes of POHC intensity and P2P spectrum. According to the theoretical and experimental data, the relationship among electron energy deposition, chemical states of element Si at SiO2 -Si(111) interface, and radiation effect were analyzed and discussed. 展开更多
关键词 SiO2-Si(111) interface low-energy electron energy deposition XPS spectrum EPR spectrum radiation effect
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Oxidation Kinetics of (111) Silicon Monocrystal and Morphology of Oxide Film in Dry Oxygen Atmosphere
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作者 李文超 樊自拴 +1 位作者 孙贵如 秦福 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1989年第5期362-365,共4页
1. Introduction Thermal oxidation of silicon monocrystalis a very important process in fabricationof metal--oxide--semiconductor (MOS) devices.In recent years it has received great atten-tion. Various proposals for ox... 1. Introduction Thermal oxidation of silicon monocrystalis a very important process in fabricationof metal--oxide--semiconductor (MOS) devices.In recent years it has received great atten-tion. Various proposals for oxidation modeshave been made by different groups.Now most of the authors working in thisfield hold the view that the oxidation rateof silicon obeys a typical parabolic rule,that is, the oxidation reaction is controlledby diffusion. The experimental data inRef. can be taken and a kinetic curve 展开更多
关键词 oxidation mechanism silicon monocrystal oxide film morphology
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Effect of driving frequency on the structure of silicon grown on Ag(111) films by very-high-frequency magnetron sputtering
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作者 郭佳敏 叶超 +2 位作者 王响英 杨培芳 张苏 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第6期266-270,共5页
The effect of driving frequency on the structure of silicon grown on Ag(111) film is investigated, which was prepared by using the very-high-frequency(VHF)(40.68 MHz and 60 MHz) magnetron sputtering. The energy ... The effect of driving frequency on the structure of silicon grown on Ag(111) film is investigated, which was prepared by using the very-high-frequency(VHF)(40.68 MHz and 60 MHz) magnetron sputtering. The energy and flux density of the ions impinging on the substrate are also analyzed. It is found that for the 60-MHz VHF magnetron sputtering, the surface of silicon on Ag(111) film exhibits a small cone structure, similar to that of Ag(111) film substrate, indicating a better microstructure continuity. However, for the 40.68-MHz VHF magnetron sputtering, the surface of silicon on Ag(111) film shows a hybrid structure of hollowed-cones and hollowed-particles, which is completely different from that of Ag(111)film. The change of silicon structure is closely related to the differences in the ion energy and flux density controlled by the driving frequency of sputtering. 展开更多
关键词 silicon growth Ag film substrate structural property very-high-frequency sputtering
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基于In Silicon模拟消化的北极虾DPP-Ⅳ抑制肽活性分析
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作者 刘浩思 徐春明 +3 位作者 田源 韩爱萍 刘孝飞 李振华 《中国食品添加剂》 CAS 2024年第1期127-135,共9页
北极虾具有很高的营养价值,在食品领域已引起越来越多的关注。对北极虾蛋白进行In Silicon模拟消化获得寡肽,通过PeptideRanker活性评分及理化性质分析,从中筛选出具有潜在生物活性的寡肽。使用ToxinPred分析和BIOPEP-UWM生物活性预测,... 北极虾具有很高的营养价值,在食品领域已引起越来越多的关注。对北极虾蛋白进行In Silicon模拟消化获得寡肽,通过PeptideRanker活性评分及理化性质分析,从中筛选出具有潜在生物活性的寡肽。使用ToxinPred分析和BIOPEP-UWM生物活性预测,发现部分寡肽具有二肽基肽酶-Ⅳ(dipeptidyl peptidase-Ⅳ,DPP-Ⅳ)抑制活性,最终确定WFP(一种三肽,Trp-Phe-Pro)具有最优的DPP-Ⅳ抑制活性肽。分子对接表明,WFP和DPP-Ⅳ能够形成稳定的复合物,其结合能为-6.93 kcal/mol,进一步研究表明,WFP通过与DPP-Ⅳ S1、S2、S3三个活性口袋中的9个氨基酸残基发生相互作用而抑制其活性。本研究为阐释北极虾营养价值及生物活性肽的开发提供了理论依据。 展开更多
关键词 In silicon 分子对接 DPP-Ⅳ 细胞色素C氧化酶亚基Ⅰ 寡肽
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Innovative Solutions for High-Performance Silicon Anodes in Lithium-Ion Batteries:Overcoming Challenges and Real-World Applications 被引量:1
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作者 Mustafa Khan Suxia Yan +6 位作者 Mujahid Ali Faisal Mahmood Yang Zheng Guochun Li Junfeng Liu Xiaohui Song Yong Wang 《Nano-Micro Letters》 SCIE EI CAS CSCD 2024年第9期341-384,共44页
Silicon(Si)has emerged as a potent anode material for lithium-ion batteries(LIBs),but faces challenges like low electrical conductivity and significant volume changes during lithiation/delithiation,leading to material... Silicon(Si)has emerged as a potent anode material for lithium-ion batteries(LIBs),but faces challenges like low electrical conductivity and significant volume changes during lithiation/delithiation,leading to material pulverization and capacity degradation.Recent research on nanostructured Si aims to mitigate volume expansion and enhance electrochemical performance,yet still grapples with issues like pulverization,unstable solid electrolyte interface(SEI)growth,and interparticle resistance.This review delves into innovative strategies for optimizing Si anodes’electrochemical performance via structural engineering,focusing on the synthesis of Si/C composites,engineering multidimensional nanostructures,and applying non-carbonaceous coatings.Forming a stable SEI is vital to prevent electrolyte decomposition and enhance Li^(+)transport,thereby stabilizing the Si anode interface and boosting cycling Coulombic efficiency.We also examine groundbreaking advancements such as self-healing polymers and advanced prelithiation methods to improve initial Coulombic efficiency and combat capacity loss.Our review uniquely provides a detailed examination of these strategies in real-world applications,moving beyond theoretical discussions.It offers a critical analysis of these approaches in terms of performance enhancement,scalability,and commercial feasibility.In conclusion,this review presents a comprehensive view and a forward-looking perspective on designing robust,high-performance Si-based anodes the next generation of LIBs. 展开更多
关键词 silicon anode Energy storage NANOSTRUCTURE Prelithiation BINDER
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Simulation of Multilayer Silicon Thin Films Growth on Si(111) Surface
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作者 Wu Fengmin Lu Hangjun 《Journal of Rare Earths》 SCIE EI CAS CSCD 2006年第z1期23-25,共3页
The homoepitaxial growth of multilayer Si thin film on Si(111) surfaces was simulated by Monte Carlo (MC) method with realistic growth model and physical parameters. Special emphasis was placed on revealing the influe... The homoepitaxial growth of multilayer Si thin film on Si(111) surfaces was simulated by Monte Carlo (MC) method with realistic growth model and physical parameters. Special emphasis was placed on revealing the influence of the Ehrlich-Schwoebel (ES) barrier on the growth modes and morphologies. It is evident that there exists the ES barrier during multilayer Si thin film growth on Si (111) surface, which is deduced from the incomplete layer-by-layer growth process in the realistic experiments. The ES barrier EB=0.1~0.125 eV is estimated from the three-dimensional (3D) MC simulation and compared with the experimental results. 展开更多
关键词 silicon HOMOEPITAXY KMC SIMULATION ES BARRIER
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Silicone oil as a corneal lubricant to reduce corneal edema and improve visualization during 被引量:1
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作者 Dan-Yang Che Zhu-Lin Chan +1 位作者 Ji-Bo Zhou Dong-Qing Zhu 《International Journal of Ophthalmology(English edition)》 SCIE CAS 2024年第1期92-96,共5页
AIM:To evaluate the efficacy and safety of silicone oil(SO)as a corneal lubricant to improve visualization during vitrectomy.METHODS:Patients who underwent vitreoretinal surgery were divided into two groups.Group 1 wa... AIM:To evaluate the efficacy and safety of silicone oil(SO)as a corneal lubricant to improve visualization during vitrectomy.METHODS:Patients who underwent vitreoretinal surgery were divided into two groups.Group 1 was operated on with initial SO(Oxane 5700)as a corneal lubricant.Group 2 was operated on with initial lactated ringer’s solution(LRS)and then replaced with SO as required.Fundus clarity was scored during the surgery.Fluorescein staining was performed to determine the damage to corneal epithelium.RESULTS:Totally 114 eyes of 114 patients were included.Single SO use maintained a clear cornea and provided excellent visualization of surgical image.In group 1,the fundus clarity was grade 3 in 41/45 eyes and grade 2 in 4/45 eyes.In group 2,corneal edema frequently occurred after initial LRS use.The fundus clarity was grade 3 in 19/69 eyes,2 in 37/69 eyes and 1 in 13/69 eyes(P<0.05).SO was applied in 29 eyes of initial LRS use with subsequent corneal edema,which eliminated the corneal edema in 26 eyes.Corneal fluorescein staining score in group 1 was 0 in 28 eyes,1 in 11 eyes and 2 in 6 eyes,and 40,20 and 9,respectively,in group 2(all P>0.05).CONCLUSION:The use of SO as a corneal lubricant is effective and safe for preserving and improving corneal clarity and providing clear surgical field during vitrectomy. 展开更多
关键词 silicone oil corneal lubricant corneal edema VITRECTOMY
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Regulation of 2-acetyl-1-pyrroline and grain quality in early-season indica fragrant rice by nitrogen and silicon fertilization under different plantation methods 被引量:1
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作者 Yongjian Chen Lan Dai +7 位作者 Siren Cheng Yong Ren Huizi Deng Xinyi Wang Yuzhan Li Xiangru Tang Zaiman Wang Zhaowen Mo 《Journal of Integrative Agriculture》 SCIE CAS CSCD 2024年第2期511-535,共25页
Fragrant rice has a high market value,and it is a popular rice type among consumers owing to its pleasant flavor.Plantation methods,nitrogen(N)fertilizers,and silicon(Si)fertilizers can affect the grain yield and frag... Fragrant rice has a high market value,and it is a popular rice type among consumers owing to its pleasant flavor.Plantation methods,nitrogen(N)fertilizers,and silicon(Si)fertilizers can affect the grain yield and fragrance of fragrant rice.However,the core commercial rice production attributes,namely the head rice yield(HRY)and 2-acetyl-1-pyrroline(2-AP)content of fragrant rice,under various nitrogen and silicon(N-Si)fertilization levels and different plantation methods remain unknown.The field experiment in this study was performed in the early seasons of 2018 and 2019 with two popular indica fragrant rice cultivars(Yuxiangyouzhan and Xiangyaxiangzhan).They were grown under six N-Si fertilization treatments(combinations of two levels of Si fertilizer,0 kg Si ha^(−1)(Si0)and 150 kg Si ha^(−1)(Si1),and three levels of N fertilizer,0 kg N ha^(−1)(N0),150 kg N ha^(−1)(N1),and 220 kg N ha^(−1)(N2))and three plantation methods(artificial transplanting(AT),mechanical transplanting(MT),and mechanical direct-seeding(MD)).The results showed that the N-Si fertilization treatments and all the plantation methods significantly affected the HRY and 2-AP content and related parameters of the two different fragrant rice cultivars.Compared with the Si0N0 treatment,the N-Si fertilization treatments resulted in higher HRY and 2-AP contents.The rates of brown rice,milled rice,head rice,and chalky rice of the fragrant rice also improved with the N-Si fertilization treatments.The N-Si fertilization treatments increased the activities of N metabolism enzymes and the accumulation of N and Si in various parts of the fragrant rice,and affected their antioxidant response parameters.The key parameters for the HRY and 2-AP content were assessed by redundancy analysis.Furthermore,the structural equation model revealed that the Si and N accumulation levels indirectly affected the HRY by affecting the N metabolism enzyme activity,N use efficiency,and grain quality of fragrant rice.Moreover,high N and Si accumulation directly promoted the 2-AP content or affected the antioxidant response parameters and indirectly regulated 2-AP synthesis.The interactions of the MT method with the N-Si fertilization treatments varied in the fragrant rice cultivars in terms of the HRY and 2-AP content,whereas the MD method was beneficial to the 2-AP content in both fragrant rice cultivars under the N-Si fertilization treatments. 展开更多
关键词 fragrant rice 2-AP content head rice yield mechanical planting NITROGEN silicon
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Characteristics of a Silicon Wafer <111>and <004>after Planting Nitrogen
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作者 Mehdi Simiari Ramin Roozehdar Mogaddam 《Advances in Materials Physics and Chemistry》 2017年第5期173-187,共15页
In this paper, different steps of work and experiments that are done in order to implant nitrogen ion in silicon with the energy of 25 keV, density of 24 μA/cm2 and doses of 5 × 1013 atom/cm2, 1?× 1014 atom... In this paper, different steps of work and experiments that are done in order to implant nitrogen ion in silicon with the energy of 25 keV, density of 24 μA/cm2 and doses of 5 × 1013 atom/cm2, 1?× 1014 atom/cm2 and 1?× 1015 atom/ cm2 (according to the calculation and applying time at planting) at room temperature (in the lack of heat phase) and without annealing will be presented. The XRD analysis is done before and after planting to observe changes in the lattice and the possibility of forming a crystalline phase of silicon nitride in this case. Also, the study of changes in the lattice arrangement and AFM analysis is done to observe the topography of the surface. Besides, the investigation on surface roughness and changes caused by ion implantation on the surface and spectrophotometry analysis before and after planting due to the study of changes in optical properties are done. 展开更多
关键词 silicon Wafer NITROGEN Ion IMPLANTATION XRD ANALYSIS AFM ANALYSIS SPECTROPHOTOMETRY ANALYSIS
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Characteristics of secondary electron emission from few layer graphene on silicon(111) surface
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作者 Guo-Bao Feng Yun Li +2 位作者 Xiao-Jun Li Gui-Bai Xie Lu Liu 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第10期549-562,共14页
As a typical two-dimensional(2D) coating material, graphene has been utilized to effectively reduce secondary electron emission from the surface. Nevertheless, the microscopic mechanism and the dominant factor of seco... As a typical two-dimensional(2D) coating material, graphene has been utilized to effectively reduce secondary electron emission from the surface. Nevertheless, the microscopic mechanism and the dominant factor of secondary electron emission suppression remain controversial. Since traditional models rely on the data of experimental bulk properties which are scarcely appropriate to the 2D coating situation, this paper presents the first-principles-based numerical calculations of the electron interaction and emission process for monolayer and multilayer graphene on silicon(111) substrate. By using the anisotropic energy loss for the coating graphene, the electron transport process can be described more realistically. The real physical electron interactions, including the elastic scattering of electron-nucleus, inelastic scattering of the electron-extranuclear electron, and electron-phonon effect, are considered and calculated by using the Monte Carlo method. The energy level transition theory-based first-principles method and the full Penn algorithm are used to calculate the energy loss function during the inelastic scattering. Variations of the energy loss function and interface electron density differences for 1 to 4 layer graphene coating Go Si are calculated, and their inner electron distributions and secondary electron emissions are analyzed. Simulation results demonstrate that the dominant factor of the inhibiting of secondary electron yield(SEY) of Go Si is to induce the deeper electrons in the internal scattering process. In contrast, a low surface potential barrier due to the positive deviation of electron density difference at monolayer Go Si interface in turn weakens the suppression of secondary electron emission of the graphene layer. Only when the graphene layer number is 3, does the contribution of surface work function to the secondary electron emission suppression appear to be slightly positive. 展开更多
关键词 secondary electron emission graphene on silicon numerical simulation
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Growth Kinetics of Silicon Carbide Film Prepared by Heating Polystyrene/Si(111)
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作者 Jian-wen Wang Yu-xia Wang +1 位作者 Zheng Chen You-ming Zou 《Chinese Journal of Chemical Physics》 SCIE CAS CSCD 2009年第1期102-106,共5页
SiC films were prepared by heating polystyrene/Si(111) in normal pressure argon atmosphere at different temperatures. The films were investigated by X-ray diffraction, scanning electron microscopy, X-ray photoelectr... SiC films were prepared by heating polystyrene/Si(111) in normal pressure argon atmosphere at different temperatures. The films were investigated by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy and Fourier transform infrared absorption measurements. The thicknesses of SiC films were calculated from FTIR spectra. The growth kinetics of the growth process of SiC films were investigated as well. The thicknesses of the SiC films grown for 1 h with increasing growth temperatures have different trends in the three temperature ranges: increasing slowly (1200-1250 ℃), increasing quickly (1250- 12.70 ℃), and decreasing (1270-1300 ℃). The apparent activation energies of the growth process of SiC films in the three ranges were calculated to be 122.5,522.5, and -127.5 J/mol respectively. Mechanisms of the different growth processes were discussed. The relation between film thicknesses and growth temperatures indicated that the growth process was a 2D mechanism in the first range and 3D mechanism in the second range. In the third range, the thicknesses of SiC films were decreased by the volatility of Si and C atoms. 展开更多
关键词 Thin films silicon carbide Fourier transform infrared absorption Growth kinetics
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Multilevel carbon architecture of subnanoscopic silicon for fast‐charging high‐energy‐density lithium‐ion batteries 被引量:1
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作者 Meisheng Han Yongbiao Mu +2 位作者 Lei Wei Lin Zeng Tianshou Zhao 《Carbon Energy》 SCIE EI CAS CSCD 2024年第4期256-268,共13页
Silicon(Si)is widely used as a lithium‐ion‐battery anode owing to its high capacity and abundant crustal reserves.However,large volume change upon cycling and poor conductivity of Si cause rapid capacity decay and p... Silicon(Si)is widely used as a lithium‐ion‐battery anode owing to its high capacity and abundant crustal reserves.However,large volume change upon cycling and poor conductivity of Si cause rapid capacity decay and poor fast‐charging capability limiting its commercial applications.Here,we propose a multilevel carbon architecture with vertical graphene sheets(VGSs)grown on surfaces of subnanoscopically and homogeneously dispersed Si–C composite nanospheres,which are subsequently embedded into a carbon matrix(C/VGSs@Si–C).Subnanoscopic C in the Si–C nanospheres,VGSs,and carbon matrix form a three‐dimensional conductive and robust network,which significantly improves the conductivity and suppresses the volume expansion of Si,thereby boosting charge transport and improving electrode stability.The VGSs with vast exposed edges considerably increase the contact area with the carbon matrix and supply directional transport channels through the entire material,which boosts charge transport.The carbon matrix encapsulates VGSs@Si–C to decrease the specific surface area and increase tap density,thus yielding high first Coulombic efficiency and electrode compaction density.Consequently,C/VGSs@Si–C delivers excellent Li‐ion storage performances under industrial electrode conditions.In particular,the full cells show high energy densities of 603.5 Wh kg^(−1)and 1685.5 Wh L^(−1)at 0.1 C and maintain 80.7%of the energy density at 3 C. 展开更多
关键词 fast charging high energy densities lithium‐ion batteries multilevel carbon architecture subnanoscopic silicon anode
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Textured Perovskite/Silicon Tandem Solar Cells Achieving Over 30% Efficiency Promoted by 4-Fluorobenzylamine Hydroiodide
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作者 Jingjing Liu Biao Shi +14 位作者 Qiaojing Xu Yucheng Li Yuxiang Li Pengfei Liu Zetong SunLi Xuejiao Wang Cong Sun Wei Han Diannan Li Sanlong Wang Dekun Zhang Guangwu Li Xiaona Du Ying Zhao Xiaodan Zhang 《Nano-Micro Letters》 SCIE EI CAS CSCD 2024年第9期557-570,共14页
Monolithic textured perovskite/silicon tandem solar cells(TSCs)are expected to achieve maximum light capture at the lowest cost,potentially exhibiting the best power conversion efficiency.However,it is challenging to ... Monolithic textured perovskite/silicon tandem solar cells(TSCs)are expected to achieve maximum light capture at the lowest cost,potentially exhibiting the best power conversion efficiency.However,it is challenging to fabricate high-quality perovskite films and preferred crystal orientation on commercially textured silicon substrates with micrometersize pyramids.Here,we introduced a bulky organic molecule(4-fluorobenzylamine hydroiodide(F-PMAI))as a perovskite additive.It is found that F-PMAI can retard the crystallization process of perovskite film through hydrogen bond interaction between F^(−)and FA^(+)and reduce(111)facet surface energy due to enhanced adsorption energy of F-PMAI on the(111)facet.Besides,the bulky molecular is extruded to the bottom and top of perovskite film after crystal growth,which can passivate interface defects through strong interaction between F-PMA+and undercoordinated Pb^(2+)/I^(−).As a result,the additive facilitates the formation of large perovskite grains and(111)preferred orientation with a reduced trap-state density,thereby promoting charge carrier transportation,and enhancing device performance and stability.The perovskite/silicon TSCs achieved a champion efficiency of 30.05%based on a silicon thin film tunneling junction.In addition,the devices exhibit excellent longterm thermal and light stability without encapsulation.This work provides an effective strategy for achieving efficient and stable TSCs. 展开更多
关键词 Perovskite crystallization (111)preferred orientation Defect passivation Perovskite/silicon tandem solar cells
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辣椒新品种遵椒111的选育
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作者 李小静 田怀志 +2 位作者 任朝辉 田浩 廖卫琴 《中国瓜菜》 CAS 北大核心 2024年第6期175-179,共5页
遵椒111是以核质互作雄性不育系ZHS7为母本、自交系cqw-b2为父本杂交选育而成的干鲜兼用朝天椒杂交1代新品种。该品种中熟,在贵州省春季露地栽培全生育期186 d。植株生长势强,株型紧凑,平均株高70.40 cm,株幅75.63 cm,果实单生向上,果... 遵椒111是以核质互作雄性不育系ZHS7为母本、自交系cqw-b2为父本杂交选育而成的干鲜兼用朝天椒杂交1代新品种。该品种中熟,在贵州省春季露地栽培全生育期186 d。植株生长势强,株型紧凑,平均株高70.40 cm,株幅75.63 cm,果实单生向上,果面光滑,果实指形,单株挂果数125.7个,果实纵径7.15 cm、横径1.68 cm,果肉厚度0.18 cm,单果质量5.76 g,青熟果绿色,老熟果红色。果实辣味中等、商品性好,鲜果辣椒素含量(w,后同)171 mg·kg^(-1),维生素C含量156 mg·100 g^(-1)。平均667 m^(2)鲜椒产量1574.32 kg。田间表现高抗青枯病,抗黄瓜花叶病毒(cucumber mosaic virus,CMV)、烟草花叶病毒(tobacco mosaic virus,TMV)、炭疽病和疫病;适宜在贵州省及相似生态地区进行保护地栽培。2023年通过农业农村部非主要农作物品种登记。 展开更多
关键词 辣椒 新品种 遵椒111 杂交1代
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Ultrafast dynamics of femtosecond laser-induced high spatial frequency periodic structures on silicon surfaces 被引量:2
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作者 Ruozhong Han Yuchan Zhang +6 位作者 Qilin Jiang Long Chen Kaiqiang Cao Shian Zhang Donghai Feng Zhenrong Sun Tianqing Jia 《Opto-Electronic Science》 2024年第3期33-46,共14页
Femtosecond laser-induced periodic surface structures(LIPSS)have been extensively studied over the past few decades.In particular,the period and groove width of high-spatial-frequency LIPSS(HSFL)is much smaller than t... Femtosecond laser-induced periodic surface structures(LIPSS)have been extensively studied over the past few decades.In particular,the period and groove width of high-spatial-frequency LIPSS(HSFL)is much smaller than the diffraction limit,making it a useful method for efficient nanomanufacturing.However,compared with the low-spatial-frequency LIPSS(LSFL),the structure size of the HSFL is smaller,and it is more easily submerged.Therefore,the formation mechanism of HSFL is complex and has always been a research hotspot in this field.In this study,regular LSFL with a period of 760 nm was fabricated in advance on a silicon surface with two-beam interference using an 800 nm,50 fs femtosecond laser.The ultrafast dynamics of HSFL formation on the silicon surface of prefabricated LSFL under single femtosecond laser pulse irradiation were observed and analyzed for the first time using collinear pump-probe imaging method.In general,the evolution of the surface structure undergoes five sequential stages:the LSFL begins to split,becomes uniform HSFL,degenerates into an irregular LSFL,undergoes secondary splitting into a weakly uniform HSFL,and evolves into an irregular LSFL or is submerged.The results indicate that the local enhancement of the submerged nanocavity,or the nanoplasma,in the prefabricated LSFL ridge led to the splitting of the LSFL,and the thermodynamic effect drove the homogenization of the splitting LSFL,which evolved into HSFL. 展开更多
关键词 laser-induced periodic surface structures(LIPSS) local field enhancement collinear pump-probe imaging silicon high spatial frequency periodic structures
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